The Induced Changes of Material Surfaces Due to Ion Beam Bombardment PDF Download
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Author: Ali Atta Mohamed Ahmed
Publisher:
ISBN: 9783846540381
Category :
Languages : en
Pages : 80
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Book Description
Author: Ali Atta Mohamed Ahmed
Publisher:
ISBN: 9783846540381
Category :
Languages : en
Pages : 80
Get Book Here
Book Description
Author: Orlando Auciello
Publisher:
ISBN:
Category : Collisions (Nuclear physics)
Languages : en
Pages : 494
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Book Description
Author: Farid F. Umarov
Publisher:
ISBN:
Category : Science
Languages : en
Pages :
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Book Description
Author: Boris Navinšek
Publisher:
ISBN:
Category : Electric discharges
Languages : en
Pages : 63
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Book Description
Author: Raymond S. Robinson
Publisher:
ISBN:
Category : Diffusion
Languages : en
Pages : 66
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Book Description
Author: J. S. Williams
Publisher: Academic Press
ISBN: 1483220648
Category : Technology & Engineering
Languages : en
Pages : 432
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Book Description
Ion Implantation and Beam Processing covers the scientific and technological advances in the fields of ion implantation and beam processing. The book discusses the amorphization and crystallization of semiconductors; the application of the Boltzmann transport equation to ion implantation in semiconductors and multilayer targets; and the high energy density collision cascades and spike effects. The text also describes the implantation of insulators (ices and lithographic materials); the ion-bombardment-induced compositions changes in alloys and compounds; and the fundamentals and applications of ion beam and laser mixing. The high-dose implantation and the trends of ion implantation in silicon technology are also considered. The book further tackles the implantation in gaAs technology and the contacts and interconnections on semiconductors. Engineers and people involved in microelectronics will find the book invaluable.
Author: Werner Wesch
Publisher: Springer
ISBN: 3319335618
Category : Science
Languages : en
Pages : 547
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Book Description
This book presents the method of ion beam modification of solids in realization, theory and applications in a comprehensive way. It provides a review of the physical basics of ion-solid interaction and on ion-beam induced structural modifications of solids. Ion beams are widely used to modify the physical properties of materials. A complete theory of ion stopping in matter and the calculation of the energy loss due to nuclear and electronic interactions are presented including the effect of ion channeling. To explain structural modifications due to high electronic excitations, different concepts are presented with special emphasis on the thermal spike model. Furthermore, general concepts of damage evolution as a function of ion mass, ion fluence, ion flux and temperature are described in detail and their limits and applicability are discussed. The effect of nuclear and electronic energy loss on structural modifications of solids such as damage formation, phase transitions and amorphization is reviewed for insulators and semiconductors. Finally some selected applications of ion beams are given.
Author: Parmod Kumar
Publisher: Springer Nature
ISBN: 303093862X
Category : Science
Languages : en
Pages : 68
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Book Description
This book provides an overview of the applications of ion beam techniques in oxide materials. Oxide materials exhibit defect-induced physical properties relevant to applications in sensing, optoelectronics and spintronics. Defects in these oxide materials also lead to magnetism in non-magnetic materials or to a change of magnetic ordering in magnetic materials. Thus, an understanding of defects is of immense importance. To date, ion beam tools are considered the most effective techniques for producing controlled defects in these oxides. This book will detail the ion beam tools utilized for creating defects in oxides.
Author: Fadeĭ Fadeevich Komarov
Publisher: CRC Press
ISBN: 9782881247262
Category : Science
Languages : en
Pages : 260
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Book Description
A comprehensive tutorial on techniques and interpreting results in experiments concerning radiation technologies such as ion implantation, ion beam mixing, etc. and the effects of radiation on thin surface layers of metals and other materials. Reviews the fundamental features of rapid nuclear analysis methods, such as Rutherford backscattering and channeling, in conjunction with changes of ion energy, ion-induced x-ray emission, and nuclear microanalysis. Also presents the results of the authors' original research into the mechanisms of damage and structural transformations in multicomponent and multilayer structures and in ion-irradiated GaAs and Ni single crystals, and the processes of defect interaction in collision cascades. Originally published in Russian in 1987. Book club price, $84. Annotation copyrighted by Book News, Inc., Portland, OR
Author: Stephen M. Rossnagel
Publisher:
ISBN:
Category : Cone
Languages : en
Pages : 122
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Book Description
