Synthesis of Titanium Based Nitride Thin Films By Plasma Focus PDF Download
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Author: Tousif Hussain
Publisher: LAP Lambert Academic Publishing
ISBN: 9783659295331
Category :
Languages : en
Pages : 168
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Book Description
The dense plasma focus system of energy 2.3 kJ was used to synthesize titanium based nitride thin films. The book contains the details of research work including the introduction, plasma focus experimental setup, results obtained and their detailed discussion. It reports growth of titanium based nitride thin films specifically titanium-aluminum nitrides, nano composite-titanium nitride/amorphous-silicon nitride, nano composite (titanium, aluminum) nitride/ amorphous-silicon nitride and titanium-silicon-nitride. The results of these experiments show the successful synthesis of titanium based nitride thin films using the plasma focus system. The research work is motivated by the remarkable mechanical, thermal and electronic properties of titanium based nitride thin films, having many applications ranging from coatings on cutting tools to diffusion barrier in microelectronics.
Author: Tousif Hussain
Publisher: LAP Lambert Academic Publishing
ISBN: 9783659295331
Category :
Languages : en
Pages : 168
Get Book Here
Book Description
The dense plasma focus system of energy 2.3 kJ was used to synthesize titanium based nitride thin films. The book contains the details of research work including the introduction, plasma focus experimental setup, results obtained and their detailed discussion. It reports growth of titanium based nitride thin films specifically titanium-aluminum nitrides, nano composite-titanium nitride/amorphous-silicon nitride, nano composite (titanium, aluminum) nitride/ amorphous-silicon nitride and titanium-silicon-nitride. The results of these experiments show the successful synthesis of titanium based nitride thin films using the plasma focus system. The research work is motivated by the remarkable mechanical, thermal and electronic properties of titanium based nitride thin films, having many applications ranging from coatings on cutting tools to diffusion barrier in microelectronics.
Author: Michael Robert Hilton
Publisher:
ISBN:
Category :
Languages : en
Pages : 430
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Book Description
Author: Rajdeep Singh Rawat
Publisher: Springer
ISBN: 9811042179
Category : Science
Languages : en
Pages : 804
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Book Description
This book highlights plasma science and technology-related research and development work at institutes and universities networked through Asian African Association for Plasma Training (AAAPT) which was established in 1988. The AAAPT, with 52 member institutes in 24 countries, promotes the initiation and intensification of plasma research and development through cooperation and technology sharing. With 13 chapters on fusion-relevant, laboratory and industrial plasmas for wide range of applications and basic research and a chapter on AAAPT network, it demonstrates how, with collaborations, high-quality, industrially relevant academic and scientific research on fusion, industrial and laboratory plasmas and plasma diagnostics can be successfully pursued in small research labs. These plasma sciences and technologies include pioneering breakthroughs and applications in (i) fusion relevant research in the quest for long-term, clean energy source development using high-temperature, high- density plasmas and (ii) multibillion-dollar, low-temperature, non-equilibrium and thermal industrial plasmas used in processing, synthesis and electronics.
Author: Sam Zhang
Publisher: CRC Press
ISBN: 1315354349
Category : Science
Languages : en
Pages : 618
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Book Description
Advances in Magnetic Materials: Processing, Properties, and Performance discusses recent developments of magnetic materials, including fabrication, characterization and applications in the aerospace, biomedical, and semiconductors industries. With contributions by international professionals who possess broad and varied expertise, this volume encompasses both bulk materials and thin films and coatings for magnetic applications. A timely reference book that describes such things as ferromagnetism, nanomaterials, and Fe, ZnO, and Co-based materials, Advances in Magnetic Materials is an ideal text for students, researchers, and professionals working in materials science. Describes recent developments of magnetic materials, including fabrication, characterization, and applications Addresses a variety of industrial applications, such as aerospace, biomedical, and semiconductors Discusses bulk materials and thin films and coatings Covers ferromagnetism, nanomaterials, Fe, ZnO, and Co-based materials Contains the contributions of international professionals with broad and varied expertise Covers a holistic range of magnetic materials in various aspects of process, properties, and performance
Author: Sri Prikash Rangarajan
Publisher:
ISBN:
Category : Amides
Languages : en
Pages : 330
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Book Description
Author: Alexander D. Pogrebnjak
Publisher: Springer
ISBN: 9811361339
Category : Technology & Engineering
Languages : en
Pages : 380
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Book Description
This book highlights the latest advances in chemical and physical methods for thin-film deposition and surface engineering, including ion- and plasma-assisted processes, focusing on explaining the synthesis/processing–structure–properties relationship for a variety of thin-film systems. It covers topics such as advances in thin-film synthesis; new thin-film materials: diamond-like films, granular alloys, high-entropy alloys, oxynitrides, and intermetallic compounds; ultra-hard, wear- and oxidation-resistant and multifunctional coatings; superconducting, magnetic, semiconducting, and dielectric films; electrochemical and electroless depositions; thin-film characterization and instrumentation; and industrial applications.
Author: Sameer Narsinha Dharmadhikari
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 110
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Book Description
Titanium tetrachioride and ammonia were used as precursors in a Jow pressure chemical vapor deposition process to deposit titanium nitride films on silicon wafers. The process was carried out at temperatures from 450 to 850°C and the activation energy for the reaction was determined. The order of the reaction, with respect to the partial pressures of the reactant gases, was determined by carrying out the reaction at varying partial pressures of the reactant gases. The following rate equation was established for the reaction: rate = 4.35*10-5exp( -5150/T)*(PNH3)1.37(PTicl4)-0.42 The titanium nitride thin films deposited were characterized for properties like resistivity, stress, hardness, and density. The effects of varying the process parameters (temperature, flow ratio, etc.) on these film properties were studied.
Author: Hrishikesh Kamat
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
Author: Challa S.S.R. Kumar
Publisher: Springer Science & Business Media
ISBN: 3642389341
Category : Science
Languages : en
Pages : 718
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Book Description
Third volume of a 40volume series on nanoscience and nanotechnology, edited by the renowned scientist Challa S.S.R. Kumar. This handbook gives a comprehensive overview about Transmission electron microscopy characterization of nanomaterials. Modern applications and state-of-the-art techniques are covered and make this volume an essential reading for research scientists in academia and industry.
