Synthesis and Characterization of Visible Emission from Rare-earth Doped Aluminum Nitride, Gallium Nitride and Gallium Aluminum Nitride Powders and Thin Films

Synthesis and Characterization of Visible Emission from Rare-earth Doped Aluminum Nitride, Gallium Nitride and Gallium Aluminum Nitride Powders and Thin Films PDF Author: Jonathan Huai-Tse Tao
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ISBN: 9781124339528
Category :
Languages : en
Pages : 165

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A three-step solution-based process had been used synthesize powders of GaN, AlN and their alloys. The complete solid solubility and tunable nature of these nitride band gaps in the visible spectrum were the motivation of these studies due to their application in solid state lighting. Energy dispersive X-ray spectroscopy confirmed the reduction in oxygen content for the GaN powders to as low as 4 atom % with an 8 % oxygen to nitrogen ratio. Relative to commercial GaN powders, the bandedge of the powders synthesized by such approach also shifted to higher energy, which indicated fewer defects, as observed from reflectance measurements. Inspired by the use of rare-earth elements as color emitters in fluorescent lamp phosphors, these elements were also used as activators in our nitride material. Visible emission was demonstrated through photoluminescence measurements in AlN powders activated with rare-earth elements Eu3, Tb3, Tm3+. These ions showed emission in the red, green and blue regions of the visible spectrum, respectively. Eu3+ and Tb3+ co-activation was also observed in an AlN sample that indicated successful energy transfer from the host to sensitizer, and subsequently to another activator. Tb3+ emission was observed under cathodoluminescence in GaN powders synthesized by the same method, and a concentration study showed no effect of concentration quenching up to 8 atom %. Using the same source powder, a pulsed-laser deposited thin film was fabricated that showed both band gap emission and activator-related emission, suggesting a reduction of defects when the powders were deposited as thin films. Additionally, GaN:Tb3+ films were also fabricated using metallorganic vapor phase epitaxy using precursors with and without oxygen ligands. Tb3+ emission was only observed in the sample fabricated from the precursor with oxygen ligand, suggestion that oxygen may be required for effective rare earth luminescence. Finally, Ga1-xAl/xN alloy powders (x = 0.5) and Ga1-x-yAl/xDy/yN (x = 0.10, 0.30, y = 0.01) powders were synthesized using the solution method while incorporating a stainless steel pressure vessel, which increased the synthesis pressure and aided the formation of a single phase hydroxide precursor. This in turn produced a single phase alloy nitride in the final step. Dy3+ emission that was not observed in GaN powders was also observed in the Ga1-x-yAl/xDy/yN powder. This suggested that the incorporation of aluminum enabled rare-earth emission in the nitrides synthesized for these experiments. However, attempts to sputter nitride alloy thin films via radio frequency sputtering were unsuccessful; only very minor peak shifts in the X-ray diffraction patterns were observed. Nevertheless, energy dispersive X-ray spectroscopy indicates the presence of Al in the Ga0.5Al0.5N film deposited on a Si substrate. This suggested that Al atoms may have segregated from the alloy lattice during the deposition process, with only a small amount of Al atoms incorporated into the GaN lattice.

Synthesis and Characterization of Visible Emission from Rare-earth Doped Aluminum Nitride, Gallium Nitride and Gallium Aluminum Nitride Powders and Thin Films

Synthesis and Characterization of Visible Emission from Rare-earth Doped Aluminum Nitride, Gallium Nitride and Gallium Aluminum Nitride Powders and Thin Films PDF Author: Jonathan Huai-Tse Tao
Publisher:
ISBN: 9781124339528
Category :
Languages : en
Pages : 165

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Book Description
A three-step solution-based process had been used synthesize powders of GaN, AlN and their alloys. The complete solid solubility and tunable nature of these nitride band gaps in the visible spectrum were the motivation of these studies due to their application in solid state lighting. Energy dispersive X-ray spectroscopy confirmed the reduction in oxygen content for the GaN powders to as low as 4 atom % with an 8 % oxygen to nitrogen ratio. Relative to commercial GaN powders, the bandedge of the powders synthesized by such approach also shifted to higher energy, which indicated fewer defects, as observed from reflectance measurements. Inspired by the use of rare-earth elements as color emitters in fluorescent lamp phosphors, these elements were also used as activators in our nitride material. Visible emission was demonstrated through photoluminescence measurements in AlN powders activated with rare-earth elements Eu3, Tb3, Tm3+. These ions showed emission in the red, green and blue regions of the visible spectrum, respectively. Eu3+ and Tb3+ co-activation was also observed in an AlN sample that indicated successful energy transfer from the host to sensitizer, and subsequently to another activator. Tb3+ emission was observed under cathodoluminescence in GaN powders synthesized by the same method, and a concentration study showed no effect of concentration quenching up to 8 atom %. Using the same source powder, a pulsed-laser deposited thin film was fabricated that showed both band gap emission and activator-related emission, suggesting a reduction of defects when the powders were deposited as thin films. Additionally, GaN:Tb3+ films were also fabricated using metallorganic vapor phase epitaxy using precursors with and without oxygen ligands. Tb3+ emission was only observed in the sample fabricated from the precursor with oxygen ligand, suggestion that oxygen may be required for effective rare earth luminescence. Finally, Ga1-xAl/xN alloy powders (x = 0.5) and Ga1-x-yAl/xDy/yN (x = 0.10, 0.30, y = 0.01) powders were synthesized using the solution method while incorporating a stainless steel pressure vessel, which increased the synthesis pressure and aided the formation of a single phase hydroxide precursor. This in turn produced a single phase alloy nitride in the final step. Dy3+ emission that was not observed in GaN powders was also observed in the Ga1-x-yAl/xDy/yN powder. This suggested that the incorporation of aluminum enabled rare-earth emission in the nitrides synthesized for these experiments. However, attempts to sputter nitride alloy thin films via radio frequency sputtering were unsuccessful; only very minor peak shifts in the X-ray diffraction patterns were observed. Nevertheless, energy dispersive X-ray spectroscopy indicates the presence of Al in the Ga0.5Al0.5N film deposited on a Si substrate. This suggested that Al atoms may have segregated from the alloy lattice during the deposition process, with only a small amount of Al atoms incorporated into the GaN lattice.

Synthesis of High Purity Gallium Nitride Powders and Growth and Characterization of Aluminum Nitride and Gallium Nitride Bulk Single Crystals

Synthesis of High Purity Gallium Nitride Powders and Growth and Characterization of Aluminum Nitride and Gallium Nitride Bulk Single Crystals PDF Author: Cengiz Mustafa Balkas
Publisher:
ISBN:
Category :
Languages : en
Pages : 262

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Fabrication and Characterization of Gallium Nitride Electroluminescent Devices Co-doped with Rare Earth and Silicon

Fabrication and Characterization of Gallium Nitride Electroluminescent Devices Co-doped with Rare Earth and Silicon PDF Author: Wang Rui
Publisher:
ISBN:
Category :
Languages : en
Pages : 130

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Rare Earth (RE) doped III-nitrides are being widely investigated for potential applications in optical communication and displays, due to the wide and direct energy bandgap of GaN resulting in low thermal quenching of RE ion sharp emission from ultraviolet (UV) through visible to infrared (IR) region. The UC Nanolab has been conducting RE doped GaN research for more than 10 years and many achievements were obtained, ranging from material growth to device fabrication. This dissertation studied RE emission in GaN material, focusing on the effects of electronic impurity (Si) co-doping on RE luminescence. Advanced RE doped GaN electroluminescent devices (ELDs) were also designed and fabricated. Detailed device characterization was carried out and the effect of co-dopant was investigated. Eu-doped GaN thin films were grown on sapphire wafers by molecular beam epitaxy (MBE) technique and the growth conditions were optimized for the strongest Eu luminescence. It was found that GaN thin film quality and Eu doping concentration mutually affected Eu luminescence. High quality GaN:Eu thin films were grown under Ga rich condition (III/V>1), but the strongest Eu luminescence was obtained under slightly N rich condition (III/V1). The optimum Eu doping concentration is ~0.1-1.0at.%, depending on the GaN:Eu thin film quality. Higher growth temperature (750°C) was also found to enhance Eu luminescence intensity (~10x) and efficiency (~30x). The effect of Si co-doping in GaN:RE thin films was investigated. Eu photoluminescence (PL) was enhanced ~5-10x by moderate Si co-doping (~0.05at.%) mostly due to the increase of Eu PL lifetime, but decreased very fast at high Si co-doping concentration (>0.08at.%). The increase of Eu PL lifetime is possibly due to the incorporation of Si uniformly distributing Eu ions and shielding Eu-Eu interactions. Combined with the increase in excitation cross section and carrier flux, there is a significant enhancement on Eu PL intensity. The electrical properties of GaN:RE thin films were changed from high resistive to weakly n-type due to increased electron concentration introduced by Si co-doping. GaN:RE ELDs were fabricated and the electrical and optical properties were studied by I-V and electroluminescence (EL) measurements. A hetero-junction PIN structure was designed on n-GaN:Si/GaN:RE/p-Si, employing p-Si substrates as p-type conductive layer. RE ions EL emission was found to be much stronger under forward bias than under reverse bias. The Si co-doping was also studied in GaN:RE ELDs. It was found that Er EL had strong visible & IR emission under forward bias, while there is little or no emission under reverse bias. A pn hetero-junction structure formed between p-Si and n-GaN:(Si, Er) layers was proposed to be responsible for the emission control. GaN:(Si, Eu) AC thin film ELDs were also fabricated and shown that the Si co-doping increased the Eu ions emission intensity and efficiency.

Characterization of the Growth of Aluminum Nitride and Gallium Nitride Thin Films on Hydrogen Etched And/or Cleaned 6H-SiC(0001) Surfaces

Characterization of the Growth of Aluminum Nitride and Gallium Nitride Thin Films on Hydrogen Etched And/or Cleaned 6H-SiC(0001) Surfaces PDF Author: Jeffrey David Hartman
Publisher:
ISBN:
Category :
Languages : en
Pages : 219

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Keywords: 6H-SiC, Hydrogen etching, Aluminum nitride, Gallium nitride, Photo-electron emission microscopy, Chemical vapor deposition, Molecular beam epitaxy.

Rare Earth Doped Gallium Nitride Powders

Rare Earth Doped Gallium Nitride Powders PDF Author: Tiju Thomas
Publisher:
ISBN:
Category :
Languages : en
Pages : 158

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Gallium Nitride is a III-V compound semiconductor that has attracted a lot of interest among both applied and basic researchers because of its potential applications in optoelectronic, high power and high frequency devices. However, many questions about the material remain unanswered. In this thesis, we will present our investigation of GaN. We will first describe an ammonothermal method for the synthesis of undoped and rare earth doped GaN powders. Using careful observations and calculations, we show that the powder growth is primarily a liquid phase phenomenon. We also present a chemical method to achieve luminescence enhancement in ammonothermally grown Eu:GaN powders. Based on arguments drawn from the surface chemistry and XRD of these samples, we conclude that elimination of dark mixed oxides from the powder results in the observed luminescence enhancement. We also demonstrate a nano Eu:GaN synthesis process using a simple mechanical topdown method. The optical properties of nano Eu:GaN prepared in this manner is comparable to that of the bulk material. Based on a similar mechanical process we synthesized nano Er:GaN powders that emit in the C band (1.55 m). The mechanism involved in the luminescence of rare earth doped GaN is investigated using thermal quenching and high pressure studies. Our results suggest that an exciton bound to rare earth structured isovalent impurity (RESI) is responsible for luminescence in these materials. Luminescence quenching and pressure dependent photoluminescence enhancement in RE:GaN can be explained based on this model. Our results clearly suggest that thermal quenching can be undone by application of pressure. These powders are discovered to be fairly radiation hard as well. In the last section of this thesis, we will present an electrophoretic technique to deposit nano GaN on a fluorine doped tin oxide coated glass substrate. The technique can be easily adapted to grow layered structures that can find application in optical fibers and as a laser gain medium. Preliminary results for highly densified GaN ceramic obtained using a hot-press process are discussed. These results suggest that further densification is necessary for achieving a completely transparent GaN ceramic made out of ammonothermally synthesized GaN powders.

Optical Characterization of Gallium Nitride, Silicon Carbide, and Aluminum Nitride

Optical Characterization of Gallium Nitride, Silicon Carbide, and Aluminum Nitride PDF Author: Li Chen
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ISBN:
Category : Aluminum nitride
Languages : en
Pages : 222

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Investigations of the Gallium Nitride, Aluminum Nitride and Indium Nitride Semiconductors: Structural, Optical, Electronic and Interfacial Properties

Investigations of the Gallium Nitride, Aluminum Nitride and Indium Nitride Semiconductors: Structural, Optical, Electronic and Interfacial Properties PDF Author: Samuel Clagett Strite (III)
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ISBN:
Category :
Languages : en
Pages :

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Described in this thesis is an investigation of some fundamental physical properties of both zincblende and wurtzite Group III - Nitride wide bandgap semiconductor materials. All of the thin films studied were grown by plasma-enhanced molecular beam epitaxy on either GaAs and SiC substrates. This growth method proved to be suitable for nitride expitaxial growth although compromises between the plasma power and the crystal growth rate had to be sought. The zincblende polytypes of GaN and InN were studied with the intent of evaluating their potential as a wide bandgap semiconductor system for short wavelength optical devices. The metastability of these crystals has led us to the conclusion that the zincblende nitrides are not a promising candidate for these applications due to their tendency to nucleate wurtzite domains. Bulk samples of zincblende GaN and InN and wurtzite GaN, AlN and InN were studied by x-ray photoemission spectroscopy (XPS) in an effort to determine their valence band structure. We report the various energies of the valence band density of states maxima as well as the ionicity gaps of each material. Wurtzite GaN/AlN and InN/AlN heterostructures were also investigated by XPS in order to estimate the valence band discontinuities of these heterojunctions. We measured valence band discontinuities of $Delta$E$rmsbsp{v}{GaN/AlN}$ = 0.4 $pm$ 0.4 eV and $Delta$E$rmsbsp{v}{InN/AlN}$ = 1.1 $pm$ 0.4 eV. Our results indicate that both systems have heterojunction band lineups fundamentally suitable for common optical device applications.

Analysis of Aluminum Nitride (AlN) and Graded Aluminum Gallium Nitride (AlgaN) Thin Film Structures

Analysis of Aluminum Nitride (AlN) and Graded Aluminum Gallium Nitride (AlgaN) Thin Film Structures PDF Author: Phaneendra Bandaru
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ISBN:
Category : Aluminum nitride
Languages : en
Pages : 110

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Chemical Abstracts

Chemical Abstracts PDF Author:
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 2002

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Synthesis and Characterization of Aluminum Nitride Powder from AlCl3-NH3-N2 System by Chemical Vapor Reaction

Synthesis and Characterization of Aluminum Nitride Powder from AlCl3-NH3-N2 System by Chemical Vapor Reaction PDF Author: Zhaojing Meng
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ISBN:
Category :
Languages : en
Pages :

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