Study of a Helium Atmospheric Pressure Dielectric Barrier Discharge at 100 KHz PDF Download
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Author: R. Foest
Publisher:
ISBN:
Category :
Languages : en
Pages : 2
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Book Description
A homogeneous atmospheric pressure glow discharge is obtained in helium at 100 kHz. The electrical characteristics of the discharge are measured and compared with the results of the model. The calculations agree well with the experiment when a small admixture of nitrogen is assumed and the destruction of the helium excimers is strong enough. A multi-peak structure of the current is observed at higher amplitudes of the external voltage.
Author: R. Foest
Publisher:
ISBN:
Category :
Languages : en
Pages : 2
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Book Description
A homogeneous atmospheric pressure glow discharge is obtained in helium at 100 kHz. The electrical characteristics of the discharge are measured and compared with the results of the model. The calculations agree well with the experiment when a small admixture of nitrogen is assumed and the destruction of the helium excimers is strong enough. A multi-peak structure of the current is observed at higher amplitudes of the external voltage.
Author: Anton Nikiforov
Publisher: BoD – Books on Demand
ISBN: 1838802495
Category : Science
Languages : en
Pages : 146
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Book Description
Plasma as the fourth state of matter is an ionized gas consisting of both negative and positive ions, electrons, neutral atoms, radicals, and photons. In the last few decades, atmospheric-pressure plasmas have started to attract increasing attention from both scientists and industry due to a variety of potential applications. Because of increasing interest in the topic, the focus of this book is on providing engineers and scientists with a fundamental understanding of the physical and chemical properties of different atmospheric-pressure plasmas via plasma diagnostic techniques and their applications. The book has been organized into two parts. Part I focuses on the latest achievements in advanced diagnostics of different atmospheric-pressure plasmas. Part II deals with applications of different atmospheric-pressure plasmas.
Author: Jichul Shin
Publisher:
ISBN:
Category :
Languages : en
Pages : 128
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Book Description
Author: Peng Zhang
Publisher:
ISBN:
Category :
Languages : en
Pages : 322
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Book Description
Author: Ravishankar Sankaranarayanan
Publisher:
ISBN:
Category :
Languages : en
Pages : 78
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Book Description
Author: Annemie Bogaerts
Publisher: MDPI
ISBN: 3038977500
Category : Technology & Engineering
Languages : en
Pages : 248
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Book Description
Plasma catalysis is gaining increasing interest for various gas conversion applications, such as CO2 conversion into value-added chemicals and fuels, N2 fixation for the synthesis of NH3 or NOx, methane conversion into higher hydrocarbons or oxygenates. It is also widely used for air pollution control (e.g., VOC remediation). Plasma catalysis allows thermodynamically difficult reactions to proceed at ambient pressure and temperature, due to activation of the gas molecules by energetic electrons created in the plasma. However, plasma is very reactive but not selective, and thus a catalyst is needed to improve the selectivity. In spite of the growing interest in plasma catalysis, the underlying mechanisms of the (possible) synergy between plasma and catalyst are not yet fully understood. Indeed, plasma catalysis is quite complicated, as the plasma will affect the catalyst and vice versa. Moreover, due to the reactive plasma environment, the most suitable catalysts will probably be different from thermal catalysts. More research is needed to better understand the plasma–catalyst interactions, in order to further improve the applications.
Author: Michael A. Lieberman
Publisher: John Wiley & Sons
ISBN: 0471724246
Category : Science
Languages : en
Pages : 795
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Book Description
A Thorough Update of the Industry Classic on Principles of Plasma Processing The first edition of Principles of Plasma Discharges and Materials Processing, published over a decade ago, was lauded for its complete treatment of both basic plasma physics and industrial plasma processing, quickly becoming the primary reference for students and professionals. The Second Edition has been carefully updated and revised to reflect recent developments in the field and to further clarify the presentation of basic principles. Along with in-depth coverage of the fundamentals of plasma physics and chemistry, the authors apply basic theory to plasma discharges, including calculations of plasma parameters and the scaling of plasma parameters with control parameters. New and expanded topics include: * Updated cross sections * Diffusion and diffusion solutions * Generalized Bohm criteria * Expanded treatment of dc sheaths * Langmuir probes in time-varying fields * Electronegative discharges * Pulsed power discharges * Dual frequency discharges * High-density rf sheaths and ion energy distributions * Hysteresis and instabilities * Helicon discharges * Hollow cathode discharges * Ionized physical vapor deposition * Differential substrate charging With new chapters on dusty plasmas and the kinetic theory of discharges, graduate students and researchers in the field of plasma processing should find this new edition more valuable than ever.
Author: Michel Moisan
Publisher: Springer Science & Business Media
ISBN: 9400745583
Category : Science
Languages : en
Pages : 488
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Book Description
This text is an introduction to the physics of collisional plasmas, as opposed to plasmas in space. It is intended for graduate students in physics and engineering . The first chapter introduces with progressively increasing detail, the fundamental concepts of plasma physic. The motion of individual charged particles in various configurations of electric and magnetic fields is detailed in the second chapter while the third chapter considers the collective motion of the plasma particles described according to a hydrodynamic model. The fourth chapter is most original in that it introduces a general approach to energy balance, valid for all types of discharges comprising direct current(DC) and high frequency (HF) discharges, including an applied static magnetic field. The basic concepts required in this fourth chapter have been progressively introduced in the previous chapters. The text is enriched with approx. 100 figures, and alphabetical index and 45 fully resolved problems. Mathematical and physical appendices provide complementary information or allow to go deeper in a given subject.
Author: NN Misra
Publisher: Academic Press
ISBN: 012801489X
Category : Technology & Engineering
Languages : en
Pages : 382
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Book Description
Cold Plasma in Food and Agriculture: Fundamentals and Applications is an essential reference offering a broad perspective on a new, exciting, and growing field for the food industry. Written for researchers, industry personnel, and students interested in nonthermal food technology, this reference will lay the groundwork of plasma physics, chemistry, and technology, and their biological applications. Food scientists and food engineers interested in understanding the theory and application of nonthermal plasma for food will find this book valuable because it provides a roadmap for future developments in this emerging field. This reference is also useful for biologists, chemists, and physicists who wish to understand the fundamentals of plasma physics, chemistry, and technology and their biological interactions through applying novel plasma sources to food and other sensitive biomaterials. Examines the topic of cold plasma technology for food applications Demonstrates state-of-the-art developments in plasma technology and potential solutions to improve food safety and quality Presents a solid introduction for readers on the topics of plasma physics and chemistry that are required to understand biological applications for foods Serves as a roadmap for future developments for food scientists, food engineers, and biologists, chemists, and physicists working in this emerging field
Author: Pascal Chabert
Publisher: Cambridge University Press
ISBN: 9780521763004
Category : Science
Languages : en
Pages : 392
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Book Description
Low-temperature radio frequency plasmas are essential in various sectors of advanced technology, from micro-engineering to spacecraft propulsion systems and efficient sources of light. The subject lies at the complex interfaces between physics, chemistry and engineering. Focusing mostly on physics, this book will interest graduate students and researchers in applied physics and electrical engineering. The book incorporates a cutting-edge perspective on RF plasmas. It also covers basic plasma physics including transport in bounded plasmas and electrical diagnostics. Its pedagogic style engages readers, helping them to develop physical arguments and mathematical analyses. Worked examples apply the theories covered to realistic scenarios, and over 100 in-text questions let readers put their newly acquired knowledge to use and gain confidence in applying physics to real laboratory situations.
