Author: Anjana Devi
Publisher: The Electrochemical Society
ISBN: 9781566774277
Category : Technology & Engineering
Languages : en
Pages : 1128
Book Description
EUROCVD 15
Author: Anjana Devi
Publisher: The Electrochemical Society
ISBN: 9781566774277
Category : Technology & Engineering
Languages : en
Pages : 1128
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566774277
Category : Technology & Engineering
Languages : en
Pages : 1128
Book Description
EuroCVD 17/CVD 17
Author: M. T. Swihart
Publisher: The Electrochemical Society
ISBN: 1566777453
Category : Vapor-plating
Languages : en
Pages : 1352
Book Description
This issue of ECS Transactions includes papers presented at the 2009 EuroCVD-17 and CVD 17 symposium. Topical areas covered include fundamentals of chemical vapor deposition (CVD), chemistry of precursors for CVD, synthesis of nanomaterials by CVD and related methods, industrial applications of CVD, and novel CVD reactors and processes. This issue is sold as a two-part set and also includes a CD-ROM of the entire issue.
Publisher: The Electrochemical Society
ISBN: 1566777453
Category : Vapor-plating
Languages : en
Pages : 1352
Book Description
This issue of ECS Transactions includes papers presented at the 2009 EuroCVD-17 and CVD 17 symposium. Topical areas covered include fundamentals of chemical vapor deposition (CVD), chemistry of precursors for CVD, synthesis of nanomaterials by CVD and related methods, industrial applications of CVD, and novel CVD reactors and processes. This issue is sold as a two-part set and also includes a CD-ROM of the entire issue.
Defects in HIgh-k Gate Dielectric Stacks
Author: Evgeni Gusev
Publisher: Springer Science & Business Media
ISBN: 1402043678
Category : Technology & Engineering
Languages : en
Pages : 495
Book Description
The goal of this NATO Advanced Research Workshop (ARW) entitled “Defects in Advanced High-k Dielectric Nano-electronic Semiconductor Devices”, which was held in St. Petersburg, Russia, from July 11 to 14, 2005, was to examine the very complex scientific issues that pertain to the use of advanced high dielectric constant (high-k) materials in next generation semiconductor devices. The special feature of this workshop was focus on an important issue of defects in this novel class of materials. One of the key obstacles to high-k integration into Si nano-technology are the electronic defects in high-k materials. It has been established that defects do exist in high-k dielectrics and they play an important role in device operation. However, very little is known about the nature of the defects or about possible techniques to eliminate, or at least minimize them. Given the absence of a feasible alternative in the near future, well-focused scientific research and aggressive development programs on high-k gate dielectrics and related devices must continue for semiconductor electronics to remain a competitive income producing force in the global market.
Publisher: Springer Science & Business Media
ISBN: 1402043678
Category : Technology & Engineering
Languages : en
Pages : 495
Book Description
The goal of this NATO Advanced Research Workshop (ARW) entitled “Defects in Advanced High-k Dielectric Nano-electronic Semiconductor Devices”, which was held in St. Petersburg, Russia, from July 11 to 14, 2005, was to examine the very complex scientific issues that pertain to the use of advanced high dielectric constant (high-k) materials in next generation semiconductor devices. The special feature of this workshop was focus on an important issue of defects in this novel class of materials. One of the key obstacles to high-k integration into Si nano-technology are the electronic defects in high-k materials. It has been established that defects do exist in high-k dielectrics and they play an important role in device operation. However, very little is known about the nature of the defects or about possible techniques to eliminate, or at least minimize them. Given the absence of a feasible alternative in the near future, well-focused scientific research and aggressive development programs on high-k gate dielectrics and related devices must continue for semiconductor electronics to remain a competitive income producing force in the global market.
Chemical Vapor Deposition
Author: Electrochemical Society. High Temperature Materials Division
Publisher: The Electrochemical Society
ISBN: 9781566771788
Category : Science
Languages : en
Pages : 1686
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566771788
Category : Science
Languages : en
Pages : 1686
Book Description
Proceedings of the ... European Conference on Chemical Vapor Deposition
Author:
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 594
Book Description
Publisher:
ISBN:
Category : Vapor-plating
Languages : en
Pages : 594
Book Description
Silicon Carbide
Author: Peter Friedrichs
Publisher: John Wiley & Sons
ISBN: 3527629068
Category : Science
Languages : en
Pages : 528
Book Description
This book prestigiously covers our current understanding of SiC as a semiconductor material in electronics. Its physical properties make it more promising for high-powered devices than silicon. The volume is devoted to the material and covers methods of epitaxial and bulk growth. Identification and characterization of defects is discussed in detail. The contributions help the reader to develop a deeper understanding of defects by combining theoretical and experimental approaches. Apart from applications in power electronics, sensors, and NEMS, SiC has recently gained new interest as a substrate material for the manufacture of controlled graphene. SiC and graphene research is oriented towards end markets and has high impact on areas of rapidly growing interest like electric vehicles. The list of contributors reads like a "Who's Who" of the SiC community, strongly benefiting from collaborations between research institutions and enterprises active in SiC crystal growth and device development.
Publisher: John Wiley & Sons
ISBN: 3527629068
Category : Science
Languages : en
Pages : 528
Book Description
This book prestigiously covers our current understanding of SiC as a semiconductor material in electronics. Its physical properties make it more promising for high-powered devices than silicon. The volume is devoted to the material and covers methods of epitaxial and bulk growth. Identification and characterization of defects is discussed in detail. The contributions help the reader to develop a deeper understanding of defects by combining theoretical and experimental approaches. Apart from applications in power electronics, sensors, and NEMS, SiC has recently gained new interest as a substrate material for the manufacture of controlled graphene. SiC and graphene research is oriented towards end markets and has high impact on areas of rapidly growing interest like electric vehicles. The list of contributors reads like a "Who's Who" of the SiC community, strongly benefiting from collaborations between research institutions and enterprises active in SiC crystal growth and device development.
Fuel Cell Engineering
Author:
Publisher: Academic Press
ISBN: 0123868750
Category : Technology & Engineering
Languages : en
Pages : 481
Book Description
Fuel cells are attractive electrochemical energy converters featuring potentially very high thermodynamic efficiency factors. The focus of this volume of Advances in Chemical Engineering is on quantitative approaches, particularly based on chemical engineering principles, to analyze, control and optimize the steady state and dynamic behavior of low and high temperature fuel cells (PEMFC, DMFC, SOFC) to be applied in mobile and stationary systems. - Updates and informs the reader on the latest research findings using original reviews - Written by leading industry experts and scholars - Reviews and analyzes developments in the field
Publisher: Academic Press
ISBN: 0123868750
Category : Technology & Engineering
Languages : en
Pages : 481
Book Description
Fuel cells are attractive electrochemical energy converters featuring potentially very high thermodynamic efficiency factors. The focus of this volume of Advances in Chemical Engineering is on quantitative approaches, particularly based on chemical engineering principles, to analyze, control and optimize the steady state and dynamic behavior of low and high temperature fuel cells (PEMFC, DMFC, SOFC) to be applied in mobile and stationary systems. - Updates and informs the reader on the latest research findings using original reviews - Written by leading industry experts and scholars - Reviews and analyzes developments in the field
Synthesis Gas Combustion
Author: Tim Lieuwen
Publisher: CRC Press
ISBN: 1420085352
Category : Science
Languages : en
Pages : 388
Book Description
Coal, still used to generate more than half of the electric power in the U.S., will likely be part of any future global energy plan. But this finite resource is also responsible for 80 percent of the CO2 emissions from power production, and its continued use will require improved processing techniques that are less damaging to the environment and l
Publisher: CRC Press
ISBN: 1420085352
Category : Science
Languages : en
Pages : 388
Book Description
Coal, still used to generate more than half of the electric power in the U.S., will likely be part of any future global energy plan. But this finite resource is also responsible for 80 percent of the CO2 emissions from power production, and its continued use will require improved processing techniques that are less damaging to the environment and l
Modelling Fluid Flow
Author: János Vad
Publisher: Springer Science & Business Media
ISBN: 3662087979
Category : Technology & Engineering
Languages : en
Pages : 424
Book Description
Modelling Fluid Flow presents invited lectures, workshop summaries and a selection of papers from a recent international conference CMFF '03 on fluid technology. The lectures follow the current evolution and the newest challenges of the computational methods and measuring techniques related to fluid flow. The workshop summaries reflect the recent trends, open questions and unsolved problems in the mutually inspiring fields of experimental and computational fluid mechanics. The papers cover a wide range of fluids engineering, including reactive flow, chemical and process engineering, environmental fluid dynamics, turbulence modelling, numerical methods, and fluid machinery.
Publisher: Springer Science & Business Media
ISBN: 3662087979
Category : Technology & Engineering
Languages : en
Pages : 424
Book Description
Modelling Fluid Flow presents invited lectures, workshop summaries and a selection of papers from a recent international conference CMFF '03 on fluid technology. The lectures follow the current evolution and the newest challenges of the computational methods and measuring techniques related to fluid flow. The workshop summaries reflect the recent trends, open questions and unsolved problems in the mutually inspiring fields of experimental and computational fluid mechanics. The papers cover a wide range of fluids engineering, including reactive flow, chemical and process engineering, environmental fluid dynamics, turbulence modelling, numerical methods, and fluid machinery.
Thirteenth European Conference on Chemical Vapour Deposition
Author: Dimitris Davazoglou
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 1240
Book Description
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 1240
Book Description