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Author: Eberhard Spiller
Publisher: SPIE Press
ISBN: 9780819416544
Category : Medical
Languages : en
Pages : 296
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Book Description
This text describes optics mainly in the 10 to 500 angstrom wavelength region. These wavelengths are 50 to 100 times shorter than those for visible light and 50 to 100 times longer than the wavelengths of medical x rays or x-ray diffraction from natural crystals. There have been substantial advances during the last 20 years, which one can see as an extension of optical technology to shorter wavelengths or as an extension of x-ray diffraction to longer wavelengths. Artificial diffracting structures like zone plates and multilayer mirrors are replacing the natural crystals of x-ray diffraction. Some of these structures can now be fabricated to have diffraction-limited resolution. The new possibilities are described in a simple, tutorial way.
Author: Eberhard Spiller
Publisher: SPIE Press
ISBN: 9780819416544
Category : Medical
Languages : en
Pages : 296
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Book Description
This text describes optics mainly in the 10 to 500 angstrom wavelength region. These wavelengths are 50 to 100 times shorter than those for visible light and 50 to 100 times longer than the wavelengths of medical x rays or x-ray diffraction from natural crystals. There have been substantial advances during the last 20 years, which one can see as an extension of optical technology to shorter wavelengths or as an extension of x-ray diffraction to longer wavelengths. Artificial diffracting structures like zone plates and multilayer mirrors are replacing the natural crystals of x-ray diffraction. Some of these structures can now be fabricated to have diffraction-limited resolution. The new possibilities are described in a simple, tutorial way.
Author: Federico Canova
Publisher: Springer
ISBN: 3662474433
Category : Science
Languages : en
Pages : 205
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Book Description
The book reviews the most recent achievements in optical technologies for XUV and X-ray coherent sources. Particular attention is given to free-electron-laser facilities, but also to other sources available at present, such as synchrotrons, high-order laser harmonics and X-ray lasers. The optical technologies relevant to each type of source are discussed. In addition, the main technologies used for photon handling and conditioning, namely multilayer mirrors, adaptive optics, crystals and gratings are explained. Experiments using coherent light received during the last decades a lot of attention for the X-ray regime. Strong efforts were taken for the realization of almost fully coherent sources, e.g. the free-electron lasers, both as independent sources in the femtosecond and attosecond regimes and as seeding sources for free-electron-lasers and X-ray gas lasers. In parallel to the development of sources, optical technologies for photon handling and conditioning of such coherent and intense X-ray beams advanced. New problems were faced for the realization of optical components of beamlines demanding to manage coherent X-ray photons, e.g. the preservation of coherence and time structure of ultra short pulses.
Author: A.G. Michette
Publisher: Springer Science & Business Media
ISBN: 1461322235
Category : Science
Languages : en
Pages : 338
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Book Description
A fundamental problem in cell biology is the cause of aging. The solution to this problem has not yet been obtained because,(l) until recently, it was not possible to image living cells directly. The use of low-energy (soft) X rays has made such imaging possible, perhaps thereby allowing the aging process to be understood and possibly overcome (a result that may well generate further social, moral, and ethical problems). Fortun ately this is not the only aspect of cell biology amenable to soft X-ray imaging, and it is envisaged that many less controversial studies--such as investigations of the detailed differences between healthy and diseased or malignant cells (in their natural states) and processes of cell division and growth-will be made possible. The use of soft X rays is not limited to biological studies-many applications are possible in, for example, fusion research, materials science, and astronomy. Such studies have only recently begun in earnest because several difficulties had to be overcome, major among these being the lack (for some purposes) of sufficiently intense sources, and the technological difficulties associated with making efficient optical systems. As is well known, the advent of dedicated synchrotron radiation sources, in particular, has alleviated the first of these difficulties, not just for the soft X-ray region. It is the purpose of this book to consider progress in the second.
Author: David Attwood
Publisher: Cambridge University Press
ISBN: 1107062896
Category : Science
Languages : en
Pages : 655
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Book Description
Master the physics and understand the current applications of modern X-ray and EUV sources with this fully updated second edition.
Author: Tim Salditt
Publisher: Springer Nature
ISBN: 3030344134
Category : Science
Languages : en
Pages : 634
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Book Description
This open access book, edited and authored by a team of world-leading researchers, provides a broad overview of advanced photonic methods for nanoscale visualization, as well as describing a range of fascinating in-depth studies. Introductory chapters cover the most relevant physics and basic methods that young researchers need to master in order to work effectively in the field of nanoscale photonic imaging, from physical first principles, to instrumentation, to mathematical foundations of imaging and data analysis. Subsequent chapters demonstrate how these cutting edge methods are applied to a variety of systems, including complex fluids and biomolecular systems, for visualizing their structure and dynamics, in space and on timescales extending over many orders of magnitude down to the femtosecond range. Progress in nanoscale photonic imaging in Göttingen has been the sum total of more than a decade of work by a wide range of scientists and mathematicians across disciplines, working together in a vibrant collaboration of a kind rarely matched. This volume presents the highlights of their research achievements and serves as a record of the unique and remarkable constellation of contributors, as well as looking ahead at the future prospects in this field. It will serve not only as a useful reference for experienced researchers but also as a valuable point of entry for newcomers.
Author: A. Haase
Publisher: World Scientific
ISBN: 9789810230852
Category : Science
Languages : en
Pages : 726
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Book Description
To honour W C Rntgen and review the entire area of X-ray development in the various fields of natural, technical, and life sciences, his successors at the Physikalisches Institut of the Universitt Wrzburg organized a conference, named ?Rntgen Centennial?. It took place at the new ?Physikalisches Institut? not far from the historical site shortly before the actual 100th anniversary of the discovery. Over forty renowned scientists were invited as representative speakers in the various subfields of X-ray activities. They reviewed the development, gave examples, and described the present status. Most of them provided survey articles, which are gathered in this book. Since most X-ray-related activities are somehow represented, an almost complete overview of the entire field is provided. This book thus represents the enormous breadth of X-ray activities and allows one to recognize the potential and quality of today's X-ray research.
Author:
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 476
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Book Description
Reports NIST research and development in the physical and engineering sciences in which the Institute is active. These include physics, chemistry, engineering, mathematics, and computer sciences. Emphasis on measurement methodology and the basic technology underlying standardization.
Author: Andreas Maier
Publisher: Springer
ISBN: 3319965204
Category : Computers
Languages : en
Pages : 263
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Book Description
This open access book gives a complete and comprehensive introduction to the fields of medical imaging systems, as designed for a broad range of applications. The authors of the book first explain the foundations of system theory and image processing, before highlighting several modalities in a dedicated chapter. The initial focus is on modalities that are closely related to traditional camera systems such as endoscopy and microscopy. This is followed by more complex image formation processes: magnetic resonance imaging, X-ray projection imaging, computed tomography, X-ray phase-contrast imaging, nuclear imaging, ultrasound, and optical coherence tomography.
Author: Vivek Bakshi
Publisher: SPIE Press
ISBN: 0819469645
Category : Art
Languages : en
Pages : 704
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Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Author: David Attwood
Publisher: Cambridge University Press
ISBN: 9780521652148
Category : Technology & Engineering
Languages : en
Pages : 504
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Book Description
This comprehensive book describes the fundamental properties of soft X-rays and extreme ultraviolet (EUV) radiation and discusses their applications in a wide variety of fields, including EUV lithography for semiconductor chip manufacture and soft X-ray biomicroscopy. The author provides a wealth of useful reference material such as electron binding energies, characteristic emission lines and photo-absorption cross-sections. The book will be of great interest to graduate students and researchers in engineering, physics, chemistry, and the ...
