Silicon Anodization as a Structuring Technique PDF Download
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Author: Alexey Ivanov
Publisher: Springer
ISBN: 3658192380
Category : Technology & Engineering
Languages : en
Pages : 335
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Book Description
Alexey Ivanov investigates the application of a silicon anodization process as a three-dimensional structuring technique, where silicon is transformed into porous silicon as a sacrificial layer or directly dissolved in electropolishing regime. The work contains a detailed state of the art, experimental studies and modeling of the process for basic shape controlling techniques. Limitations of the developed FEM model with secondary current distribution are discussed.
Author: Alexey Ivanov
Publisher: Springer
ISBN: 3658192380
Category : Technology & Engineering
Languages : en
Pages : 335
Get Book Here
Book Description
Alexey Ivanov investigates the application of a silicon anodization process as a three-dimensional structuring technique, where silicon is transformed into porous silicon as a sacrificial layer or directly dissolved in electropolishing regime. The work contains a detailed state of the art, experimental studies and modeling of the process for basic shape controlling techniques. Limitations of the developed FEM model with secondary current distribution are discussed.
Author: Bo Cui
Publisher: BoD – Books on Demand
ISBN: 953307602X
Category : Science
Languages : en
Pages : 630
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Book Description
Nanotechnology has experienced a rapid growth in the past decade, largely owing to the rapid advances in nanofabrication techniques employed to fabricate nano-devices. Nanofabrication can be divided into two categories: "bottom up" approach using chemical synthesis or self assembly, and "top down" approach using nanolithography, thin film deposition and etching techniques. Both topics are covered, though with a focus on the second category. This book contains twenty nine chapters and aims to provide the fundamentals and recent advances of nanofabrication techniques, as well as its device applications. Most chapters focus on in-depth studies of a particular research field, and are thus targeted for researchers, though some chapters focus on the basics of lithographic techniques accessible for upper year undergraduate students. Divided into five parts, this book covers electron beam, focused ion beam, nanoimprint, deep and extreme UV, X-ray, scanning probe, interference, two-photon, and nanosphere lithography.
Author: Kuan Yew Cheong
Publisher: Trans Tech Publications Ltd
ISBN: 3038265969
Category : Technology & Engineering
Languages : en
Pages : 413
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Book Description
Selected, peer reviewed papers from the 3rd International Conference on the Advancement of Materials and Nanotechnology 2013 (ICAMN III 2013), November 19-21, 2013, Penang
Author: Ki Young Kim
Publisher: BoD – Books on Demand
ISBN: 9537619761
Category : Technology & Engineering
Languages : en
Pages : 366
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Book Description
The title of this book, Advances in Optical and Photonic Devices, encompasses a broad range of theory and applications which are of interest for diverse classes of optical and photonic devices. Unquestionably, recent successful achievements in modern optical communications and multifunctional systems have been accomplished based on composing “building blocks” of a variety of optical and photonic devices. Thus, the grasp of current trends and needs in device technology would be useful for further development of such a range of relative applications. The book is going to be a collection of contemporary researches and developments of various devices and structures in the area of optics and photonics. It is composed of 17 excellent chapters covering fundamental theory, physical operation mechanisms, fabrication and measurement techniques, and application examples. Besides, it contains comprehensive reviews of recent trends and advancements in the field. First six chapters are especially focused on diverse aspects of recent developments of lasers and related technologies, while the later chapters deal with various optical and photonic devices including waveguides, filters, oscillators, isolators, photodiodes, photomultipliers, microcavities, and so on. Although the book is a collected edition of specific technological issues, I strongly believe that the readers can obtain generous and overall ideas and knowledge of the state-of-the-art technologies in optical and photonic devices. Lastly, special words of thanks should go to all the scientists and engineers who have devoted a great deal of time to writing excellent chapters in this book.
Author: Klaus D. Sattler
Publisher: CRC Press
ISBN: 1000702545
Category : Science
Languages : en
Pages : 401
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Book Description
This 21st Century Nanoscience Handbook will be the most comprehensive, up-to-date large reference work for the field of nanoscience. Handbook of Nanophysics by the same editor published in the fall of 2010 and was embraced as the first comprehensive reference to consider both fundamental and applied aspects of nanophysics. This follow-up project has been conceived as a necessary expansion and full update that considers the significant advances made in the field since 2010. It goes well beyond the physics as warranted by recent developments in the field. This ninth volume in a ten-volume set covers industiral applications. Key Features: Provides the most comprehensive, up-to-date large reference work for the field. Chapters written by international experts in the field. Emphasises presentation and real results and applications. This handbook distinguishes itself from other works by its breadth of coverage, readability and timely topics. The intended readership is very broad, from students and instructors to engineers, physicists, chemists, biologists, biomedical researchers, industry professionals, governmental scientists, and others whose work is impacted by nanotechnology. It will be an indispensable resource in academic, government, and industry libraries worldwide. The fields impacted by nanophysics extend from materials science and engineering to biotechnology, biomedical engineering, medicine, electrical engineering, pharmaceutical science, computer technology, aerospace engineering, mechanical engineering, food science, and beyond.
Author: Ralf B. Wehrspohn
Publisher: Springer Science & Business Media
ISBN: 0387251936
Category : Science
Languages : en
Pages : 212
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Book Description
Reviews the most interesting materials on the market concerning self-ordering, including macroporous silicon, porous alumina, MCM41 and photonic bandgap.
Author: Marc J. Madou
Publisher: CRC Press
ISBN: 1420055194
Category : Technology & Engineering
Languages : en
Pages : 672
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Book Description
Designed for science and engineering students, this text focuses on emerging trends in processes for fabricating MEMS and NEMS devices. The book reviews different forms of lithography, subtractive material removal processes, and additive technologies. Both top-down and bottom-up fabrication processes are exhaustively covered and the merits of the different approaches are compared. Students can use this color volume as a guide to help establish the appropriate fabrication technique for any type of micro- or nano-machine.
Author: Howard R. Huff
Publisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 1170
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Book Description
Author: Ghenadii Korotcenkov
Publisher: CRC Press
ISBN: 1482264595
Category : Science
Languages : en
Pages : 431
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Book Description
Porous silicon is rapidly attracting increasing interest from various fields, including optoelectronics, microelectronics, photonics, medicine, sensor and energy technologies, chemistry, and biosensing. This nanostructured and biodegradable material has a range of unique properties that make it ideal for many applications. This book, the third of a
Author: Charles P. Marsden
Publisher:
ISBN:
Category : Electronics
Languages : en
Pages : 472
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Book Description
The objective of the Symposium was to provide an opportunity for engineers and applied scientists actively engaged in the silicon device technology field to discuss the most advanced measurement methods for process control and materials characterization.The basic theme of the meeting was to stress the interdependence of measurements techniques, facilities, and materials as they relate to the overall problems of improving and advancing silicon device sciences and technologies.(Author).
