Semiconductor Materials Analysis and Fabrication Process Control PDF Download
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Author: G.M. Crean
Publisher: Elsevier
ISBN: 0444596917
Category : Science
Languages : en
Pages : 352
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Book Description
There is a growing awareness that the successful implementation of novel material systems and technology steps in the fabrication of microelectronic and optoelectronic devices, is critically dependent on the understanding and control of the materials, the process steps and their interactions. The contributions in this volume demonstrate that characterisation and analysis techniques are an essential support mechanism for research in these fields. Current major research themes are reviewed both in the development and application of diagnostic techniques for advanced materials analysis and fabrication process control. Two distinct trends are elucidated: the emergence and evaluation of sophisticated in situ optical diagnostic techniques such as photoreflectance and spectroellipsometry and the industrial application of ultra-high sensitivity chemical analysis techniques for contamination monitoring. The volume will serve as a useful and timely overview of this increasingly important field.
Author: G.M. Crean
Publisher: Elsevier
ISBN: 0444596917
Category : Science
Languages : en
Pages : 352
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Book Description
There is a growing awareness that the successful implementation of novel material systems and technology steps in the fabrication of microelectronic and optoelectronic devices, is critically dependent on the understanding and control of the materials, the process steps and their interactions. The contributions in this volume demonstrate that characterisation and analysis techniques are an essential support mechanism for research in these fields. Current major research themes are reviewed both in the development and application of diagnostic techniques for advanced materials analysis and fabrication process control. Two distinct trends are elucidated: the emergence and evaluation of sophisticated in situ optical diagnostic techniques such as photoreflectance and spectroellipsometry and the industrial application of ultra-high sensitivity chemical analysis techniques for contamination monitoring. The volume will serve as a useful and timely overview of this increasingly important field.
Author: G. M. Crean
Publisher: North Holland
ISBN: 9780444899088
Category : Ellipsometry
Languages : en
Pages : 338
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Book Description
Reviews current research in the development and application of diagnostic techniques for advanced materials analysis and fabrication process control. Contributions discuss the emergence and evaluation of in situ optical diagnostic techniques, such as photoreflectance and spectroellipsometry.
Author: European Materials Research Society. Meeting
Publisher: North Holland
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 186
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Book Description
Single chamber processing has attracted the attention of a number of researchers as well as industries as an alternative processing "philosophy" to complement or even replace the stringent environment of micro- and optoelectronics device fabrication. Up till now single chamber processing has been an elusive manufacturing objective throughout the history of integrated circuit technology. With the emergence of integrated processing tools in recent years, significant segments for continuous fabrication processes have been successfully realised and their potential has already innovated the industry. The 14 papers in this volume cover topics such as: The background of this approach and up-dated status; Design and concepts of relevant cluster tools equipment; Specific process modules such as deposition chambers (CVD, RTCVD, UVCVD, ...) annealing or etching reactors; and Standardization efforts. The work will provide both a stimulus for future research in this field, as well as useful reference material on the new technology trends in microelectronic device manufacturing technology.
Author:
Publisher:
ISBN:
Category : English imprints
Languages : en
Pages : 1324
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Book Description
Author:
Publisher:
ISBN:
Category : Mechanics, Applied
Languages : en
Pages : 384
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Book Description
Author:
Publisher:
ISBN:
Category : Electrical engineering
Languages : en
Pages : 2240
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Book Description
Author: A. Christou
Publisher: Springer Science & Business Media
ISBN: 9400924828
Category : Technology & Engineering
Languages : en
Pages : 571
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Book Description
This publication is a compilation of papers presented at the Semiconductor Device Reliabi lity Workshop sponsored by the NATO International Scientific Exchange Program. The Workshop was held in Crete, Greece from June 4 to June 9, 1989. The objective of the Workshop was to review and to further explore advances in the field of semiconductor reliability through invited paper presentations and discussions. The technical emphasis was on quality assurance and reliability of optoelectronic and high speed semiconductor devices. The primary support for the meeting was provided by the Scientific Affairs Division of NATO. We are indebted to NATO for their support and to Dr. Craig Sinclair, who admin isters this program. The chapters of this book follow the format and order of the sessions of the meeting. Thirty-six papers were presented and discussed during the five-day Workshop. In addi tion, two panel sessions were held, with audience participation, where the particularly controversial topics of bum-in and reliability modeling and prediction methods were dis cussed. A brief review of these sessions is presented in this book.
Author: Joseph M. Marshall
Publisher: Springer Science & Business Media
ISBN: 9401006326
Category : Technology & Engineering
Languages : en
Pages : 361
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Book Description
The primary objective of this NATO Advanced Study Institute (ASI) was to present an up-to-date overview of various current areas of interest in the field of photovoltaic and related photoactive materials. This is a wide-ranging subject area, of significant commercial and environmental interest, and involves major contributions from the disciplines of physics, chemistry, materials, electrical and instrumentation engineering, commercial realisation etc. Therefore, we sought to adopt an inter disciplinary approach, bringing together recognised experts in the various fields while retaining a level of treatment accessible to those active in specific individual areas of research and development. The lecture programme commenced with overviews of the present relevance and historical development of the subject area, plus an introduction to various underlying physical principles of importance to the materials and devices to be addressed in later lectures. Building upon this, the ASI then progressed to more detailed aspects of the subject area. We were also fortunately able to obtain a contribution from Thierry Langlois d'Estaintot of the European Commission Directorate, describing present and future EC support for activities in this field. In addition, poster sessions were held throughout the meeting, to allow participants to present and discuss their current activities. These were supported by what proved to be very effective feedback sessions (special thanks to Martin Stutzmann), prior to which groups of participants enthusiastically met (often in the bar) to identify and agree topics of common interest.
Author: David W. Greve
Publisher:
ISBN: 9780137548545
Category : Field-effect transistors
Languages : en
Pages : 0
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Book Description
Appropriate for upper-level undergraduate and first-year graduate level courses in Computer Science and Engineering covering Semiconductor Technology. The book assumes a prior course in electronics and Introduction to Semiconductor Devices. Presents a unified introduction to the dominant class of semiconductor devices. Since the topics are based on system applications, the book contains a significant amount of information on particular applications. The topics chosen are intended to demonstrate not only how these devices work, but why the devices are of interest.
Author: W. Gissler
Publisher: Springer Science & Business Media
ISBN: 9780792320067
Category : Technology & Engineering
Languages : en
Pages : 416
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Book Description
The hardest requirements on a material are in general imposed at the surface: it has to be wear resistant for tools and bearings; corrosion resistant for turbine blades; antireflecting for solar cells; and it must combine several of these properties in other applications. `Surface engineering' is the general term that incorporates all the techniques by which a surface modification can be accomplished. These techniques include both the more traditional methods, such as nitriding, boriding and carburizing, and the newer ones, such as ion implantation, laser beam melting and, in particular, coating. This book comprises and compares in a unique way all these techniques of surface engineering. It is a compilation of lectures which were held by renowned scientists and engineers in the frame of the well known `EuroCourses' of the Joint Research Centre of the Commission of the European Communities. The book is principally addressed to material and surface scientists, physicists and chemists, engineers and technicians of industries and institutes where surface engineering problems arise.
