Self-aligned Silicidation (salicide) Process on Separation by Implanted Oxygen (SIMOX) Substrates and Its Device Application PDF Download
Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download Self-aligned Silicidation (salicide) Process on Separation by Implanted Oxygen (SIMOX) Substrates and Its Device Application PDF full book. Access full book title Self-aligned Silicidation (salicide) Process on Separation by Implanted Oxygen (SIMOX) Substrates and Its Device Application by Fei Deng. Download full books in PDF and EPUB format.
Author: Fei Deng
Publisher:
ISBN:
Category :
Languages : en
Pages : 372
Get Book Here
Book Description
Author: Fei Deng
Publisher:
ISBN:
Category :
Languages : en
Pages : 372
Get Book Here
Book Description
Author: S. Coffa
Publisher: Newnes
ISBN: 044459972X
Category : Science
Languages : en
Pages : 1031
Get Book Here
Book Description
The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters.The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.
Author:
Publisher:
ISBN:
Category : Physics
Languages : en
Pages : 1500
Get Book Here
Book Description
Author:
Publisher:
ISBN:
Category : Dissertation abstracts
Languages : en
Pages : 806
Get Book Here
Book Description
Author: Peter L. F. Hemment
Publisher: The Electrochemical Society
ISBN: 9781566771535
Category : Science
Languages : en
Pages : 458
Get Book Here
Book Description
Author: Chih-Hang Tung
Publisher: John Wiley & Sons
ISBN: 9780471457725
Category : Technology & Engineering
Languages : en
Pages : 688
Get Book Here
Book Description
More than 1,100 TEM images illustrate the science of ULSI The natural outgrowth of VLSI (Very Large Scale Integration), Ultra Large Scale Integration (ULSI) refers to semiconductor chips with more than 10 million devices per chip. Written by three renowned pioneers in their field, ULSI Semiconductor Technology Atlas uses examples and TEM (Transmission Electron Microscopy) micrographs to explain and illustrate ULSI process technologies and their associated problems. The first book available on the subject to be illustrated using TEM images, ULSI Semiconductor Technology Atlas is logically divided into four parts: * Part I includes basic introductions to the ULSI process, device construction analysis, and TEM sample preparation * Part II focuses on key ULSI modules--ion implantation and defects, dielectrics and isolation structures, silicides/salicides, and metallization * Part III examines integrated devices, including complete planar DRAM, stacked cell DRAM, and trench cell DRAM, as well as SRAM as examples for process integration and development * Part IV emphasizes special applications, including TEM in advanced failure analysis, TEM in advanced packaging development and UBM (Under Bump Metallization) studies, and high-resolution TEM in microelectronics This innovative guide also provides engineers and managers in the microelectronics industry, as well as graduate students, with: * More than 1,100 TEM images to illustrate the science of ULSI * A historical introduction to the technology as well as coverage of the evolution of basic ULSI process problems and issues * Discussion of TEM in other advanced microelectronics devices and materials, such as flash memories, SOI, SiGe devices, MEMS, and CD-ROMs
![Integration of Self-aligned Silicide (salicide) Process for Sub-0.25 [mu]m CMOS Technology PDF](https://books.google.com/books/content/images/frontcover/lbG7nQAACAAJ?fife=w80-h100)
Author: Chaw Sing Ho
Publisher:
ISBN:
Category : Metal oxide semiconductors, Complementary
Languages : en
Pages : 280
Get Book Here
Book Description
Author:
Publisher:
ISBN:
Category : Physics
Languages : en
Pages : 974
Get Book Here
Book Description
Author: Vinod Kumar Khanna
Publisher: Springer
ISBN: 8132236254
Category : Technology & Engineering
Languages : en
Pages : 471
Get Book Here
Book Description
Keeping nanoelectronics in focus, this book looks at interrelated fields namely nanomagnetics, nanophotonics, nanomechanics and nanobiotechnology, that go hand-in-hand or are likely to be utilized in future in various ways for backing up or strengthening nanoelectronics. Complementary nanosciences refer to the alternative nanosciences that can be combined with nanoelectronics. The book brings students and researchers from multiple disciplines (and therefore with disparate levels of knowledge, and, more importantly, lacunae in this knowledge) together and to expose them to the essentials of integrative nanosciences. The central idea is that the five identified disciplines overlap significantly and arguably cohere into one fundamental nanotechnology discipline. The book caters to interdisciplinary readership in contrast to many of the existing nanotechnology related books that relate to a specific discipline. The book lays special emphasis on nanoelectronics since this field has advanced most rapidly amongst all the nanotechnology disciplines and with significant commercial pervasion. In view of the significant impact that nanotechnology is predicted to have on society, the topics and their interrelationship in this book are of considerable interest and immense value to students, professional engineers, and reserachers.
Author: Denis Flandre
Publisher: Springer Science & Business Media
ISBN: 9781402030116
Category :
Languages : en
Pages : 368
Get Book Here
Book Description
