Author: Gillian Hagen
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
This study addresses a current limitation in the development of high performance organic optoelectronic devices: depositing indium tin oxide (ITO), a transparent, conductive film, without damage to underlying organic films. ITO is deposited with a plasma sputter deposition process which causes damage to organic films. Previous research demonstrates that damage can be reduced with a sputtering configuration with substrates placed perpendicular to two facing guns. We employ fluorescent organic material Alq3 (tris-(8-hydroxyquinoline)aluminum) to explore damage caused by radio-frequency facing-target magnetron plasma sputtering by means of photoluminescence spectroscopy. We present an investigation of the degree to which Alq3 is damaged in the plasma sputtering process. We explore the dependence of the damage on the rate of growth. We evaluate the effects of closing the sputter system shutter to eliminate direct plasma exposure as well as the effect of employing a BPhen (bathophenanthroline) protective layer. We find that facing-target sputtering can be performed at a high growth rate without causing significantly more damage than that caused when sputtering is performed at a low growth rate, with only a 10% reduction in PL from a rate of 0.2 ̊A/s to 2.4 ̊A/s. We demonstrate that the greatest amount of damage occurs at the start of plasma sputtering. The BPhen protective layer is shown to mitigate damage to the surface of the organic material by exposure to gaseous ions.
Reduced Damage From Facing-Target Sputtering of Indium Tin Oxide Films
Author: Gillian Hagen
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
This study addresses a current limitation in the development of high performance organic optoelectronic devices: depositing indium tin oxide (ITO), a transparent, conductive film, without damage to underlying organic films. ITO is deposited with a plasma sputter deposition process which causes damage to organic films. Previous research demonstrates that damage can be reduced with a sputtering configuration with substrates placed perpendicular to two facing guns. We employ fluorescent organic material Alq3 (tris-(8-hydroxyquinoline)aluminum) to explore damage caused by radio-frequency facing-target magnetron plasma sputtering by means of photoluminescence spectroscopy. We present an investigation of the degree to which Alq3 is damaged in the plasma sputtering process. We explore the dependence of the damage on the rate of growth. We evaluate the effects of closing the sputter system shutter to eliminate direct plasma exposure as well as the effect of employing a BPhen (bathophenanthroline) protective layer. We find that facing-target sputtering can be performed at a high growth rate without causing significantly more damage than that caused when sputtering is performed at a low growth rate, with only a 10% reduction in PL from a rate of 0.2 ̊A/s to 2.4 ̊A/s. We demonstrate that the greatest amount of damage occurs at the start of plasma sputtering. The BPhen protective layer is shown to mitigate damage to the surface of the organic material by exposure to gaseous ions.
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
This study addresses a current limitation in the development of high performance organic optoelectronic devices: depositing indium tin oxide (ITO), a transparent, conductive film, without damage to underlying organic films. ITO is deposited with a plasma sputter deposition process which causes damage to organic films. Previous research demonstrates that damage can be reduced with a sputtering configuration with substrates placed perpendicular to two facing guns. We employ fluorescent organic material Alq3 (tris-(8-hydroxyquinoline)aluminum) to explore damage caused by radio-frequency facing-target magnetron plasma sputtering by means of photoluminescence spectroscopy. We present an investigation of the degree to which Alq3 is damaged in the plasma sputtering process. We explore the dependence of the damage on the rate of growth. We evaluate the effects of closing the sputter system shutter to eliminate direct plasma exposure as well as the effect of employing a BPhen (bathophenanthroline) protective layer. We find that facing-target sputtering can be performed at a high growth rate without causing significantly more damage than that caused when sputtering is performed at a low growth rate, with only a 10% reduction in PL from a rate of 0.2 ̊A/s to 2.4 ̊A/s. We demonstrate that the greatest amount of damage occurs at the start of plasma sputtering. The BPhen protective layer is shown to mitigate damage to the surface of the organic material by exposure to gaseous ions.
Study of Indium Tin Oxide (ITO) Thin Films Prepared by Pulsed DC Facing-target Sputtering (FTS)
Author: Chi Keung Fung
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages :
Book Description
Rapidly Quenched Materials
Author: H. Fredriksson
Publisher: Elsevier
ISBN: 0080984606
Category : Technology & Engineering
Languages : en
Pages : 600
Book Description
The 327 papers in this two-volume set cover a wide range of topics concerning the production, processing and properties of rapidly quenched melts. Various techniques for the production of non-equilibrium materials are also discussed, including solid state amorphization by rapid interdiffusion and thermobaric quenching.
Publisher: Elsevier
ISBN: 0080984606
Category : Technology & Engineering
Languages : en
Pages : 600
Book Description
The 327 papers in this two-volume set cover a wide range of topics concerning the production, processing and properties of rapidly quenched melts. Various techniques for the production of non-equilibrium materials are also discussed, including solid state amorphization by rapid interdiffusion and thermobaric quenching.
Radiation Damage and Thermal Treatment of Indium Tin Oxide (ITO) Films and Rectifying Contacts
Author: Alireza Salehi
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Radiation Damage and Thermal Treatment of Indium Tin Oxide (ITO) Films and Rectifying Contracts
Author: Alireza Salehi
Publisher:
ISBN:
Category :
Languages : en
Pages : 368
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 368
Book Description
Thermoelectric Thin Films
Author: Paolo Mele
Publisher: Springer
ISBN: 3030200434
Category : Technology & Engineering
Languages : en
Pages : 211
Book Description
This book will provide readers with deep insight into the intriguing science of thermoelectric thin films. It serves as a fundamental information source on the techniques and methodologies involved in thermoelectric thin film growth, characterization and device processing. This book involves widespread contributions on several categories of thermoelectric thin films: oxides, chalcogenides, iodates, nitrides and polymers. This will serve as an invaluable resource for experts to consolidate their knowledge and will provide insight and inspiration to beginners wishing to learn about thermoelectric thin films. Provides a single-source reference on a wide spectrum of topics related to thermoelectric thin films, from organic chemistry to devices, from physical chemistry to applied physics, from synthesis to device implementation; Covers several categories of thermoelectric thin films based on different material approaches such as oxides, chalcogenides, iodates, nitrides and polymers; Discusses synthesis, characterization, and device processing of thermoelectric thin films, as well as the nanoengineering approach to tailor the properties of the used materials at the nanoscale level.
Publisher: Springer
ISBN: 3030200434
Category : Technology & Engineering
Languages : en
Pages : 211
Book Description
This book will provide readers with deep insight into the intriguing science of thermoelectric thin films. It serves as a fundamental information source on the techniques and methodologies involved in thermoelectric thin film growth, characterization and device processing. This book involves widespread contributions on several categories of thermoelectric thin films: oxides, chalcogenides, iodates, nitrides and polymers. This will serve as an invaluable resource for experts to consolidate their knowledge and will provide insight and inspiration to beginners wishing to learn about thermoelectric thin films. Provides a single-source reference on a wide spectrum of topics related to thermoelectric thin films, from organic chemistry to devices, from physical chemistry to applied physics, from synthesis to device implementation; Covers several categories of thermoelectric thin films based on different material approaches such as oxides, chalcogenides, iodates, nitrides and polymers; Discusses synthesis, characterization, and device processing of thermoelectric thin films, as well as the nanoengineering approach to tailor the properties of the used materials at the nanoscale level.
Properties of R.f. Sputter Deposited Indium Tin Oxide Thin Films on Glass Substrates
Author: Nickolas R. Greenland
Publisher:
ISBN:
Category :
Languages : en
Pages : 118
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 118
Book Description
Introduction to Nanoscience and Nanotechnology
Author: Gabor L. Hornyak
Publisher: CRC Press
ISBN: 1420047809
Category : Science
Languages : en
Pages : 1635
Book Description
The maturation of nanotechnology has revealed it to be a unique and distinct discipline rather than a specialization within a larger field. Its textbook cannot afford to be a chemistry, physics, or engineering text focused on nano. It must be an integrated, multidisciplinary, and specifically nano textbook. The archetype of the modern nano textbook
Publisher: CRC Press
ISBN: 1420047809
Category : Science
Languages : en
Pages : 1635
Book Description
The maturation of nanotechnology has revealed it to be a unique and distinct discipline rather than a specialization within a larger field. Its textbook cannot afford to be a chemistry, physics, or engineering text focused on nano. It must be an integrated, multidisciplinary, and specifically nano textbook. The archetype of the modern nano textbook
Reduction in the Thermal Budget of Sputtered Indium Tin Oxide (ITO) to Potentially Broaden Its Use in Microelectronic Devices
Author: Zachary Flowers
Publisher:
ISBN:
Category : Indium tin oxide
Languages : en
Pages : 0
Book Description
Publisher:
ISBN:
Category : Indium tin oxide
Languages : en
Pages : 0
Book Description
Electrical, Optical and Structural Properties of Indium Tin Oxide Thin Films Deposited on Glass, Pet and Polycarbonate Substrates by Rf Sputtering
Author: Teck-Shiun Lim
Publisher:
ISBN:
Category :
Languages : en
Pages : 140
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 140
Book Description