Author: Mark Yeadon
Publisher: Mrs Proceedings
ISBN:
Category : Science
Languages : en
Pages : 248
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Recent Developments in Oxide and Metal Epitaxy - Theory and Experiment: Volume 619
Author: Mark Yeadon
Publisher: Mrs Proceedings
ISBN:
Category : Science
Languages : en
Pages : 248
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher: Mrs Proceedings
ISBN:
Category : Science
Languages : en
Pages : 248
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Nanotubes and Related Materials: Volume 633
Author:
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 352
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 352
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Si Front End Processing - Physics and Technology II of Dopant-Defect Interactions II: Volume 610
Author: Aditya Agarwal
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 448
Book Description
This proceedings of the April 2000 symposium deals with formation of electrical junctions in the front-end processing of devices for the approaching end-of-the-roadmap. The 60 papers address 2D dopant characterization, ion implantation and shallow junction technology, group III diffusion and activation, carbon diffusion and activation, group V diffusion and activation, vacancy-type defects, regrown amorphous layers, and structure and properties of point and extended defects. Topics include ultra-shallow junction formation and gate activation in deep-submicron CMOS, low energy implantation of boron with decaborane ions, modeling ramp rate effects on shallow junction formation, clustering equilibrium and deactivation kinetics in As doped silicon, and atomistic modeling of complex silicon processing scenarios. c. Book News Inc.
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 448
Book Description
This proceedings of the April 2000 symposium deals with formation of electrical junctions in the front-end processing of devices for the approaching end-of-the-roadmap. The 60 papers address 2D dopant characterization, ion implantation and shallow junction technology, group III diffusion and activation, carbon diffusion and activation, group V diffusion and activation, vacancy-type defects, regrown amorphous layers, and structure and properties of point and extended defects. Topics include ultra-shallow junction formation and gate activation in deep-submicron CMOS, low energy implantation of boron with decaborane ions, modeling ramp rate effects on shallow junction formation, clustering equilibrium and deactivation kinetics in As doped silicon, and atomistic modeling of complex silicon processing scenarios. c. Book News Inc.
Materials Science of Novel Oxide-Based Electronics: Volume 623
Author: David S. Ginley
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 464
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 464
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Microphotonics - Materials, Physics and Applications: Volume 637
Author: Kazumi Wada
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 234
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 234
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
The Granular State: Volume 627
Author: Surajit Sen
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 338
Book Description
These 38 papers from the April 2000 symposium study granular structure, granular flows, nonlinear waves in granular media, vibrated and rotated granular media, and stress distributions. Topics include jamming in liquids and granular materials, nuclear magnetic resonance studies of granular flows, the blueprint of a concept for a nozzle- free inkjet printer, mixing and segregation processes in a Turbula blender, persistence of granular structure during die compaction of ceramic powders, and humidity-induced cohesion effects in granular media. c. Book News Inc.
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 338
Book Description
These 38 papers from the April 2000 symposium study granular structure, granular flows, nonlinear waves in granular media, vibrated and rotated granular media, and stress distributions. Topics include jamming in liquids and granular materials, nuclear magnetic resonance studies of granular flows, the blueprint of a concept for a nozzle- free inkjet printer, mixing and segregation processes in a Turbula blender, persistence of granular structure during die compaction of ceramic powders, and humidity-induced cohesion effects in granular media. c. Book News Inc.
Semiconductor Quantum Dots II: Volume 642
Author: Rosa Leon
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 408
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 408
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Molecular Electronics: Volume 582
Author: Sokrates T. Pantelides
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 144
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 144
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Chemical-mechanical Polishing
Author:
Publisher:
ISBN:
Category : Electrolytic polishing
Languages : en
Pages : 184
Book Description
Publisher:
ISBN:
Category : Electrolytic polishing
Languages : en
Pages : 184
Book Description
Fundamentals of Nanoindentation and Nanotribology II
Author: Shefford P. Baker
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 342
Book Description
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 342
Book Description