Rapid Thermal Annealing of Silicon Implanted Gallium Arsenide

Rapid Thermal Annealing of Silicon Implanted Gallium Arsenide PDF Author: John Stuart Kleine
Publisher:
ISBN:
Category : Gallium arsenide semiconductors
Languages : en
Pages : 122

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Rapid Thermal Annealing of Silicon Implanted Gallium Arsenide

Rapid Thermal Annealing of Silicon Implanted Gallium Arsenide PDF Author: John Stuart Kleine
Publisher:
ISBN:
Category : Gallium arsenide semiconductors
Languages : en
Pages : 122

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Book Description


Rapid Thermal Annealing of Ion Implanted Layers in Gallium Arsenide

Rapid Thermal Annealing of Ion Implanted Layers in Gallium Arsenide PDF Author: Mark R. Wilson
Publisher:
ISBN:
Category :
Languages : en
Pages : 442

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The Effects of Rapid Thermal Annealing on Gallium Arsenide Grown by MOCVD on Silicon Substrates

The Effects of Rapid Thermal Annealing on Gallium Arsenide Grown by MOCVD on Silicon Substrates PDF Author: LeNore Louise Lehman
Publisher:
ISBN:
Category :
Languages : en
Pages : 168

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Rapid Thermal Processing of Semiconductors

Rapid Thermal Processing of Semiconductors PDF Author: Victor E. Borisenko
Publisher: Springer Science & Business Media
ISBN: 1489918043
Category : Technology & Engineering
Languages : en
Pages : 374

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Book Description
Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.

A Comparison of Epitaxial Layers and Undoped Semi-insulating Substrates for Use in Silicon Implantation Into Gallium Arsenide

A Comparison of Epitaxial Layers and Undoped Semi-insulating Substrates for Use in Silicon Implantation Into Gallium Arsenide PDF Author: Alison Schary
Publisher:
ISBN:
Category : Gallium arsenide semiconductors
Languages : en
Pages : 654

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The Annealing and Solid Phase Epitaxy of Ion-implanted Gallium Arsenide by Rapid Thermal Processing

The Annealing and Solid Phase Epitaxy of Ion-implanted Gallium Arsenide by Rapid Thermal Processing PDF Author: Walter George Opyd
Publisher:
ISBN:
Category :
Languages : en
Pages : 164

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Rapid thermal Annealing of ion implanted silicon

Rapid thermal Annealing of ion implanted silicon PDF Author: Chi-Chien Ho
Publisher:
ISBN:
Category :
Languages : en
Pages : 186

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The Application of Rapid Thermal Annealing to Arsenic Implanted Single-crystal and Polycrystalline Silicon

The Application of Rapid Thermal Annealing to Arsenic Implanted Single-crystal and Polycrystalline Silicon PDF Author: Judy Lynn Hoyt
Publisher:
ISBN:
Category :
Languages : en
Pages : 225

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Radiation Damage and Annealing Effects Studies of Silicon-Implanted Gallium Arsenide

Radiation Damage and Annealing Effects Studies of Silicon-Implanted Gallium Arsenide PDF Author: Samuel C. Ling
Publisher:
ISBN:
Category :
Languages : en
Pages : 15

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Book Description
Radiation damage and low temperature (200 degrees-600 degrees C) annealing behavior of 120 keV silicon and selenium ion implants into gallium arsenide have been investigated by Rutherford Backscattering-Channeling and Transmission Electron Microscopy techniques. Lattice location studies of Si implants after high temperature annealing (850 degrees and 950 degrees C) have been conducted using Proton Induced X-Ray Emission method. (Author).

Gallium Arsenide III

Gallium Arsenide III PDF Author: P. Kordoš
Publisher: Trans Tech Publications Ltd
ISBN: 3035739706
Category : Technology & Engineering
Languages : en
Pages : 376

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Book Description
Proceedings of the 3rd International Conference on Physics & Technology of GaAs and other III-V Semiconductors, Lomnica, CSFR, December 1988