Author: F. Roozeboom
Publisher: Springer Science & Business Media
ISBN: 9401587116
Category : Science
Languages : en
Pages : 568
Get Book Here
Book Description
Rapid thermal and integrated processing is an emerging single-wafer technology in ULSI semiconductor manufacturing, electrical engineering, applied physics and materials science. Here, the physics and engineering of this technology are discussed at the graduate level. Three interrelated areas are covered. First, the thermophysics of photon-induced annealing of semiconductor and related materials, including fundamental pyrometry and emissivity issues, the modelling of reactor designs and processes, and their relation to temperature uniformity. Second, process integration, treating the advances in basic equipment design, scale-up, integrated cluster-tool equipment, including wafer cleaning and integrated processing. Third, the deposition and processing of thin epitaxial, dielectric and metal films, covering selective deposition and epitaxy, integrated processing of layer stacks, and new areas of potential application, such as the processing of III-V semiconductor structures and thin- film head processing for high-density magnetic data storage.
Author:
Publisher:
ISBN:
Category : Rapid thermal processing
Languages : en
Pages : 416
Get Book Here
Book Description
Author: Dim-Lee Kwong
Publisher: The Electrochemical Society
ISBN: 9781566773157
Category : Technology & Engineering
Languages : en
Pages : 458
Get Book Here
Book Description
"Electronics, Dielectric Science and Technology, and High Temperature Materials Divisions."
Author: Fred Roozeboom
Publisher: The Electrochemical Society
ISBN: 9781566772327
Category : Technology & Engineering
Languages : en
Pages : 470
Get Book Here
Book Description
Author: J. C. Gelpey
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 416
Get Book Here
Book Description
This book is the latest in a continuing series on rapid thermal processing and related topics. It embraces a diversity of research, development and manufacturing activities that require rapid thermal and integrated processing techniques which are recognized by their acronyms, such as rapid thermal annealing (RTA), rapid thermal processing (RTP), rapid thermal chemical vapor deposition (RTCVP), rapid thermal oxidation (RTO), and others. This fifth anniversary volume reports notable advances in the use of rapid thermal techniques in processing science and technology, and for process control in industrial fabrication facilities. It is organized around progress obtained through: evaluation methodology; equipment and process modelling; temperature control; defects and diffusion associated with annealing; metallizations such as silicidation; novel processing of sol-gel and magnetic films; dielectric growth and deposition; and silicon or silicon-germanium film deposition.
Author: M.A. Otooni
Publisher: Springer Science & Business Media
ISBN: 9401102236
Category : Technology & Engineering
Languages : en
Pages : 384
Get Book Here
Book Description
This book represents a collection of papers presented at the NATO Advanced Research Workshop (NATO/ARW) on "Science and Technology of Rapid Solidification and Processing", held at Hotel Thayer, West Point Military Academy, New York, N. Y. , during June 21-24, 1994. The workshop was attended by over forty scientists representing several NATO member countries as well as representatives from Japan, China (PRC), Taiwan and India. The purpose of this NATO/ARW conference was to review the major advances made in most recent years in both the theoretical and experimental areas of rapid solidification technology and processing. In accordance with the NATO/ARW format, the agenda for the conference was so arranged to offer in depth presentation of the latest developments in the subject area as well as to encourage follow-up discussions by the participants. There was seven sessions each opened with a lecture by an invited guest speaker. Sessions 1-4, covered two days of the conference and focused mainly on Processing Technologies of Rapid Solidification and Thermodynamic Properties (Practical Applications). Sessions 4-6 concentrated on Thermodynamics of Metastable Alloys, Relaxation, Diffusion, Magnetic and Electric Properties (Fundamentals). Session 6 was devoted to the Structural Characterization of Supercooled Melts, Ultra Fine Polycrystalline Materials (New Innovations and Techniques). There were two equally important aspects of this NATO/ARW conference which must be mentioned. Firstly, this is the first NATO/ARW conference on Science and Technology of Rapid Solidification and Processing held in the United States.
Author: Mehmet C. Öztürk
Publisher: The Electrochemical Society
ISBN: 9781566774062
Category : Technology & Engineering
Languages : en
Pages : 444
Get Book Here
Book Description
Author: Victor E. Borisenko
Publisher: Springer Science & Business Media
ISBN: 1489918043
Category : Technology & Engineering
Languages : en
Pages : 374
Get Book Here
Book Description
Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.
Author: Mehrdad M. Moslehi
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 226
Get Book Here
Book Description
Author: Fred Roozeboom
Publisher: The Electrochemical Society
ISBN: 9781566772747
Category : Technology & Engineering
Languages : en
Pages : 482
Get Book Here
Book Description
The proceedings from this May 2000 symposium illustrate the range of applications in Rapid Thermal Processing (RTP). The refereed papers cover a variety of issues, such as ultra-shallow junctions; contacts for nanoscale CMOS; gate stacks; new applications of RTP, such as for the enhanced crystalization of amorphous silicon thin films; and advances on RTP systems and process monitoring, including optimizing and controlling gas flows in an RTCVD reactor. Most presentations are supported by charts and other graphical data. c. Book News Inc.
