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Author: Martin Hÿtch
Publisher: Academic Press
ISBN: 0323988660
Category : Technology & Engineering
Languages : en
Pages : 400
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Book Description
Coulomb Interactions in Particle Beams, Volume 223 in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and computing methods used in all these domains, with this release exploring Coulomb Interactions in Particle Beams. Provides the authority and expertise of leading contributors from an international board of authors Presents the latest release in the Advances in Imaging and Electron Physics series Updated release includes the latest information on Coulomb Interactions in Particle Beams
Author: Martin Hÿtch
Publisher: Academic Press
ISBN: 0323988660
Category : Technology & Engineering
Languages : en
Pages : 400
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Book Description
Coulomb Interactions in Particle Beams, Volume 223 in the Advances in Imaging and Electron Physics series, merges two long-running serials, Advances in Electronics and Electron Physics and Advances in Optical and Electron Microscopy. The series features articles on the physics of electron devices (especially semiconductor devices), particle optics at high and low energies, microlithography, image science, digital image processing, electromagnetic wave propagation, electron microscopy, and computing methods used in all these domains, with this release exploring Coulomb Interactions in Particle Beams. Provides the authority and expertise of leading contributors from an international board of authors Presents the latest release in the Advances in Imaging and Electron Physics series Updated release includes the latest information on Coulomb Interactions in Particle Beams
Author: L. Marton
Publisher:
ISBN:
Category :
Languages : en
Pages : 0
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Book Description
Author: P. W. Hawkes
Publisher: Springer
ISBN: 3540349006
Category : Science
Languages : en
Pages : 131
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Book Description
Author: P.W. Hawkes
Publisher: Springer Science & Business Media
ISBN: 3642815162
Category : Science
Languages : en
Pages : 474
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Book Description
No single volume has been entirely devoted to the properties of magnetic lenses, so far as I am aware, although of course all the numerous textbooks on electron optics devote space to them. The absence of such a volume, bringing together in formation about the theory and practical design of these lenses, is surprising, for their introduction some fifty years ago has created an entirely new family of commercial instruments, ranging from the now traditional transmission electron microscope, through the reflection and transmission scanning microscopes, to co lumns for micromachining and microlithography, not to mention the host of experi mental devices not available commercially. It therefore seemed useful to prepare an account of the various aspects of mag netic lens studies. These divide naturally into the five chapters of this book: the theoretical background, in which the optical behaviour is described and formu lae given for the various aberration coefficients; numerical methods for calculat ing the field distribution and trajectory tracing; extensive discussion of the paraxial optical properties and aberration coefficients of practical lenses, il lustrated with curves from which numerical information can be obtained; a comple mentary account of the practical, engineering aspects of lens design, including permanent magnet lenses and the various types of superconducting lenses; and final ly, an up-to-date survey of several kinds of highly unconventional magnetic lens, which may well change the appearance of future electron optical instruments very considerably after they cease to be unconventional.
Author: Peter W. Hawkes
Publisher: Academic Press
ISBN: 0128134054
Category : Science
Languages : en
Pages : 767
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Book Description
Principles of Electron Optics: Applied Geometrical Optics, Second Edition gives detailed information about the many optical elements that use the theory presented in Volume 1: electrostatic and magnetic lenses, quadrupoles, cathode-lens-based instruments including the new ultrafast microscopes, low-energy-electron microscopes and photoemission electron microscopes and the mirrors found in their systems, Wien filters and deflectors. The chapter on aberration correction is largely new. The long section on electron guns describes recent theories and covers multi-column systems and carbon nanotube emitters. Monochromators are included in the section on curved-axis systems. The lists of references include many articles that will enable the reader to go deeper into the subjects discussed in the text. The book is intended for postgraduate students and teachers in physics and electron optics, as well as researchers and scientists in academia and industry working in the field of electron optics, electron and ion microscopy and nanolithography. Offers a fully revised and expanded new edition based on the latest research developments in electron optics Written by the top experts in the field Covers every significant advance in electron optics since the subject originated Contains exceptionally complete and carefully selected references and notes Serves both as a reference and text
Author: Peter W. Hawkes
Publisher: Elsevier
ISBN: 0081022573
Category : Science
Languages : en
Pages : 729
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Book Description
Volume one of Principles of Electron Optics: Basic Geometrical Optics, Second Edition, explores the geometrical optics needed to analyze an extremely wide range of instruments: cathode-ray tubes; the family of electron microscopes, including the fixed-beam and scanning transmission instruments, the scanning electron microscope and the emission microscope; electron spectrometers and mass spectrograph; image converters; electron interferometers and diffraction devices; electron welding machines; and electron-beam lithography devices. The book provides a self-contained, detailed, modern account of electron optics for anyone involved with particle beams of modest current density in the energy range up to a few mega-electronvolts. You will find all the basic equations with their derivations, recent ideas concerning aberration studies, extensive discussion of the numerical methods needed to calculate the properties of specific systems and guidance to the literature of all the topics covered. A continuation of these topics can be found in volume two, Principles of Electron Optics: Applied Geometrical Optics. The book is intended for postgraduate students and teachers in physics and electron optics, as well as researchers and scientists in academia and industry working in the field of electron optics, electron and ion microscopy and nanolithography. Offers a fully revised and expanded new edition based on the latest research developments in electron optics Written by the top experts in the field Covers every significant advance in electron optics since the subject originated Contains exceptionally complete and carefully selected references and notes Serves both as a reference and text
Author: Jon Orloff
Publisher: CRC Press
ISBN: 1420045555
Category : Science
Languages : en
Pages : 666
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Book Description
With the growing proliferation of nanotechnologies, powerful imaging technologies are being developed to operate at the sub-nanometer scale. The newest edition of a bestseller, the Handbook of Charged Particle Optics, Second Edition provides essential background information for the design and operation of high resolution focused probe instruments. The book’s unique approach covers both the theoretical and practical knowledge of high resolution probe forming instruments. The second edition features new chapters on aberration correction and applications of gas phase field ionization sources. With the inclusion of additional references to past and present work in the field, this second edition offers perfectly calibrated coverage of the field’s cutting-edge technologies with added insight into how they work. Written by the leading research scientists, the second edition of the Handbook of Charged Particle Optics is a complete guide to understanding, designing, and using high resolution probe instrumentation.
Author:
Publisher: Academic Press
ISBN: 0080577334
Category : Computers
Languages : en
Pages : 431
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Book Description
Advances in Electronics and Electron Physics
Author: Alexander Wu Chao
Publisher: World Scientific
ISBN: 981126919X
Category : Science
Languages : en
Pages : 960
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Book Description
Edited by internationally recognized authorities in the field, this expanded and updated new edition of the bestselling Handbook, containing many new articles, is aimed at the design and operation of modern particle accelerators. It is intended as a vade mecum for professional engineers and physicists engaged in these subjects. With a collection of more than 2000 equations, 300 illustrations and 500 graphs and tables, here one will find, in addition to common formulae of previous compilations, hard to find, specialized formulae, recipes and material data pooled from the lifetime experience of many of the world's most able practioners of the art and science of accelerators.The seven chapters include both theoretical and practical matters as well as an extensive glossary of accelerator types. Chapters on beam dynamics and electromagnetic and nuclear interactions deal with linear and nonlinear single particle and collective effects including spin motion, beam-environment, beam-beam, beam-electron, beam-ion and intrabeam interactions. The impedance concept and related calculations are dealt with at length as are the instabilities due to the various interactions mentioned. A chapter on operational considerations including discussions on the assessment and correction of orbit and optics errors, realtime feedbacks, generation of short photon pulses, bunch compression, phase-space exchange, tuning of normal and superconducting linacs, energy recovery linacs, free electron lasers, cryogenic vacuum systems, steady state microbuching, cooling, space-charge compensation, brightness of light sources, collider luminosity optimization and collision schemes, machine learning, multiple frequency rf systems, FEL seeding, ultrafast electron diffraction, and Gamma Factory. Chapters on mechanical and electrical considerations present material data and important aspects of component design including heat transfer and refrigeration. Hardware systems for particle sources, feedback systems, confinement, including undulators, and acceleration (both normal and superconducting) receive detailed treatment in a sub-systems chapter, beam measurement and apparatus being treated therein as well.A detailed name and subject index is provided together with reliable references to the literature where the most detailed information available on all subjects treated can be found.
Author: Alexander Wu Chao
Publisher: World Scientific
ISBN: 9814415855
Category : Science
Languages : en
Pages : 849
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Book Description
Edited by internationally recognized authorities in the field, this expanded and updated new edition of the bestselling Handbook, containing more than 100 new articles, is aimed at the design and operation of modern particle accelerators. It is intended as a vade mecum for professional engineers and physicists engaged in these subjects. With a collection of more than 2000 equations, 300 illustrations and 500 graphs and tables, here one will find, in addition to the common formulae of previous compilations, hard-to-find, specialized formulae, recipes and material data pooled from the lifetime experience of many of the world''s most able practitioners of the art and science of accelerators.The eight chapters include both theoretical and practical matters as well as an extensive glossary of accelerator types. Chapters on beam dynamics and electromagnetic and nuclear interactions deal with linear and nonlinear single particle and collective effects including spin motion, beam-environment, beam-beam, beam-electron, beam-ion and intrabeam interactions. The impedance concept and related calculations are dealt with at length as are the instabilities associated with the various interactions mentioned. A chapter on operational considerations includes discussions on the assessment and correction of orbit and optics errors, real-time feedbacks, generation of short photon pulses, bunch compression, tuning of normal and superconducting linacs, energy recovery linacs, free electron lasers, cooling, space-charge compensation, brightness of light sources, collider luminosity optimization and collision schemes. Chapters on mechanical and electrical considerations present material data and important aspects of component design including heat transfer and refrigeration. Hardware systems for particle sources, feedback systems, confinement and acceleration (both normal conducting and superconducting) receive detailed treatment in a subsystems chapter, beam measurement techniques and apparatus being treated therein as well. The closing chapter gives data and methods for radiation protection computations as well as much data on radiation damage to various materials and devices.A detailed name and subject index is provided together with reliable references to the literature where the most detailed information available on all subjects treated can be found.
