Author:
Publisher: Elsevier
ISBN: 0080542921
Category : Science
Languages : en
Pages : 434
Book Description
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.
PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing
Author:
Publisher: Elsevier
ISBN: 0080542921
Category : Science
Languages : en
Pages : 434
Book Description
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.
Publisher: Elsevier
ISBN: 0080542921
Category : Science
Languages : en
Pages : 434
Book Description
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems.In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films.This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.
PVD for Microelectronics: Sputter Desposition to Semiconductor Manufacturing
Author:
Publisher: Academic Press
ISBN: 9780125330268
Category : Technology & Engineering
Languages : en
Pages : 419
Book Description
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films. This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.
Publisher: Academic Press
ISBN: 9780125330268
Category : Technology & Engineering
Languages : en
Pages : 419
Book Description
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical as well as technological aspects. Therefore, in order to reflect the modern technology-oriented problems, the title has been slightly modified from Physics of Thin Films to Thin Films. This volume, part of the Thin Films Series, has been wholly written by two authors instead of showcasing several edited manuscripts.
Nanostructured Thin Films and Nanodispersion Strengthened Coatings
Author: Andrey A. Voevodin
Publisher: Springer Science & Business Media
ISBN: 1402022220
Category : Technology & Engineering
Languages : en
Pages : 333
Book Description
This volume contains proceedings of the NATO-Russia Advanced Research Workshop on Nanostructured Thin Films and Nanodispersion Strengthened Coatings (December, 2003, Moscow). During this Workshop leading researchers from twelve countries had presented and discussed most recent developments in the fields of plasma physics and surface engineering related to the preparation and applications of nanostructured thin films and nanodispersion strengthened coatings. These presentations are encompassed in 31 individual chapters. The chapters are assembled in five parts in according to the workshop sessions. Part I is a compilation of chapters on hard and tribological coatings. The recent advances in this area are significant in that it is now possible to engineer strong, hard, and tough coatings that can operate at temperatures higher than 1200 ?C and exhibit ‘smart’, adaptive characteristics. These coatings are based on an amorphous matrix, e. g. nitrides, carbides, borides, or carbon, in which there is a controlled nucleation and growth of ultra hard nanoparticles of crystalline carbides, nitrides, borides and oxides. The critical feature is the control of both the particle size, i. e. , less than 10 nm, and interpartical spacing of a few nanometers. The ‘smart’ or adaptive characteristic is engineered into the nanostructures using similar sized (less than 10 nm) particles of metallic chalcogenidese, ductile metals, or glass forming elements to provide high lubricity and chemical adaptation at the environment change, e. g. , high and low humidities and temperatures.
Publisher: Springer Science & Business Media
ISBN: 1402022220
Category : Technology & Engineering
Languages : en
Pages : 333
Book Description
This volume contains proceedings of the NATO-Russia Advanced Research Workshop on Nanostructured Thin Films and Nanodispersion Strengthened Coatings (December, 2003, Moscow). During this Workshop leading researchers from twelve countries had presented and discussed most recent developments in the fields of plasma physics and surface engineering related to the preparation and applications of nanostructured thin films and nanodispersion strengthened coatings. These presentations are encompassed in 31 individual chapters. The chapters are assembled in five parts in according to the workshop sessions. Part I is a compilation of chapters on hard and tribological coatings. The recent advances in this area are significant in that it is now possible to engineer strong, hard, and tough coatings that can operate at temperatures higher than 1200 ?C and exhibit ‘smart’, adaptive characteristics. These coatings are based on an amorphous matrix, e. g. nitrides, carbides, borides, or carbon, in which there is a controlled nucleation and growth of ultra hard nanoparticles of crystalline carbides, nitrides, borides and oxides. The critical feature is the control of both the particle size, i. e. , less than 10 nm, and interpartical spacing of a few nanometers. The ‘smart’ or adaptive characteristic is engineered into the nanostructures using similar sized (less than 10 nm) particles of metallic chalcogenidese, ductile metals, or glass forming elements to provide high lubricity and chemical adaptation at the environment change, e. g. , high and low humidities and temperatures.
Physico-Chemical Phenomena in Thin Films and at Solid Surfaces
Author:
Publisher: Elsevier
ISBN: 0080480012
Category : Science
Languages : en
Pages : 800
Book Description
The book is devoted to the consideration of the different processes taking place in thin films and at surfaces. Since the most important physico-chemical phenomena in such media are accompanied by the rearrangement of an intra- and intermolecular coordinates and consequently a surrounding molecular ensemble, the theory of radiationless multi-vibrational transitions is used for its description. The second part of the book considers the numerous surface phenomena. And in the third part is described the preparation methods and characteristics of different types of thin films. Both experimental and theoretical descriptions are represented. Media rearrangement coupled with the reagent transformation largely determines the absolute value and temperature dependence of the rate constants and other characteristics of the considered processes. These effects are described at the atomic or molecular level based on the multi-phonon theory, starting from the first pioneering studies through to contemporary studies.A number of questions are included at the end of many chapters to further reinforce the material presented.· Unified approach to the description of numerous physico-chemical phenomena in different materials· Based on the pioneering research work of the authors· Explantion of a variety of experimental observations· Material is presented at two levels of complexity for specialists and non-specialists · Identifies existing and potential applications of the processes and phenomena · Includes questions at the end of some chapters to further reinforce the material discussed
Publisher: Elsevier
ISBN: 0080480012
Category : Science
Languages : en
Pages : 800
Book Description
The book is devoted to the consideration of the different processes taking place in thin films and at surfaces. Since the most important physico-chemical phenomena in such media are accompanied by the rearrangement of an intra- and intermolecular coordinates and consequently a surrounding molecular ensemble, the theory of radiationless multi-vibrational transitions is used for its description. The second part of the book considers the numerous surface phenomena. And in the third part is described the preparation methods and characteristics of different types of thin films. Both experimental and theoretical descriptions are represented. Media rearrangement coupled with the reagent transformation largely determines the absolute value and temperature dependence of the rate constants and other characteristics of the considered processes. These effects are described at the atomic or molecular level based on the multi-phonon theory, starting from the first pioneering studies through to contemporary studies.A number of questions are included at the end of many chapters to further reinforce the material presented.· Unified approach to the description of numerous physico-chemical phenomena in different materials· Based on the pioneering research work of the authors· Explantion of a variety of experimental observations· Material is presented at two levels of complexity for specialists and non-specialists · Identifies existing and potential applications of the processes and phenomena · Includes questions at the end of some chapters to further reinforce the material discussed
Introduction to Surface Engineering and Functionally Engineered Materials
Author: Peter Martin
Publisher: John Wiley & Sons
ISBN: 047063927X
Category : Technology & Engineering
Languages : en
Pages : 586
Book Description
This book provides a clear and understandable text for users and developers of advanced engineered materials, particularly in the area of thin films, and addresses fundamentals of modifying the optical, electrical, photo-electric, triboligical, and corrosion resistance of solid surfaces and adding functionality to solids by engineering their surface, structure, and electronic, magnetic and optical structure. Thin film applications are emphasized. Through the inclusion of multiple clear examples of the technologies, how to use them,and the synthesis processes involved, the reader will gain a deep understanding of the purpose, goals, and methodology of surface engineering and engineered materials. Virtually every advance in thin film, energy, medical, tribological materials technologies has resulted from surface engineering and engineered materials. Surface engineering involves structures and compositions not found naturally in solids and is used to modify the surface properties of solids and involves application of thin film coatings, surface functionalization and activation, and plasma treatment. Engineered materials are the future of thin film technology. Engineered structures such as superlattices, nanolaminates, nanotubes, nanocomposites, smart materials, photonic bandgap materials, metamaterials, molecularly doped polymers and structured materials all have the capacity to expand and increase the functionality of thin films and coatings used in a variety of applications and provide new applications. New advanced deposition processes and hybrid processes are being used and developed to deposit advanced thin film materials and structures not possible with conventional techniques a decade ago. Properties can now be engineered into thin films that achieve performance not possible a decade ago.
Publisher: John Wiley & Sons
ISBN: 047063927X
Category : Technology & Engineering
Languages : en
Pages : 586
Book Description
This book provides a clear and understandable text for users and developers of advanced engineered materials, particularly in the area of thin films, and addresses fundamentals of modifying the optical, electrical, photo-electric, triboligical, and corrosion resistance of solid surfaces and adding functionality to solids by engineering their surface, structure, and electronic, magnetic and optical structure. Thin film applications are emphasized. Through the inclusion of multiple clear examples of the technologies, how to use them,and the synthesis processes involved, the reader will gain a deep understanding of the purpose, goals, and methodology of surface engineering and engineered materials. Virtually every advance in thin film, energy, medical, tribological materials technologies has resulted from surface engineering and engineered materials. Surface engineering involves structures and compositions not found naturally in solids and is used to modify the surface properties of solids and involves application of thin film coatings, surface functionalization and activation, and plasma treatment. Engineered materials are the future of thin film technology. Engineered structures such as superlattices, nanolaminates, nanotubes, nanocomposites, smart materials, photonic bandgap materials, metamaterials, molecularly doped polymers and structured materials all have the capacity to expand and increase the functionality of thin films and coatings used in a variety of applications and provide new applications. New advanced deposition processes and hybrid processes are being used and developed to deposit advanced thin film materials and structures not possible with conventional techniques a decade ago. Properties can now be engineered into thin films that achieve performance not possible a decade ago.
Physics And Technology Of Thin Films, Iwtf 2003 - Proceedings Of The International Workshop
Author: M Wuttig
Publisher: World Scientific
ISBN: 9814483125
Category : Science
Languages : en
Pages : 549
Book Description
Thin films science and technology plays an important role in the high-tech industries. Thin film technology has been developed primarily for the need of the integrated circuit industry. The demand for development of smaller and smaller devices with higher speed especially in new generation of integrated circuits requires advanced materials and new processing techniques suitable for future giga scale integration (GSI) technology. In this regard, physics and technology of thin films can play an important role to acheive this goal. The production of thin films for device purposes has been developed over the past 40 years. Thin films as a two dimensional system are of great importance to many real-world problems. Their material costs are very small as compared to the corresponding bulk material and they perform the same function when it comes to surface processes. Thus, knowledge and determination of the nature, functions and new properties of thin films can be used for the development of new technologies for future applications.Thin film technology is based on three foundations: fabrication, characterization and applications. Some of the important applications of thin films are microelectronics, communication, optical electronics, catalysis, coating of all kinds, and energy generation and conservation strategies.This book emphasizes the importance of thin films and their properties for the new technologies. It presents basic principles, processes techniques and applications of thin films. As thin films physics and technology is a multidisciplinary field, the book will be useful to a wide varity of readers (especially young researcher) in physics, electronic engineering, material science and metallurgy.
Publisher: World Scientific
ISBN: 9814483125
Category : Science
Languages : en
Pages : 549
Book Description
Thin films science and technology plays an important role in the high-tech industries. Thin film technology has been developed primarily for the need of the integrated circuit industry. The demand for development of smaller and smaller devices with higher speed especially in new generation of integrated circuits requires advanced materials and new processing techniques suitable for future giga scale integration (GSI) technology. In this regard, physics and technology of thin films can play an important role to acheive this goal. The production of thin films for device purposes has been developed over the past 40 years. Thin films as a two dimensional system are of great importance to many real-world problems. Their material costs are very small as compared to the corresponding bulk material and they perform the same function when it comes to surface processes. Thus, knowledge and determination of the nature, functions and new properties of thin films can be used for the development of new technologies for future applications.Thin film technology is based on three foundations: fabrication, characterization and applications. Some of the important applications of thin films are microelectronics, communication, optical electronics, catalysis, coating of all kinds, and energy generation and conservation strategies.This book emphasizes the importance of thin films and their properties for the new technologies. It presents basic principles, processes techniques and applications of thin films. As thin films physics and technology is a multidisciplinary field, the book will be useful to a wide varity of readers (especially young researcher) in physics, electronic engineering, material science and metallurgy.
Proceedings of the International Workshop on Physics and Technology of Thin Films
Author: Alireza Zaker Moshfegh
Publisher: World Scientific
ISBN: 9812702873
Category : Science
Languages : en
Pages : 549
Book Description
Thin films science and technology plays an important role in the high-tech industries. Thin film technology has been developed primarily for the need of the integrated circuit industry. The demand for development of smaller and smaller devices with higher speed especially in new generation of integrated circuits requires advanced materials and new processing techniques suitable for future giga scale integration (GSI) technology. In this regard, physics and technology of thin films can play an important role to acheive this goal. The production of thin films for device purposes has been developed over the past 40 years. Thin films as a two dimensional system are of great importance to many real-world problems. Their material costs are very small as compared to the corresponding bulk material and they perform the same function when it comes to surface processes. Thus, knowledge and determination of the nature, functions and new properties of thin films can be used for the development of new technologies for future applications. Thin film technology is based on three foundations: fabrication, characterization and applications. Some of the important applications of thin films are microelectronics, communication, optical electronics, catalysis, coating of all kinds, and energy generation and conservation strategies. This book emphasizes the importance of thin films and their properties for the new technologies. It presents basic principles, processes techniques and applications of thin films. As thin films physics and technology is a multidisciplinary field, the book will be useful to a wide varity of readers (especially young researcher) in physics, electronic engineering, material science and metallurgy. Contents: Deposition Processes; Characterization Techniques; Surface Processes; Nanomaterials; Optical Materials; Superconductivity; Magnetic Thin Films. Readership: Graduate students and researchers involved with the physics and technology of thin films.
Publisher: World Scientific
ISBN: 9812702873
Category : Science
Languages : en
Pages : 549
Book Description
Thin films science and technology plays an important role in the high-tech industries. Thin film technology has been developed primarily for the need of the integrated circuit industry. The demand for development of smaller and smaller devices with higher speed especially in new generation of integrated circuits requires advanced materials and new processing techniques suitable for future giga scale integration (GSI) technology. In this regard, physics and technology of thin films can play an important role to acheive this goal. The production of thin films for device purposes has been developed over the past 40 years. Thin films as a two dimensional system are of great importance to many real-world problems. Their material costs are very small as compared to the corresponding bulk material and they perform the same function when it comes to surface processes. Thus, knowledge and determination of the nature, functions and new properties of thin films can be used for the development of new technologies for future applications. Thin film technology is based on three foundations: fabrication, characterization and applications. Some of the important applications of thin films are microelectronics, communication, optical electronics, catalysis, coating of all kinds, and energy generation and conservation strategies. This book emphasizes the importance of thin films and their properties for the new technologies. It presents basic principles, processes techniques and applications of thin films. As thin films physics and technology is a multidisciplinary field, the book will be useful to a wide varity of readers (especially young researcher) in physics, electronic engineering, material science and metallurgy. Contents: Deposition Processes; Characterization Techniques; Surface Processes; Nanomaterials; Optical Materials; Superconductivity; Magnetic Thin Films. Readership: Graduate students and researchers involved with the physics and technology of thin films.
Modern Aspects of Electrochemistry 42
Author: Constantinos G. Vayenas
Publisher: Springer Science & Business Media
ISBN: 0387494898
Category : Science
Languages : en
Pages : 434
Book Description
This volume analyzes and summarizes recent developments in several key interfacial electrochemical systems in the areas of fuel cell electrocatatalysis, electrosynthesis and electrodeposition. The six Chapters are written by internationally recognized experts in these areas and address both fundamental and practical aspects of several existing or emerging key electrochemical technologies. The Chapter by R. Adzic, N. Marinkovic and M. Vukmirovic provides a lucid and authoritative treatment of the electrochemistry and electrocatalysis of Ruthenium, a key element for the devel- ment of efficient electrodes for polymer electrolyte (PEM) fuel cells. Starting from fundamental surface science studies and interfacial considerations, this up-to-date review by some of the pioneers in this field, provides a deep insight in the complex catalytic-electrocatalytic phenomena occurring at the interfaces of PEM fuel cell electrodes and a comprehensive treatment of recent developments in this extremely important field. Several recent breakthroughs in the design of solid oxide fuel cell (SOFC) anodes and cathodes are described in the Chapter of H. Uchida and M. Watanabe. The authors, who have pioneered several of these developments, provide a lucid presentation d- cribing how careful fundamental investigations of interfacial electrocatalytic anode and cathode phenomena lead to novel electrode compositions and microstructures and to significant practical advances of SOFC anode and cathode stability and enhanced electrocatalysis.
Publisher: Springer Science & Business Media
ISBN: 0387494898
Category : Science
Languages : en
Pages : 434
Book Description
This volume analyzes and summarizes recent developments in several key interfacial electrochemical systems in the areas of fuel cell electrocatatalysis, electrosynthesis and electrodeposition. The six Chapters are written by internationally recognized experts in these areas and address both fundamental and practical aspects of several existing or emerging key electrochemical technologies. The Chapter by R. Adzic, N. Marinkovic and M. Vukmirovic provides a lucid and authoritative treatment of the electrochemistry and electrocatalysis of Ruthenium, a key element for the devel- ment of efficient electrodes for polymer electrolyte (PEM) fuel cells. Starting from fundamental surface science studies and interfacial considerations, this up-to-date review by some of the pioneers in this field, provides a deep insight in the complex catalytic-electrocatalytic phenomena occurring at the interfaces of PEM fuel cell electrodes and a comprehensive treatment of recent developments in this extremely important field. Several recent breakthroughs in the design of solid oxide fuel cell (SOFC) anodes and cathodes are described in the Chapter of H. Uchida and M. Watanabe. The authors, who have pioneered several of these developments, provide a lucid presentation d- cribing how careful fundamental investigations of interfacial electrocatalytic anode and cathode phenomena lead to novel electrode compositions and microstructures and to significant practical advances of SOFC anode and cathode stability and enhanced electrocatalysis.
Proceedings of the 1st Euspen Topical Conference on Fabrication and Metrology in Nanotechnology, Copenhagen, May 28-30, 2000
Author:
Publisher:
ISBN:
Category : Manufacturing processes
Languages : en
Pages : 300
Book Description
Publisher:
ISBN:
Category : Manufacturing processes
Languages : en
Pages : 300
Book Description
Non-Crystalline Films for Device Structures
Author:
Publisher: Elsevier
ISBN: 0080542956
Category : Science
Languages : en
Pages : 279
Book Description
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Volume 29 consists of chapters pulled from Hari Singh Nalwa's forthcoming Handbook of Thin Film Materials (ISBN: 0-12-512908-4). The chapters were selected because they deal exclusively with amorphous film structures and because they have a common relevance to semiconductor, or electronic, devices and circuits. These are subjects not yet stressed in the Thin Films series.
Publisher: Elsevier
ISBN: 0080542956
Category : Science
Languages : en
Pages : 279
Book Description
Physics of Thin Films is one of the longest running continuing series in thin film science, consisting of 25 volumes since 1963. The series contains quality studies of the properties of various thin films materials and systems. In order to be able to reflect the development of today's science and to cover all modern aspects of thin films, the series, starting with Volume 20, has moved beyond the basic physics of thin films. It now addresses the most important aspects of both inorganic and organic thin films, in both their theoretical and their technological aspects. Volume 29 consists of chapters pulled from Hari Singh Nalwa's forthcoming Handbook of Thin Film Materials (ISBN: 0-12-512908-4). The chapters were selected because they deal exclusively with amorphous film structures and because they have a common relevance to semiconductor, or electronic, devices and circuits. These are subjects not yet stressed in the Thin Films series.