Author: U.S. Atomic Energy Commission. Division of Reactor Development
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 402
Book Description
Production of Hafnium
Author: H. P. Holmes
Publisher:
ISBN:
Category : Hafnium
Languages : en
Pages : 42
Book Description
Publisher:
ISBN:
Category : Hafnium
Languages : en
Pages : 42
Book Description
The Metallurgy of Hafnium
Author: U.S. Atomic Energy Commission. Division of Reactor Development
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 402
Book Description
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 402
Book Description
The Metallurgy of Hafnium
Author: U.S. Atomic Energy Commission
Publisher:
ISBN:
Category : Hafnium
Languages : en
Pages : 404
Book Description
Publisher:
ISBN:
Category : Hafnium
Languages : en
Pages : 404
Book Description
Production of Hafnium Concentrate by Adsorption
Author: Gerhard H. Beyer
Publisher:
ISBN:
Category : Hafnium
Languages : en
Pages : 20
Book Description
Publisher:
ISBN:
Category : Hafnium
Languages : en
Pages : 20
Book Description
Ferroelectricity in Doped Hafnium Oxide
Author: Uwe Schroeder
Publisher: Woodhead Publishing
ISBN: 0081024312
Category : Technology & Engineering
Languages : en
Pages : 570
Book Description
Ferroelectricity in Doped Hafnium Oxide: Materials, Properties and Devices covers all aspects relating to the structural and electrical properties of HfO2 and its implementation into semiconductor devices, including a comparison to standard ferroelectric materials. The ferroelectric and field-induced ferroelectric properties of HfO2-based films are considered promising for various applications, including non-volatile memories, negative capacitance field-effect-transistors, energy storage, harvesting, and solid-state cooling. Fundamentals of ferroelectric and piezoelectric properties, HfO2 processes, and the impact of dopants on ferroelectric properties are also extensively discussed in the book, along with phase transition, switching kinetics, epitaxial growth, thickness scaling, and more. Additional chapters consider the modeling of ferroelectric phase transformation, structural characterization, and the differences and similarities between HFO2 and standard ferroelectric materials. Finally, HfO2 based devices are summarized. Explores all aspects of the structural and electrical properties of HfO2, including processes, modelling and implementation into semiconductor devices Considers potential applications including FeCaps, FeFETs, NCFETs, FTJs and more Provides comparison of an emerging ferroelectric material to conventional ferroelectric materials with insights to the problems of downscaling that conventional ferroelectrics face
Publisher: Woodhead Publishing
ISBN: 0081024312
Category : Technology & Engineering
Languages : en
Pages : 570
Book Description
Ferroelectricity in Doped Hafnium Oxide: Materials, Properties and Devices covers all aspects relating to the structural and electrical properties of HfO2 and its implementation into semiconductor devices, including a comparison to standard ferroelectric materials. The ferroelectric and field-induced ferroelectric properties of HfO2-based films are considered promising for various applications, including non-volatile memories, negative capacitance field-effect-transistors, energy storage, harvesting, and solid-state cooling. Fundamentals of ferroelectric and piezoelectric properties, HfO2 processes, and the impact of dopants on ferroelectric properties are also extensively discussed in the book, along with phase transition, switching kinetics, epitaxial growth, thickness scaling, and more. Additional chapters consider the modeling of ferroelectric phase transformation, structural characterization, and the differences and similarities between HFO2 and standard ferroelectric materials. Finally, HfO2 based devices are summarized. Explores all aspects of the structural and electrical properties of HfO2, including processes, modelling and implementation into semiconductor devices Considers potential applications including FeCaps, FeFETs, NCFETs, FTJs and more Provides comparison of an emerging ferroelectric material to conventional ferroelectric materials with insights to the problems of downscaling that conventional ferroelectrics face
Zirconium and Hafnium
Author:
Publisher:
ISBN:
Category : Hafnium
Languages : en
Pages : 14
Book Description
Publisher:
ISBN:
Category : Hafnium
Languages : en
Pages : 14
Book Description
Production of Bimetal-reduced Hafnium
Author: Dale W. Richardson
Publisher:
ISBN:
Category : Hafnium
Languages : en
Pages : 30
Book Description
Publisher:
ISBN:
Category : Hafnium
Languages : en
Pages : 30
Book Description
Production of Hafnium
Author: H. P. Holmes
Publisher:
ISBN:
Category :
Languages : en
Pages : 31
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 31
Book Description
Development of a Process for the Production of a High Hafnium Concentrate
Author: Alfred Jacobs
Publisher:
ISBN:
Category : Hafnium oxide
Languages : en
Pages : 34
Book Description
Publisher:
ISBN:
Category : Hafnium oxide
Languages : en
Pages : 34
Book Description
Hafnium in Nuclear Engineering
Author: V. D. Risovany
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 128
Book Description
The practical interest in hafnium expressed by nuclear engineers, and the recently increased number of scientific publications on the subject make a systematic work of collected data very important and timely. Along with results already published, this book includes original data obtained by the authors on hafnium radiation and corrosion resistance. Attention was paid to the mail features of hafnium production as well as the subsequent fabrication technologies, since the performance of hafnium components strongly depends on the properties of the original materials.
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 128
Book Description
The practical interest in hafnium expressed by nuclear engineers, and the recently increased number of scientific publications on the subject make a systematic work of collected data very important and timely. Along with results already published, this book includes original data obtained by the authors on hafnium radiation and corrosion resistance. Attention was paid to the mail features of hafnium production as well as the subsequent fabrication technologies, since the performance of hafnium components strongly depends on the properties of the original materials.