Proceedings of the Symposium on Electron and Ion Beam Science and Technology; International Conference PDF Download
Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download Proceedings of the Symposium on Electron and Ion Beam Science and Technology; International Conference PDF full book. Access full book title Proceedings of the Symposium on Electron and Ion Beam Science and Technology; International Conference by . Download full books in PDF and EPUB format.
Author:
Publisher:
ISBN:
Category : Electron beams
Languages : en
Pages : 1048
Get Book Here
Book Description
Author:
Publisher:
ISBN:
Category : Electron beams
Languages : en
Pages : 1048
Get Book Here
Book Description
Author:
Publisher:
ISBN:
Category : Electron beams
Languages : en
Pages : 288
Get Book Here
Book Description
Author:
Publisher:
ISBN:
Category : Electron beams
Languages : en
Pages : 572
Get Book Here
Book Description
Author:
Publisher:
ISBN:
Category : Nuclear energy
Languages : en
Pages : 658
Get Book Here
Book Description
Author: Vivek Bakshi
Publisher: SPIE Press
ISBN: 0819469645
Category : Art
Languages : en
Pages : 704
Get Book Here
Book Description
Editorial Review Dr. Bakshi has compiled a thorough, clear reference text covering the important fields of EUV lithography for high-volume manufacturing. This book has resulted from his many years of experience in EUVL development and from teaching this subject to future specialists. The book proceeds from an historical perspective of EUV lithography, through source technology, optics, projection system design, mask, resist, and patterning performance, to cost of ownership. Each section contains worked examples, a comprehensive review of challenges, and relevant citations for those who wish to further investigate the subject matter. Dr. Bakshi succeeds in presenting sometimes unfamiliar material in a very clear manner. This book is also valuable as a teaching tool. It has become an instant classic and far surpasses others in the EUVL field. --Dr. Akira Endo, Chief Development Manager, Gigaphoton Inc. Description Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists. This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field. Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology. About the editor of EUV Lithography Dr. Vivek Bakshi previously served as a senior member of the technical staff at SEMATECH; he is now president of EUV Litho, Inc., in Austin, Texas.
Author: ASM International
Publisher: ASM International
ISBN: 1627082735
Category : Technology & Engineering
Languages : en
Pages : 540
Get Book Here
Book Description
The theme for the 2019 conference is Novel Computing Architectures. Papers will include discussions on the advent of Artificial Intelligence and the promise of quantum computing that are driving disruptive computing architectures; Neuromorphic chip designs on one hand, and Quantum Bits on the other, still in R&D, will introduce new computing circuitry and memory elements, novel materials, and different test methodologies. These novel computing architectures will require further innovation which is best achieved through a collaborative Failure Analysis community composed of chip manufacturers, tool vendors, and universities.
Author: Karpuzov D S
Publisher: #N/A
ISBN: 9814556572
Category :
Languages : en
Pages : 604
Get Book Here
Book Description
Author: Robert Bakish
Publisher: The Electrochemical Society
ISBN:
Category : Electron beam welding
Languages : en
Pages : 644
Get Book Here
Book Description
Author: Bernd Schmidt
Publisher: Springer Science & Business Media
ISBN: 3211993568
Category : Technology & Engineering
Languages : en
Pages : 425
Get Book Here
Book Description
A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.
Author: United States. Energy Research and Development Administration
Publisher:
ISBN:
Category : Medicine
Languages : en
Pages : 988
Get Book Here
Book Description
