Author: Marc Heyns
Publisher:
ISBN:
Category : Contamination control
Languages : en
Pages : 388
Book Description
Proceedings of the Second International Symposium on Ultra-Clean Processing of Silicon Surfaces
Author: Marc Heyns
Publisher:
ISBN:
Category : Contamination control
Languages : en
Pages : 388
Book Description
Publisher:
ISBN:
Category : Contamination control
Languages : en
Pages : 388
Book Description
Proceedings of the Fifth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
Author: Jerzy Rużyłło
Publisher: The Electrochemical Society
ISBN: 9781566771887
Category : Technology & Engineering
Languages : en
Pages : 668
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566771887
Category : Technology & Engineering
Languages : en
Pages : 668
Book Description
Proceedings of the Fourth International Symposium on Cleaning Technology in Semiconductor Device Manufacturing
Author: Richard E. Novak
Publisher: The Electrochemical Society
ISBN: 9781566771153
Category : Technology & Engineering
Languages : en
Pages : 642
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566771153
Category : Technology & Engineering
Languages : en
Pages : 642
Book Description
Handbook of Semiconductor Manufacturing Technology
Author: Yoshio Nishi
Publisher: CRC Press
ISBN: 1420017667
Category : Technology & Engineering
Languages : en
Pages : 1722
Book Description
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
Publisher: CRC Press
ISBN: 1420017667
Category : Technology & Engineering
Languages : en
Pages : 1722
Book Description
Retaining the comprehensive and in-depth approach that cemented the bestselling first edition's place as a standard reference in the field, the Handbook of Semiconductor Manufacturing Technology, Second Edition features new and updated material that keeps it at the vanguard of today's most dynamic and rapidly growing field. Iconic experts Robert Doering and Yoshio Nishi have again assembled a team of the world's leading specialists in every area of semiconductor manufacturing to provide the most reliable, authoritative, and industry-leading information available. Stay Current with the Latest Technologies In addition to updates to nearly every existing chapter, this edition features five entirely new contributions on... Silicon-on-insulator (SOI) materials and devices Supercritical CO2 in semiconductor cleaning Low-κ dielectrics Atomic-layer deposition Damascene copper electroplating Effects of terrestrial radiation on integrated circuits (ICs) Reflecting rapid progress in many areas, several chapters were heavily revised and updated, and in some cases, rewritten to reflect rapid advances in such areas as interconnect technologies, gate dielectrics, photomask fabrication, IC packaging, and 300 mm wafer fabrication. While no book can be up-to-the-minute with the advances in the semiconductor field, the Handbook of Semiconductor Manufacturing Technology keeps the most important data, methods, tools, and techniques close at hand.
Proceedings of the Third International Symposium on Defects in Silicon
Author: Takao Abe
Publisher: The Electrochemical Society
ISBN: 9781566772235
Category : Science
Languages : en
Pages : 548
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566772235
Category : Science
Languages : en
Pages : 548
Book Description
Proceedings of the Second International Symposium on Silicon Molecular Beam Epitaxy
Author: John Condon Bean
Publisher:
ISBN:
Category : Epitaxy
Languages : en
Pages : 682
Book Description
Publisher:
ISBN:
Category : Epitaxy
Languages : en
Pages : 682
Book Description
Proceedings of the Electrochemical Society Symposium on Diagnostic Techniques for Semiconductor Materials and Devices
Author: P. Rai-Choudhury
Publisher: The Electrochemical Society
ISBN: 9781566771399
Category : Technology & Engineering
Languages : en
Pages : 496
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566771399
Category : Technology & Engineering
Languages : en
Pages : 496
Book Description
Ultra Clean Processing of Silicon Surfaces ...
Author:
Publisher:
ISBN:
Category : Contamination control
Languages : en
Pages : 426
Book Description
Publisher:
ISBN:
Category : Contamination control
Languages : en
Pages : 426
Book Description
Rntgen Centennial
Author: A. Haase
Publisher: World Scientific
ISBN: 9789810230852
Category : Science
Languages : en
Pages : 726
Book Description
To honour W C Rntgen and review the entire area of X-ray development in the various fields of natural, technical, and life sciences, his successors at the Physikalisches Institut of the Universitt Wrzburg organized a conference, named ?Rntgen Centennial?. It took place at the new ?Physikalisches Institut? not far from the historical site shortly before the actual 100th anniversary of the discovery. Over forty renowned scientists were invited as representative speakers in the various subfields of X-ray activities. They reviewed the development, gave examples, and described the present status. Most of them provided survey articles, which are gathered in this book. Since most X-ray-related activities are somehow represented, an almost complete overview of the entire field is provided. This book thus represents the enormous breadth of X-ray activities and allows one to recognize the potential and quality of today's X-ray research.
Publisher: World Scientific
ISBN: 9789810230852
Category : Science
Languages : en
Pages : 726
Book Description
To honour W C Rntgen and review the entire area of X-ray development in the various fields of natural, technical, and life sciences, his successors at the Physikalisches Institut of the Universitt Wrzburg organized a conference, named ?Rntgen Centennial?. It took place at the new ?Physikalisches Institut? not far from the historical site shortly before the actual 100th anniversary of the discovery. Over forty renowned scientists were invited as representative speakers in the various subfields of X-ray activities. They reviewed the development, gave examples, and described the present status. Most of them provided survey articles, which are gathered in this book. Since most X-ray-related activities are somehow represented, an almost complete overview of the entire field is provided. This book thus represents the enormous breadth of X-ray activities and allows one to recognize the potential and quality of today's X-ray research.
Ultra Clean Processing of Semiconductor Surfaces XVI
Author: Paul Mertens
Publisher: Trans Tech Publications Ltd
ISBN: 303641312X
Category : Science
Languages : en
Pages : 363
Book Description
Selected peer-reviewed full text papers from the 16th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS 2023) Selected peer-reviewed full text papers from the 16th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS 2023), September 12-14, 2023, Brugge, Belgium
Publisher: Trans Tech Publications Ltd
ISBN: 303641312X
Category : Science
Languages : en
Pages : 363
Book Description
Selected peer-reviewed full text papers from the 16th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS 2023) Selected peer-reviewed full text papers from the 16th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS 2023), September 12-14, 2023, Brugge, Belgium