Author: Norhidayah Ahmad Wazir
Publisher:
ISBN:
Category : Cadmium selenide
Languages : en
Pages : 346

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Author: Chee Siong Koo
Publisher:
ISBN:
Category : Electroplating
Languages : en
Pages : 236

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Author: Yi-Chyi Wu
Publisher:
ISBN:
Category :
Languages : en
Pages : 488

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Author: Milan Paunovic
Publisher: The Electrochemical Society
ISBN: 9781566771696
Category : Technology & Engineering
Languages : en
Pages : 328

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Author: Denish Gangasingh
Publisher:
ISBN:
Category :
Languages : en
Pages : 276

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Author: Xiaoyue Zhang
Publisher:
ISBN:
Category :
Languages : en
Pages : 310

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This dissertation discusses the formation of cadmium telluride (CdTe) using potential pulse atomic layer deposition (PP-ALD) and metal thin films (copper and gold) using surface limited redox replacement (SLRR). Both materials play important roles in photovoltaic devices. PP-ALD is an electrodeposition methodology similar to co-deposition because it uses one solution containing all precursors. However, instead of maintaining one deposition potential as with codeposition, potentials are varied quickly between a cathodic and an anodic potential throughout deposition. Each short pulse aims to limit the amount deposited during cathodic potential and strip the excess in the following anodic potential so that thermodynamically stable compound remains without elemental excess buried beneath the later-grown film. To achieve high quality CdTe thin film, changes in deposition potential and solution flow effects were first monitored and optimized. Parametric variables for controlling the Cd/Te ratio and morphology are also established. X-ray diffraction (XRD), Scanning electron microscope (SEM), Electron probe microanalysis (EPMA), Energy dispersive X-Ray Analyzer (EDX) were used to characterize the resulting CdTe films. Results indicated that deposited CdTe was stoichiometric, high crystalline with a smooth, continuous morphology using an optimized PP-ALD method. The optimized PP-ALD method was also applied on nanostructured Au electrodes. Initial results showed high quality deposits with reproducible stoichiometry, which could open pathways for semiconductor and nanostructure incorporation. Cu and Au thin films were formed on metal and semiconductor substrates via surface limited redox replacement (SLRR). An atomic layer of cadmium was first deposited as a sacrificial layer, and then replaced with ions of more noble metals such as Cu2+ or Au3+ to form Cu or Au atomic layer. Uniform and reasonably flat metal thin films with controllable thickness were produced by multiple repetitions of SLRR cycles with great linear growth with respect to cycle numbers. The resulting metal thin films were characterized using coulometry, SEM, EDX and EPMA. They confirmed deposited metal thin films had a conformal, flat morphology with no roughness development, nor Cd incorporation in the deposition process.

Author: Ashwin Seshadri Kalathur
Publisher:
ISBN: 9780542226830
Category : Materials science
Languages : en
Pages :

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Cadmium oxide (CdO) and (CdO)x(ZnO)1-x mixed semiconductor films were cathodically electrodeposited for the first time on F-doped SnO2 substrates. The CdO thin films were deposited from an aqueous 0.1 M KCl medium containing dissolved Cd2+ species and O2. The (CdO)x(ZnO)1-x mixed oxide films were deposited from a bath which contained Zn2+ in addition to the CdO bath constituents. Films were potentiostatically deposited at 80°C followed by a post-deposition thermal anneal at 450°C. The mechanism of the electrodeposition was explored using cyclic voltammetry. These samples were then analyzed by X-ray diffraction, scanning electron microscopy, and UV-visible reflectance spectrophotometry. The photoelectrochemical behavior of these films is also presented. ZnO electrodeposition was carried out as a prelude to the main topic of this thesis research.

Author: Ronen Polsky
Publisher:
ISBN:
Category : Electrochemistry
Languages : en
Pages :

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Author: R.K. Pandey
Publisher: CRC Press
ISBN: 1351838318
Category : Technology & Engineering
Languages : en
Pages : 304

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Aiming to bridge the gap in understanding between professional electrochemists and hard-core semiconductor physicists and material scientists, this book examines the science and technology of semiconductor electrode-positioning. Summarizing state-of-the-art information concerning a wide variety of semiconductors, it reviews fundamental electrodeposition concepts and terminology.

Author:
Publisher:
ISBN:
Category : Physics
Languages : en
Pages : 1170

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