Plasma-Surface Interactions and Processing of Materials PDF Download
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Author: O. Auciello
Publisher: Springer Science & Business Media
ISBN: 9400919468
Category : Science
Languages : en
Pages : 548
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Book Description
An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.
Author: O. Auciello
Publisher: Springer Science & Business Media
ISBN: 9400919468
Category : Science
Languages : en
Pages : 548
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Book Description
An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.
Author: Dirk Naujoks
Publisher: Springer Science & Business Media
ISBN: 3540321497
Category : Technology & Engineering
Languages : en
Pages : 279
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Book Description
This book deals with the specific contact between the fourth state of matter, i.e. plasma, and the first state of matter, i.e. a solid wall, in controlled fusion experiments. A comprehensive analysis of the main processes of plasma-surface interaction is given together with an assessment of the most critical questions within the context of general criteria and operation limits. It also contains a survey on other important aspects in nuclear fusion.
Author: Tetsuo Tanabe
Publisher: Springer Nature
ISBN: 9811603286
Category : Science
Languages : en
Pages : 209
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Book Description
This book is a primer on the interplay between plasma and materials in a fusion reactor, so-called plasma–materials interactions (PMIs), highlighting materials and their influence on plasma through PMI. It aims to demonstrate that a plasma-facing surface (PFS) responds actively to fusion plasma and that the clarifying nature of PFS is indispensable to understanding the influence of PFS on plasma. It describes the modern insight into PMI, namely, relevant feedback to plasma performance from plasma-facing material (PFM) on changes in a material surface by plasma power load by radiation and particles, contrary to a conventional view that unilateral influence from plasma on PFM is dominant in PMI. There are many books and reviews on PMI in the context of plasma physics, that is, how plasma or plasma confinement works in PMI. By contrast, this book features a materials aspect in PMI focusing on changes caused by heat and particle load from plasma: how PFMs are changed by plasma exposure and then, accordingly, how the changed PFM interacts with plasma.
Author: R.J. Shul
Publisher: Springer Science & Business Media
ISBN: 3642569897
Category : Technology & Engineering
Languages : en
Pages : 664
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Book Description
Pattern transfer by dry etching and plasma-enhanced chemical vapor de position are two of the cornerstone techniques for modern integrated cir cuit fabrication. The success of these methods has also sparked interest in their application to other techniques, such as surface-micromachined sen sors, read/write heads for data storage and magnetic random access memory (MRAM). The extremely complex chemistry and physics of plasmas and their interactions with the exposed surfaces of semiconductors and other materi als is often overlooked at the manufacturing stage. In this case, the process is optimized by an informed "trial-and-error" approach which relies heavily on design-of-experiment techniques and the intuition of the process engineer. The need for regular cleaning of plasma reactors to remove built-up reaction or precursor gas products adds an extra degree of complexity because the interaction of the reactive species in the plasma with the reactor walls can also have a strong effect on the number of these species available for etching or deposition. Since the microelectronics industry depends on having high process yields at each step of the fabrication process, it is imperative that a full understanding of plasma etching and deposition techniques be achieved.
Author: Yves Pauleau
Publisher: Elsevier
ISBN: 0080458963
Category : Technology & Engineering
Languages : en
Pages : 745
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Book Description
The current status of the science and technology related to coatings, thin films and surface modifications produced by directed energy techniques is assessed in Materials Surface Processing by Directed Energy Techniques. The subject matter is divided into 20 chapters - each presented at a tutorial level – rich with fundamental science and experimental results. New trends and new results are also evoked to give an overview of future developments and applications. - Provides a broad overview on modern coating and thin film deposition techniques, and their applications - Presents and discusses various problems of physics and chemistry involved in the production, characterization and applications of coatings and thin films - Each chapter includes experimental results illustrating various models, mechanisms or theories
Author: National Research Council
Publisher: National Academies Press
ISBN: 0309045975
Category : Technology & Engineering
Languages : en
Pages : 88
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Book Description
Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
Author: Riccardo d'Agostino
Publisher: Elsevier
ISBN: 0323139086
Category : Technology & Engineering
Languages : en
Pages : 544
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Book Description
Plasma Deposition, Treatment, and Etching of Polymers takes a broad look at the basic principles, the chemical processes, and the diagnostic procedures in the interaction of plasmas with polymer surfaces. This recent technology has yielded a large class of new materials offering many applications, including their use as coatings for chemical fibers and films. Additional applications include uses for the passivation of metals, the surface hardening of tools, increased biocompatibility of biomedical materials, chemical and physical sensors, and a variety of micro- and optoelectronic devices. - Appeals to a broad range of industries from microelectronics to space technology - Discusses a wide array of new uses for plasma polymers - Provides a tutorial introduction to the field - Surveys various classes of plasma polymers, their chemical and morphological properties, effects of plasma process parameters on the growth and structure of these synthetic materials, and techniques for characterization - Interests scientists, engineers, and students alike
Author: National Academies of Sciences Engineering and Medicine
Publisher:
ISBN: 9780309677608
Category :
Languages : en
Pages : 291
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Book Description
Plasma Science and Engineering transforms fundamental scientific research into powerful societal applications, from materials processing and healthcare to forecasting space weather. Plasma Science: Enabling Technology, Sustainability, Security and Exploration discusses the importance of plasma research, identifies important grand challenges for the next decade, and makes recommendations on funding and workforce. This publication will help federal agencies, policymakers, and academic leadership understand the importance of plasma research and make informed decisions about plasma science funding, workforce, and research directions.
Author: Annemie Bogaerts
Publisher: MDPI
ISBN: 3038977500
Category : Technology & Engineering
Languages : en
Pages : 248
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Book Description
Plasma catalysis is gaining increasing interest for various gas conversion applications, such as CO2 conversion into value-added chemicals and fuels, N2 fixation for the synthesis of NH3 or NOx, methane conversion into higher hydrocarbons or oxygenates. It is also widely used for air pollution control (e.g., VOC remediation). Plasma catalysis allows thermodynamically difficult reactions to proceed at ambient pressure and temperature, due to activation of the gas molecules by energetic electrons created in the plasma. However, plasma is very reactive but not selective, and thus a catalyst is needed to improve the selectivity. In spite of the growing interest in plasma catalysis, the underlying mechanisms of the (possible) synergy between plasma and catalyst are not yet fully understood. Indeed, plasma catalysis is quite complicated, as the plasma will affect the catalyst and vice versa. Moreover, due to the reactive plasma environment, the most suitable catalysts will probably be different from thermal catalysts. More research is needed to better understand the plasma–catalyst interactions, in order to further improve the applications.
Author: Stephen M. Rossnagel
Publisher: William Andrew
ISBN: 9780815512202
Category : Reference
Languages : en
Pages : 523
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Book Description
This is a comprehensive overview of the technology of plasma-based processing, written by an outstanding group of 29 contributors.
