Principles of Chemical Vapor Deposition PDF Download
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Author: Daniel Dobkin
Publisher: Springer Science & Business Media
ISBN: 9781402012488
Category : Technology & Engineering
Languages : en
Pages : 298
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Book Description
Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Author: Daniel Dobkin
Publisher: Springer Science & Business Media
ISBN: 9781402012488
Category : Technology & Engineering
Languages : en
Pages : 298
Get Book Here
Book Description
Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
Author: Lech Pawlowski
Publisher: John Wiley & Sons
ISBN: 1119423678
Category : Technology & Engineering
Languages : en
Pages : 414
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Book Description
Valuable insights into the extraction, production, and properties of a large number of natural and synthetic oxides utilized in applications worldwide from ceramics, electronic components, and coatings This handbook describes each of the major oxides chronologically—starting from the processes of extraction of ores containing oxides, their purification and transformations into pure alloyed powders, and their appropriate characterization up to the processes of formation of 2D films by such methods as PVD, CVD, and coatings by thermal spraying or complicated 3D objects by sintering and rapid prototyping. The selection of oxides has been guided by the current context of industrial applications. An important point that is considered in the book concerns the strategic aspects of oxides. Some oxides (e.g. rare earth ones) become more expensive due to the growing demand for them, others, because of the strategic importance of countries producing raw materials and the countries that are using them. Industrial Chemistry of Oxides for Emerging Applications provides readers with everything they need to know in 7 chapters that cover: technical and economical importance of oxides in present and future; fundamentals of oxides manufacturing; extraction, properties, and applications of Al2O3; extraction, properties, and applications of ZrO2; synthesis, properties, and applications of YBaCu2O7x; extraction, properties, and applications of TiO2; and synthesis, properties, and application of hydroxyapatite. Presents the extraction, production, and properties of a large fraction of oxides applications worldwide, both natural as well as synthetic multi‐oxides Covers a very important segment of many industrial processes, such as refractories and piezoelectric oxides—both applications constituting very large market segments Developed from a lecture course given by the authors for over a decade Industrial Chemistry of Oxides for Emerging Applications is an excellent text for university professors and teachers, and graduate and postgraduate students with a solid background in physics and chemistry.
Author: David Glocker
Publisher: John Wiley & Sons
ISBN: 1119308674
Category : Technology & Engineering
Languages : en
Pages : 796
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Book Description
Medical Coatings and Deposition Technologies is an important new addition to the libraries of medical device designers and manufacturers. Coatings enable the properties of the surface of a device to be controlled independently from the underlying bulk properties; they are often critical to the performance of the device and their use is rapidly growing. This book provides an introduction to many of the most important types of coatings used on modern medical devices as well as descriptions of the techniques by which they are applied and methods for testing their efficacy. Developers of new medical devices and those responsible for producing them will find it an important reference when deciding if a particular functionality can be provided by a coating and what limitations may apply in a given application. Written as a practical guide and containing many specific coating examples and a large number of references for further reading, the book will also be useful to students in materials science & engineering with an interest in medical devices. Chapters on antimicrobial coatings as well as coatings for biocompatibility, drug delivery, radiopacity and hardness are supported by chapters describing key liquid coating processes, plasma-based processes and chemical vapor deposition. Many types of coatings can be applied by more than one technique and the reader will learn the tradeoffs given the relevant design, manufacturing and economic constraints. The chapter on regulatory considerations provides important perspectives regarding the marketing of these coatings and medical devices.
Author: Francisco L. Tabarés
Publisher: CRC Press
ISBN: 1000245217
Category : Science
Languages : en
Pages : 322
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Book Description
This book is an up-to-date review of the most important plasma-based techniques for material modification, from microelectronics to biological materials and from fusion plasmas to atmospheric ones. Each its technical chapters is written by long-experienced, internationally recognised researchers. The book provides a deep and comprehensive insight into plasma technology and its associated elemental processes and is illustrated throughout with excellent figures and references to complement each section. Although some of the topics covered can be traced back several decades, care has been taken to emphasize the most recent findings and expected evolution. The first time the word ‘plasma’ appeared in print in a scientific text related to the study of electrical discharges in gases was 1928, when Irving Langmuir published his article ‘Oscillations in Ionized Gases’. It was the baptism of the predominant state of matter in the known universe (it is estimated that up to 99% of matter is plasma), although not on earth, where the conditions of pressure and temperature make normal the states of matter (solid, liquid, gas) which, in global terms, are exotic. It is enough to add energy to a solid (in the form of heat or electromagnetic radiation) to go into the liquid state, from which gas is obtained through an additional supply of energy. If we continue adding energy to the gas, we will partially or totally ionise it and reach a new state of matter, plasma, made up of free electrons, atoms and molecules (electrically neutral particles) and ions (endowed with a positive or a negative electric charge).
Author: Charles Bakis
Publisher: DEStech Publications, Inc
ISBN: 1605951072
Category : Technology & Engineering
Languages : en
Pages : 1892
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Book Description
New and unpublished U.S. and international research on multifunctional, active, biobased, SHM, self-healing composites -- from nanolevel to large structures New information on modeling, design, computational engineering, manufacturing, testing Applications to aircraft, bridges, concrete, medicine, body armor, wind energy This fully searchable CD-ROM contains 135 original research papers on all phases of composite materials. The document provides cutting edge research by US, Canadian, and Japanese authorities on matrix-based and fiber composites from design to damage analysis and detection. Major divisions of the work include: Structural Health Monitoring, Multifunctional Composites, Integrated Computational Materials Engineering, Interlaminar Testing, Analysis-Shell Structures, Thermoplastic Matrices, Analysis Non-classical Laminates, Bio-Based Composites, Electrical Properties, Dynamic Behavior, Damage/Failure, Compression-Testing, Active Composites, 3D Reinforcement, Dielectric Nanocomposites, Micromechanical Analysis, Processing, CM Reinforcement for Concrete, Environmental Effects, Phase-Transforming, Molecular Modeling, Impact.
Author: Krishna Seshan
Publisher: William Andrew
ISBN: 0128123125
Category : Technology & Engineering
Languages : en
Pages : 472
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Book Description
Handbook of Thin Film Deposition, Fourth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, materials for memory applications and methods for thin film optical processes. The book is broken up into three sections: scaling, equipment and processing, and applications. In this newly revised edition, the handbook will also explore the limits of thin film applications, most notably as they relate to applications in manufacturing, materials, design and reliability. - Offers a practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance, applications and the limitations faced by those processes - Covers core processes and applications in the semiconductor industry and new developments within the photovoltaic and optical thin film industries - Features a new chapter discussing Gates Dielectrics
Author: Dominic Schepis
Publisher: Elsevier
ISBN: 044313524X
Category : Technology & Engineering
Languages : en
Pages : 428
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Book Description
Handbook of Thin Film Deposition, Fifth Edition, is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry. When pursuing patents, there is a phase called 'reduction to practice' where the idea for a technology transitions from a concept to actual use. The section 'Thin Film Reduction to Practice' includes chapters that review the most relevant methods to fabricate thin films towards practical applications. Then, the latest applications of thin film deposition technologies are discussed. Handbook of Thin Film Deposition, 5th Edition is suitable for materials scientists and engineers in academia and working in semiconductor R&D. - Offers a practical survey of thin film technologies including design, fabrication, and reliability - Covers core processes and applications in the semiconductor industry and discusses latest advances in new thin film development - Features new chapters that review methods on front-end and back-end thin films
Author: Cheol Seong Hwang
Publisher: Springer Science & Business Media
ISBN: 146148054X
Category : Science
Languages : en
Pages : 266
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Book Description
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Author: Frederick Vratny
Publisher:
ISBN:
Category : Dielectrics
Languages : en
Pages : 669
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Book Description
Author: Kingsley Ukoba
Publisher: CRC Press
ISBN: 100099919X
Category : Technology & Engineering
Languages : en
Pages : 287
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Book Description
Thin Films, Atomic Layer Deposition, and 3D Printing explains the concept of thin films, atomic layers deposition, and the Fourth Industrial Revolution (4IR) with an aim to illustrate existing resources and give a broader perspective of the involved processes as well as provide a selection of different types of 3D printing, materials used for 3D printing, emerging trends and applications, and current top-performing 3D printers using different technologies. It covers the concept of the 4IR and its role in current and future human endeavors for both experts/nonexperts. The book includes figures, diagrams, and their applications in real-life situations. Features: Provides comprehensive material on conventional and emerging thin film, atomic layer, and additive technologies. Discusses the concept of Industry 4.0 in thin films technology. Details the preparation and properties of hybrid and scalable (ultra) thin materials for advanced applications. Explores detailed bibliometric analyses on pertinent applications. Interconnects atomic layer deposition and additive manufacturing. This book is aimed at researchers and graduate students in mechanical, materials, and metallurgical engineering.
