Author: Ivo Utke
Publisher: OUP USA
ISBN: 0199734216
Category : Technology & Engineering
Languages : en
Pages : 830
Book Description
This book comprehensively reviews the achievements and potentials of a minimally invasive, three-dimensional, and maskless surface structuring technique operating at nanometer scale by using the interaction of focused ion and electron beams (FIB/FEB) with surfaces and injected molecules.
Nanofabrication Using Focused Ion and Electron Beams
Author: Ivo Utke
Publisher: OUP USA
ISBN: 0199734216
Category : Technology & Engineering
Languages : en
Pages : 830
Book Description
This book comprehensively reviews the achievements and potentials of a minimally invasive, three-dimensional, and maskless surface structuring technique operating at nanometer scale by using the interaction of focused ion and electron beams (FIB/FEB) with surfaces and injected molecules.
Publisher: OUP USA
ISBN: 0199734216
Category : Technology & Engineering
Languages : en
Pages : 830
Book Description
This book comprehensively reviews the achievements and potentials of a minimally invasive, three-dimensional, and maskless surface structuring technique operating at nanometer scale by using the interaction of focused ion and electron beams (FIB/FEB) with surfaces and injected molecules.
Applied Scanning Probe Methods VIII
Author: Bharat Bhushan
Publisher: Springer Science & Business Media
ISBN: 3540740805
Category : Technology & Engineering
Languages : en
Pages : 512
Book Description
The volumes VIII, IX and X examine the physical and technical foundation for recent progress in applied scanning probe techniques. This is the first book to summarize the state-of-the-art of this technique. The field is progressing so fast that there is a need for a set of volumes every 12 to 18 months to capture latest developments. These volumes constitute a timely comprehensive overview of SPM applications.
Publisher: Springer Science & Business Media
ISBN: 3540740805
Category : Technology & Engineering
Languages : en
Pages : 512
Book Description
The volumes VIII, IX and X examine the physical and technical foundation for recent progress in applied scanning probe techniques. This is the first book to summarize the state-of-the-art of this technique. The field is progressing so fast that there is a need for a set of volumes every 12 to 18 months to capture latest developments. These volumes constitute a timely comprehensive overview of SPM applications.
The Chemistry of Metal CVD
Author: Toivo T. Kodas
Publisher: John Wiley & Sons
ISBN: 3527615849
Category : Technology & Engineering
Languages : en
Pages : 562
Book Description
High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.
Publisher: John Wiley & Sons
ISBN: 3527615849
Category : Technology & Engineering
Languages : en
Pages : 562
Book Description
High purity, thin metal coatings have a variety of important commercial applications, for example, in the microelectronics industry, as catalysts, as protective and decorative coatings as well as in gas-diffusion barriers. This book offers detailed, up- to-date coverage of the chemistry behind the vapor deposition of different metals from organometallic precursors. In nine chapters, the CVD of metals including aluminum, tungsten, gold, silver, platinum, palladium, nickel, as well as copper from copper(I) and copper(II) compounds is covered. The synthesis and properties of the precursors, the growth process, morphology, quality and adhesion of the resulting films as well as laser- assisted, ion- assisted and plasma-assisted methods are discussed. Present applications and prospects for future developments are summarized. With ca. 1000 references and a glossary, this book is a unique source of in-depth information. It is indispensable for chemists, physicists, engineers and materials scientists working with metal- coating processes and technologies. From Reviews: 'I highly recommend this book to anyone interested in learning more about the chemistry of metal CVD.' J. Am Chem. Soc.
Liquid Cell Electron Microscopy
Author: Frances M. Ross
Publisher: Cambridge University Press
ISBN: 1107116570
Category : Science
Languages : en
Pages : 529
Book Description
2.6.2 Electrodes for Electrochemistry
Publisher: Cambridge University Press
ISBN: 1107116570
Category : Science
Languages : en
Pages : 529
Book Description
2.6.2 Electrodes for Electrochemistry
Nanofabrication Using Focused Ion and Electron Beams
Author: Ivo Utke
Publisher: Oxford University Press
ISBN: 0199920990
Category : Technology & Engineering
Languages : en
Pages : 830
Book Description
Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.
Publisher: Oxford University Press
ISBN: 0199920990
Category : Technology & Engineering
Languages : en
Pages : 830
Book Description
Nanofabrication Using Focused Ion and Electron Beams presents fundamentals of the interaction of focused ion and electron beams (FIB/FEB) with surfaces, as well as numerous applications of these techniques for nanofabrication involving different materials and devices. The book begins by describing the historical evolution of FIB and FEB systems, applied first for micro- and more recently for nanofabrication and prototyping, practical solutions available in the market for different applications, and current trends in development of tools and their integration in a fast growing field of nanofabrication and nanocharacterization. Limitations of the FIB/FEB techniques, especially important when nanoscale resolution is considered, as well as possible ways to overcome the experimental difficulties in creating new nanodevices and improving resolution of processing, are outlined. Chapters include tutorials describing fundamental aspects of the interaction of beams (FIB/FEB) with surfaces, nanostructures and adsorbed molecules; electron and ion beam chemistries; basic theory, design and configuration of equipment; simulations of processes; basic solutions for nanoprototyping. Emerging technologies as processing by cluster beams are also discussed. In addition, the book considers numerous applications of these techniques (milling, etching, deposition) for nanolithography, nanofabrication and characterization, involving different nanostructured materials and devices. Its main focus is on practical details of using focused ion and electron beams with gas assistance (deposition and etching) and without gas assistance (milling/cutting) for fabrication of devices from the fields of nanoelectronics, nanophotonics, nanomagnetics, functionalized scanning probe tips, nanosensors and other types of NEMS (nanoelectromechanical systems). Special attention is given to strategies designed to overcome limitations of the techniques (e.g., due to damaging produced by energetic ions interacting with matter), particularly those involving multi-step processes and multi-layer materials. Through its thorough demonstration of fundamental concepts and its presentation of a wide range of technologies developed for specific applications, this volume is ideal for researches from many different disciplines, as well as engineers and professors in nanotechnology and nanoscience.
Microbeam Analysis
Author: D Williams
Publisher: CRC Press
ISBN: 9780750306850
Category : Science
Languages : en
Pages : 546
Book Description
Microbeam Analysis provides a major forum for the discussion of the latest microanalysis techniques using electron, ion, and photon beams. The volume contains 250 papers from the leading researchers in this advancing field. Researchers in physics, materials science, and electrical and electronic engineering will find useful information in this volume.
Publisher: CRC Press
ISBN: 9780750306850
Category : Science
Languages : en
Pages : 546
Book Description
Microbeam Analysis provides a major forum for the discussion of the latest microanalysis techniques using electron, ion, and photon beams. The volume contains 250 papers from the leading researchers in this advancing field. Researchers in physics, materials science, and electrical and electronic engineering will find useful information in this volume.
Low-Energy Electrons
Author: Oddur Ingólfsson
Publisher: CRC Press
ISBN: 0429602766
Category : Science
Languages : en
Pages : 254
Book Description
Low-energy electrons are ubiquitous in nature and play an important role in natural phenomena as well as many potential and current industrial processes. Authored by 16 active researchers, this book describes the fundamental characteristics of low-energy electron–molecule interactions and their role in different fields of science and technology, including plasma processing, nanotechnology, and health care, as well as astro- and atmospheric physics and chemistry. The book is packed with illustrative examples, from both fundamental and application sides, features about 130 figures, and lists over 800 references. It may serve as an advanced graduate-level study course material where selected chapters can be used either individually or in combination as a basis to highlight and study specific aspects of low-energy electron–molecule interactions. It is also directed at researchers in the fields of plasma physics, nanotechnology, and radiation damage to biologically relevant material (such as in cancer therapy), especially those with an interest in high-energy-radiation-induced processes, from both an experimental and a theoretical point of view.
Publisher: CRC Press
ISBN: 0429602766
Category : Science
Languages : en
Pages : 254
Book Description
Low-energy electrons are ubiquitous in nature and play an important role in natural phenomena as well as many potential and current industrial processes. Authored by 16 active researchers, this book describes the fundamental characteristics of low-energy electron–molecule interactions and their role in different fields of science and technology, including plasma processing, nanotechnology, and health care, as well as astro- and atmospheric physics and chemistry. The book is packed with illustrative examples, from both fundamental and application sides, features about 130 figures, and lists over 800 references. It may serve as an advanced graduate-level study course material where selected chapters can be used either individually or in combination as a basis to highlight and study specific aspects of low-energy electron–molecule interactions. It is also directed at researchers in the fields of plasma physics, nanotechnology, and radiation damage to biologically relevant material (such as in cancer therapy), especially those with an interest in high-energy-radiation-induced processes, from both an experimental and a theoretical point of view.
Nanofabrication
Author: José María de Teresa
Publisher:
ISBN: 9780750326087
Category : Nanolithography
Languages : en
Pages : 0
Book Description
A comprehensive edited volume on important and up-to-date nanolithography techniques and applications. The book includes an introduction on the importance of nanolithography in today's research and technology, providing examples of its applications. The remainder of the book is split into two sections. The first section contains the most important and established nanolithography techniques. As well as a detailed description of each technique, the reader can obtain useful information about the main advantages and drawbacks of each technique in terms of resolution, throughput, number of steps needed, cost, etc. At the end of this section, the reader will be able to decide which technique to use for different applications. The second section explores more specific applications of the nanolithography techniques previously described; as well as new techniques and applications. In some cases, the processes described in these chapters involve a combination of several nanolithography techniques. This section is less general but provides the reader with real examples.
Publisher:
ISBN: 9780750326087
Category : Nanolithography
Languages : en
Pages : 0
Book Description
A comprehensive edited volume on important and up-to-date nanolithography techniques and applications. The book includes an introduction on the importance of nanolithography in today's research and technology, providing examples of its applications. The remainder of the book is split into two sections. The first section contains the most important and established nanolithography techniques. As well as a detailed description of each technique, the reader can obtain useful information about the main advantages and drawbacks of each technique in terms of resolution, throughput, number of steps needed, cost, etc. At the end of this section, the reader will be able to decide which technique to use for different applications. The second section explores more specific applications of the nanolithography techniques previously described; as well as new techniques and applications. In some cases, the processes described in these chapters involve a combination of several nanolithography techniques. This section is less general but provides the reader with real examples.
Proceedings of the Symposium on Laser Processes for Microelectronic Applications
Author: J. J. Ritsko
Publisher:
ISBN:
Category : Lasers
Languages : en
Pages : 268
Book Description
Publisher:
ISBN:
Category : Lasers
Languages : en
Pages : 268
Book Description
Nanowires
Author: Xihong Peng
Publisher: BoD – Books on Demand
ISBN: 1839623918
Category : Technology & Engineering
Languages : en
Pages : 200
Book Description
Low-dimensional structures have attracted extensive research interest due to their promising applications in nanotechnology. These low-dimensional materials have the potential to make revolutionary changes in science and technology because a reduction in size not only enables a faster speed and greater computing power but also helps reduce device form factors. As such, this book examines the behaviors of oxide nanowires, group III–V compounds, and other nanowires, including basic Si nanowires, metallic wires, and complex geometrical nanowires.
Publisher: BoD – Books on Demand
ISBN: 1839623918
Category : Technology & Engineering
Languages : en
Pages : 200
Book Description
Low-dimensional structures have attracted extensive research interest due to their promising applications in nanotechnology. These low-dimensional materials have the potential to make revolutionary changes in science and technology because a reduction in size not only enables a faster speed and greater computing power but also helps reduce device form factors. As such, this book examines the behaviors of oxide nanowires, group III–V compounds, and other nanowires, including basic Si nanowires, metallic wires, and complex geometrical nanowires.