Photomask and X-ray Mask Technology PDF Download
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Author:
Publisher:
ISBN:
Category : Masks (Electronics)
Languages : en
Pages : 644
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Book Description
Author:
Publisher:
ISBN:
Category : Masks (Electronics)
Languages : en
Pages : 644
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Book Description
Author: Naoaki Aizaki
Publisher: Society of Photo Optical
ISBN: 9780819428646
Category : Technology & Engineering
Languages : en
Pages : 616
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Book Description
An overview of photomask and X-ray mask technology. The papers are divided into sections which explore topics such as: device trends; equipment; X-ray masks; and advanced mask fabrication processes.
Author: Syed Rizvi
Publisher: CRC Press
ISBN: 1420028782
Category : Technology & Engineering
Languages : en
Pages : 730
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Book Description
As the semiconductor industry attempts to increase the number of functions that will fit into the smallest space on a chip, it becomes increasingly important for new technologies to keep apace with these demands. Photomask technology is one of the key areas to achieving this goal. Although brief overviews of photomask technology exist in the literature, the Handbook of Photomask Manufacturing Technology is the first in-depth, comprehensive treatment of existing and emerging photomask technologies available. The Handbook of Photomask Manufacturing Technology features contributions from 40 internationally prominent authors from industry, academia, government, national labs, and consortia. These authors discuss conventional masks and their supporting technologies, as well as next-generation, non-optical technologies such as extreme ultraviolet, electron projection, ion projection, and x-ray lithography. The book begins with an overview of the history of photomask development. It then demonstrates the steps involved in designing, producing, testing, inspecting, and repairing photomasks, following the sequences observed in actual production. The text also includes sections on materials used as well as modeling and simulation. Continued refinements in the photomask-making process have ushered in the sub-wavelength era in nanolithography. This invaluable handbook synthesizes these refinements and provides the tools and possibilities necessary to reach the next generation of microfabrication technologies.
Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 768
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Book Description
Author: Yue Kuo
Publisher: The Electrochemical Society
ISBN: 9781566772983
Category : Technology & Engineering
Languages : en
Pages : 356
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Book Description
Author: Henry Radamson
Publisher: Woodhead Publishing
ISBN: 0081021402
Category : Technology & Engineering
Languages : en
Pages : 280
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Book Description
CMOS Past, Present and Future provides insight from the basics, to the state-of-the-art of CMOS processing and electrical characterization, including the integration of Group IV semiconductors-based photonics. The book goes into the pitfalls and opportunities associated with the use of hetero-epitaxy on silicon with strain engineering and the integration of photonics and high-mobility channels on a silicon platform. It begins with the basic definitions and equations, but extends to present technologies and challenges, creating a roadmap on the origins of the technology and its evolution to the present, along with a vision for future trends. The book examines the challenges and opportunities that materials beyond silicon provide, including a close look at high-k materials and metal gate, strain engineering, channel material and mobility, and contacts. The book's key approach is on characterizations, device processing and electrical measurements. - Addresses challenges and opportunities for the use of CMOS - Covers the latest methods of strain engineering, materials integration to increase mobility, nano-scaled transistor processing, and integration of CMOS with photonic components - Provides a look at the evolution of CMOS technology, including the origins of the technology, current status and future possibilities
Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 576
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Book Description
Author: Luciano Lavagno
Publisher: CRC Press
ISBN: 1351837583
Category : Technology & Engineering
Languages : en
Pages : 704
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Book Description
Presenting a comprehensive overview of the design automation algorithms, tools, and methodologies used to design integrated circuits, the Electronic Design Automation for Integrated Circuits Handbook is available in two volumes. The second volume, EDA for IC Implementation, Circuit Design, and Process Technology, thoroughly examines real-time logic to GDSII (a file format used to transfer data of semiconductor physical layout), analog/mixed signal design, physical verification, and technology CAD (TCAD). Chapters contributed by leading experts authoritatively discuss design for manufacturability at the nanoscale, power supply network design and analysis, design modeling, and much more. Save on the complete set.
Author: Phillip D. Blais
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 294
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Book Description
Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 246
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Book Description
