Optimization of Ion Assist Beam Deposition of Magnesium Oxide Template Films During Initial Nucleation and Growth PDF Download
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Languages : en
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Book Description
Recent efforts in investigating the mechanism of ion beam assisted deposition (IBAD) of biaxially textured thin films of magnesium oxide (MgO) template layers have shown that the texture develops suddenly during the initial 2 nm of deposition. To help understand and tune the behavior during this initial stage, we pre-deposited thin layers of MgO with no ion assist prior to IBAD growth of MgO. We found that biaxial texture develops for pre-deposited thicknesses
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Languages : en
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Book Description
Recent efforts in investigating the mechanism of ion beam assisted deposition (IBAD) of biaxially textured thin films of magnesium oxide (MgO) template layers have shown that the texture develops suddenly during the initial 2 nm of deposition. To help understand and tune the behavior during this initial stage, we pre-deposited thin layers of MgO with no ion assist prior to IBAD growth of MgO. We found that biaxial texture develops for pre-deposited thicknesses
Author:
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Languages : en
Pages : 8
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Book Description
The development of high critical-temperature thin-film superconductors and coated conducting wires is important for electric power applications. To achieve high transport current density, template films are necessary for the successful deposition of biaxially aligned YBa2Cu3O{sub 7-x} (YBCO) on flexible metal substrates. We grew biaxially aligned magnesium oxide (MgO) template films by ion-beam-assisted deposition with electron-beam evaporation. MgO films of ≈100 Å thickness were deposited on Si3N4-coated Si substrates at a deposition rate of ≈1.5 Å/sec with an ion flux of ≈110 [mu]A/cm2 bombarding the substrate at a 45{sup o} angle. To study crystalline structure by X-ray diffraction, we deposited an additional layer of MgO. Good in- and out-of-plane alignment was observed, with (111) [phi]-scan full-width half-maximum (FWHM) of 6.2{sup o} and (002) [omega]-scan FWHM of 2.2{sup o}.
Author: Agustin Gonzalez-elipe
Publisher: World Scientific
ISBN: 1783261048
Category : Science
Languages : en
Pages : 299
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Book Description
This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low energy ion beams with materials. The main procedures used for IAD synthesis of thin films and the main effects of ion beam bombardment on growing films, such as densification, stress, mixing, surface flattening and changes in texture are critically discussed. A description of some of the applications of IAD methods and a review of the synthesis by IAD of diamond-like carbon and cubic-boron nitride complete the book.
Author: T. Itoh
Publisher: Elsevier
ISBN: 0444599088
Category : Science
Languages : en
Pages : 458
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Book Description
This volume provides up to date information on the experimental, theoretical and technological aspects of film growth assisted by ion beams. Ion beam assisted film growth is one of the most effective techniques in aiding the growth of high-quality thin solid films in a controlled way. Moreover, ion beams play a dominant role in the reduction of the growth temperature of thin films of high melting point materials. In this way, ion beams make a considerable and complex contribution to film growth. The volume will be essential reading for scientists, engineers and students working in this field.
Author: Liliana Stan
Publisher:
ISBN:
Category : Chemical templates
Languages : en
Pages : 226
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Book Description
Author: Vladimir Matias
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 216
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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author: Timothy Weber
Publisher:
ISBN:
Category :
Languages : en
Pages : 286
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Book Description
Author: Jerome J. Cuomo
Publisher: William Andrew
ISBN:
Category : Science
Languages : en
Pages : 464
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Book Description
This book, by 36 authorities on the subject, deals with ion beam processing for basic sputter etching of samples, for sputter deposition of thin films, for synthesis of material in thin film form, and of the modification of thin film properties.
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Languages : en
Pages : 0
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Book Description
Vacuum-deposited films of molybdenum disulfide (MoS2) are effective as solid lubricants. Ion-beam-assisted deposition, which employs ion beam sputtering with an assist beam impinging on the growing film, has been investigated as a means of preparing low-friction high endurance coatings. The apparatus used and some of the techniques involved are described. Ion source operating parameters were optimized and the assist beam ion flux was quantified and found to follow a power-law relationship with beam power. The best way to produce MoS2 films was found to be cosputtering from separate Mo and S targets with deposition rates adjusted to obtain the desired stoichiometry. Deposition rates were found to also follow a power-law relationship with beam power, and formulae are given for predicting them, the ratio of assist ions to film atoms, and the effect of assist beam sputtering on film thickness. Inverse formulae are given for determining process parameters needed to achieve a selected film thickness and composition. A composite target for simultaneous Mo and S sputtering was developed. Deposition rates were determined for other metals: W, Ni, Co, Cu, and Pb. Formulae relating target-to-substrate distance to deposition rate are given.
Author: P.L.F. Hemment
Publisher: Newnes
ISBN: 0444596313
Category : Technology & Engineering
Languages : en
Pages : 630
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Book Description
Containing the proceedings of three symposia in the E-MRS series this book is divided into two parts. Part one is concerned with ion beam processing, a particularly powerful and versatile technology which can be used both to synthesise and modify materials, including metals, semiconductors, ceramics and dielectrics, with great precision and excellent control. Furthermore it also deals with the correlated effects in atomic and cluster ion bombardment and implantation.Part two deals with the deposition techniques, characterization and applications of advanced ceramic, metallic and polymeric coatings or thin films for surface protection against corrosion, erosion, abrasion, diffusion and for lubrication of contracting surfaces in relative motion.
