Optical Imaging in Projection Microlithography PDF Download
Are you looking for read ebook online? Search for your book and save it on your Kindle device, PC, phones or tablets. Download Optical Imaging in Projection Microlithography PDF full book. Access full book title Optical Imaging in Projection Microlithography by Alfred Kwok-Kit Wong. Download full books in PDF and EPUB format.
Author: Alfred Kwok-Kit Wong
Publisher: SPIE Press
ISBN: 9780819458292
Category : Technology & Engineering
Languages : en
Pages : 280
Get Book Here
Book Description
Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
Author: Alfred Kwok-Kit Wong
Publisher: SPIE Press
ISBN: 9780819458292
Category : Technology & Engineering
Languages : en
Pages : 280
Get Book Here
Book Description
Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists.
Author: Bruce W. Smith
Publisher: CRC Press
ISBN: 1420051539
Category : Technology & Engineering
Languages : en
Pages : 866
Get Book Here
Book Description
This new edition of the bestselling Microlithography: Science and Technology provides a balanced treatment of theoretical and operational considerations, from elementary concepts to advanced aspects of modern submicron microlithography. Each chapter reflects the current research and practices from the world's leading academic and industrial laboratories detailed by a stellar panel of international experts. New in the Second Edition In addition to updated information on existing material, this new edition features coverage of technologies developed over the last decade since the first edition appeared, including: Immersion Lithography 157nm Lithography Electron Projection Lithography (EPL) Extreme Ultraviolet (EUV) Lithography Imprint Lithography Photoresists for 193nm and Immersion Lithography Scatterometry Microlithography: Science and Technology, Second Edition authoritatively covers the physics, chemistry, optics, metrology tools and techniques, resist processing and materials, and fabrication methods involved in the latest generations of microlithography such as immersion lithography and extreme ultraviolet (EUV) lithography. It also looks ahead to the possible future systems and technologies that will bring the next generations to fruition. Loaded with illustrations, equations, tables, and time-saving references to the most current literature, this book is the most comprehensive and reliable source for anyone, from student to seasoned professional, looking to achieve robust, accurate, and cost-effective microlithography processes and systems.
Author: Chris Mack
Publisher: John Wiley & Sons
ISBN: 1119965071
Category : Technology & Engineering
Languages : en
Pages : 503
Get Book Here
Book Description
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
Author: Harry L. Stover
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 288
Get Book Here
Book Description
Author: Harry J. Levinson
Publisher: SPIE Press
ISBN: 9780819456601
Category : Technology & Engineering
Languages : en
Pages : 446
Get Book Here
Book Description
Lithography is a field in which advances proceed at a swift pace. This book was written to address several needs, and the revisions for the second edition were made with those original objectives in mind. Many new topics have been included in this text commensurate with the progress that has taken place during the past few years, and several subjects are discussed in more detail. This book is intended to serve as an introduction to the science of microlithography for people who are unfamiliar with the subject. Topics directly related to the tools used to manufacture integrated circuits are addressed in depth, including such topics as overlay, the stages of exposure, tools, and light sources. This text also contains numerous references for students who want to investigate particular topics in more detail, and they provide the experienced lithographer with lists of references by topic as well. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus.
Author: P. Rai-Choudhury
Publisher: SPIE Press
ISBN: 9780819423795
Category : Technology & Engineering
Languages : en
Pages : 706
Get Book Here
Book Description
Focusing on the use of microlithography techniques in microelectronics manufacturing, this volume is one of a series addressing a rapidly growing field affecting the integrated circuit industry. New applications in such areas as sensors, actuators and biomedical devices, are described.
Author: Alfred Kwok-Kit Wong
Publisher: SPIE Press
ISBN: 9780819439956
Category : Science
Languages : en
Pages : 238
Get Book Here
Book Description
Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers
Author: Burn Jeng Lin
Publisher: SPIE-International Society for Optical Engineering
ISBN: 9781510639959
Category : Lasers
Languages : en
Pages : 0
Get Book Here
Book Description
This book is written for new and experienced engineers, technology managers, and senior technicians who want to enrich their understanding of the image formation physics of a lithographic system. Readers will gain knowledge of the basic equations and constants that drive optical lithography, learn the basics of exposure systems and image formation, and come away with a full understanding of system components, processing, and optimization. Readers will also get an overview of the outlook of optical lithography and means to enhance semiconductor manufacturing. This second edition blends the author's unique experience in research, teaching, and world-class high-volume manufacturing to add brand new material on proximity printing, as well as updated and expanded material on exposure systems, image formation, E-D methodology, hardware components, processing and optimization, and EUV and immersion lithographies.
Author: Chris A. Mack
Publisher: Society of Photo Optical
ISBN: 9780819462077
Category : Technology & Engineering
Languages : en
Pages : 122
Get Book Here
Book Description
This Field Guide distills the material written by Chris Mack over the past 20 years, including notes from his graduate-level lithography course at the University of Texas at Austin. It details the lithography process, image formation, imaging onto a photoresist, photoresist chemistry, and lithography control and optimization. An introduction to next-generation lithographic technologies is also included, as well as an extensive lithography glossary and a summation of salient equations critical to anyone involved in the lithography industry.
Author: Tommaso Baldacchini
Publisher: William Andrew
ISBN: 0128178280
Category : Technology & Engineering
Languages : en
Pages : 762
Get Book Here
Book Description
Three-Dimensional Microfabrication Using Two-Photon Polymerization, Second Edition offers a comprehensive guide to TPP microfabrication and a unified description of TPP microfabrication across disciplines. It offers in-depth discussion and analysis of all aspects of TPP, including the necessary background, pros and cons of TPP microfabrication, material selection, equipment, processes and characterization. Current and future applications are covered, along with case studies that illustrate the book's concepts. This new edition includes updated chapters on metrology, synthesis and the characterization of photoinitiators used in TPP, negative- and positive-tone photoresists, and nonlinear optical characterization of polymers. This is an important resource that will be useful for scientists involved in microfabrication, generation of micro- and nano-patterns and micromachining. - Discusses the major types of nanomaterials used in the agriculture and forestry sectors, exploring how their properties make them effective for specific applications - Explores the design, fabrication, characterization and applications of nanomaterials for new Agri-products - Offers an overview of regulatory aspects regarding the use of nanomaterials for agriculture and forestry
