Author: P. D. Townsend
Publisher: Cambridge University Press
ISBN: 0521394309
Category : Science
Languages : en
Pages : 300
Book Description
This book describes the use of ion implantation to control the optical properties of solid state materials.
Optical Effects of Ion Implantation
Author: P. D. Townsend
Publisher: Cambridge University Press
ISBN: 0521394309
Category : Science
Languages : en
Pages : 300
Book Description
This book describes the use of ion implantation to control the optical properties of solid state materials.
Publisher: Cambridge University Press
ISBN: 0521394309
Category : Science
Languages : en
Pages : 300
Book Description
This book describes the use of ion implantation to control the optical properties of solid state materials.
Ion Implantation - Research and Application
Author:
Publisher:
ISBN: 9789535132387
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN: 9789535132387
Category :
Languages : en
Pages :
Book Description
Ion Implantation
Author: A. D. Pogrebnjak
Publisher: Nova Science Publishers
ISBN: 9781536139631
Category : SCIENCE
Languages : en
Pages : 334
Book Description
"New results in the field of ion implantation from the experienced scientists from different countries are presented in this book. Influence of ion implantation on structure and properties of semi-conducting materials, instrumental steels and alloys, nanocomposite coatings, including multielement ones, titanium alloys with the shape memory effect and super-elasticity are discussed in detail within this book. New data on novel applications of ion implantation for the modification and testing (radiation hardness simulation) of memristive devices, as well as application of ion implantation of group V dopants in the MCT epilayer are presented in this book. Potential use of ion implantation for the synthesis of Ag nanoparticles in a thin Si layer for the development of thin-film solar cells fabrication technology is discussed. The effect of ion implantation on the physical and mechanical properties of the hard alloy plates based on tungsten carbide and a cobalt binder is described. A study of the effects of ion implantation on the phase composition and the structure of materials is presented. The role of defects in the formation of the phase composition of the ion-implanted materials, structural-phase transformations in metals after ion implantation is investigated. This book will be interesting for professionals in the study of solid state physics, nuclear physics, physics of semi-conductors and nanomaterials. It can also be useful for masters and PhD students, as well as for professionals researching the fabrication and investigation of protective materials with enhanced physical-mechanical and tribological properties, good biocompatibility and resistance to irradiation"--
Publisher: Nova Science Publishers
ISBN: 9781536139631
Category : SCIENCE
Languages : en
Pages : 334
Book Description
"New results in the field of ion implantation from the experienced scientists from different countries are presented in this book. Influence of ion implantation on structure and properties of semi-conducting materials, instrumental steels and alloys, nanocomposite coatings, including multielement ones, titanium alloys with the shape memory effect and super-elasticity are discussed in detail within this book. New data on novel applications of ion implantation for the modification and testing (radiation hardness simulation) of memristive devices, as well as application of ion implantation of group V dopants in the MCT epilayer are presented in this book. Potential use of ion implantation for the synthesis of Ag nanoparticles in a thin Si layer for the development of thin-film solar cells fabrication technology is discussed. The effect of ion implantation on the physical and mechanical properties of the hard alloy plates based on tungsten carbide and a cobalt binder is described. A study of the effects of ion implantation on the phase composition and the structure of materials is presented. The role of defects in the formation of the phase composition of the ion-implanted materials, structural-phase transformations in metals after ion implantation is investigated. This book will be interesting for professionals in the study of solid state physics, nuclear physics, physics of semi-conductors and nanomaterials. It can also be useful for masters and PhD students, as well as for professionals researching the fabrication and investigation of protective materials with enhanced physical-mechanical and tribological properties, good biocompatibility and resistance to irradiation"--
Ion Beam Applications
Author: Ishaq Ahmad
Publisher: BoD – Books on Demand
ISBN: 178923414X
Category : Science
Languages : en
Pages : 190
Book Description
Ion beam of various energies is a standard research tool in many areas of science, from basic physics to diverse areas in space science and technology, device fabrications, materials science, environment science, and medical sciences. It is an advance and versatile tool to frequently discover applications across a broad range of disciplines and fields. Moreover, scientists are continuously improving the ion beam sources and accelerators to explore ion beam at the forefront of scientific endeavours. This book provides a glance view on MeV ion beam applications, focused ion beam generation and its applications as well as practical applications of ion implantation.
Publisher: BoD – Books on Demand
ISBN: 178923414X
Category : Science
Languages : en
Pages : 190
Book Description
Ion beam of various energies is a standard research tool in many areas of science, from basic physics to diverse areas in space science and technology, device fabrications, materials science, environment science, and medical sciences. It is an advance and versatile tool to frequently discover applications across a broad range of disciplines and fields. Moreover, scientists are continuously improving the ion beam sources and accelerators to explore ion beam at the forefront of scientific endeavours. This book provides a glance view on MeV ion beam applications, focused ion beam generation and its applications as well as practical applications of ion implantation.
Engineering Thin Films and Nanostructures with Ion Beams
Author: Emile Knystautas
Publisher: CRC Press
ISBN: 1420028294
Category : Technology & Engineering
Languages : en
Pages : 592
Book Description
While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications. Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that: Highlights the mechanisms and visual evidence of the effects of single-ion impacts on metallic surfaces Considers how ion-beam techniques can help achieve higher disk-drive densities Introduces gas-cluster ion-beam technology and reviews its precedents Explains how ion beams are used to aggregate metals and semiconductors into nanoclusters with nonlinear optical properties Addresses current challenges in building equipment needed to produce nanostructures in an industrial setting Examines the combination of ion-beam techniques, particularly with physical vapor deposition Delineates the fabrication of nanopillars, nanoflowers, and interconnected nanochannels in three dimensions by using atomic shadowing techniques Illustrates the production of nanopores of varying dimensions in polymer films, alloys, and superconductors using ion-beam irradiation Shows how fingerprints can be made more reliable as forensic evidence by recoil-mixing them into the substrate using ion beams From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th
Publisher: CRC Press
ISBN: 1420028294
Category : Technology & Engineering
Languages : en
Pages : 592
Book Description
While ion-beam techniques have been used to create thin films in the semiconductor industry for several decades, these methods have been too costly for other surface treatment applications. However, as manufacturing devices become increasingly smaller, the use of a directed-energy ion beam is finding novel industrial applications that require the custom tailoring of new materials and devices, including magnetic storage devices, photonics, opto-electronics, and molecular transport. Engineering Thin Films and Nanostructures with Ion Beams offers a thorough narrative of the recent advances that make this technology relevant to current and future applications. Featuring internationally recognized researchers, the book compiles their expertise in a multidimensional source that: Highlights the mechanisms and visual evidence of the effects of single-ion impacts on metallic surfaces Considers how ion-beam techniques can help achieve higher disk-drive densities Introduces gas-cluster ion-beam technology and reviews its precedents Explains how ion beams are used to aggregate metals and semiconductors into nanoclusters with nonlinear optical properties Addresses current challenges in building equipment needed to produce nanostructures in an industrial setting Examines the combination of ion-beam techniques, particularly with physical vapor deposition Delineates the fabrication of nanopillars, nanoflowers, and interconnected nanochannels in three dimensions by using atomic shadowing techniques Illustrates the production of nanopores of varying dimensions in polymer films, alloys, and superconductors using ion-beam irradiation Shows how fingerprints can be made more reliable as forensic evidence by recoil-mixing them into the substrate using ion beams From the basics of the ion-beam modification of materials to state-of-the-art applications, Engineering Th
Radiation Effects in Polymeric Materials
Author: Vijay Kumar
Publisher: Springer
ISBN: 3030057704
Category : Technology & Engineering
Languages : en
Pages : 417
Book Description
This book provides an introduction of how radiation is processed in polymeric materials, how materials properties are affected and how the resulting materials are analyzed. It covers synthesis, characterization, or modification of important materials, e.g. polycarbonates, polyamides and polysaccharides, using radiation. For example, a complete chapter is dedicated to the characterization of biodegradable polymers irradiated with low and heavy ions. This book will be beneficial to all polymer scientists in the development of new macromolecules and to all engineers using these materials in applications. It summarizes the fundamental knowledge and latest innovations in research fields from medicine to space.
Publisher: Springer
ISBN: 3030057704
Category : Technology & Engineering
Languages : en
Pages : 417
Book Description
This book provides an introduction of how radiation is processed in polymeric materials, how materials properties are affected and how the resulting materials are analyzed. It covers synthesis, characterization, or modification of important materials, e.g. polycarbonates, polyamides and polysaccharides, using radiation. For example, a complete chapter is dedicated to the characterization of biodegradable polymers irradiated with low and heavy ions. This book will be beneficial to all polymer scientists in the development of new macromolecules and to all engineers using these materials in applications. It summarizes the fundamental knowledge and latest innovations in research fields from medicine to space.
Nonlinear Optical Effects and Materials
Author: Peter Günter
Publisher: Springer
ISBN: 3540497137
Category : Science
Languages : en
Pages : 550
Book Description
Describing progress achieved in the field of nonlinear optics and nonlinear optical materials, the Handbook treats selected topics such as photorefractive materials, third-order nonlinear optical materials and organic nonlinear optical crystals, as well as electro-optic polymers. Applications of photorefractive materials in optical memories, optical processing, and guided-wave nonlinear optics in hotorefractive waveguides are described. As light will play a more and more dominant role as an information carrier, the review of existing and new materials given here makes this a keystone book in the field.
Publisher: Springer
ISBN: 3540497137
Category : Science
Languages : en
Pages : 550
Book Description
Describing progress achieved in the field of nonlinear optics and nonlinear optical materials, the Handbook treats selected topics such as photorefractive materials, third-order nonlinear optical materials and organic nonlinear optical crystals, as well as electro-optic polymers. Applications of photorefractive materials in optical memories, optical processing, and guided-wave nonlinear optics in hotorefractive waveguides are described. As light will play a more and more dominant role as an information carrier, the review of existing and new materials given here makes this a keystone book in the field.
In-situ Electron Microscopy at High Resolution
Author: Florian Banhart
Publisher: World Scientific
ISBN: 9812797335
Category : Science
Languages : en
Pages : 318
Book Description
In-situ high-resolution electron microscopy is a modern and powerful technique in materials research, physics, and chemistry. In-situ techniques are hardly treated in textbooks of electron microscopy. Thus, there is a need to collect the present knowledge about the techniques and achievements of in-situ electron microscopy in one book. Since high-resolution electron microscopes are available in most modern laboratories of materials science, more and more scientists or students are starting to work on this subject.In this comprehensive volume, the most important techniques and achievements of in-situ high-resolution electron microscopy will be reviewed by renowned experts. Applications in several fields of materials science will also be demonstrated.
Publisher: World Scientific
ISBN: 9812797335
Category : Science
Languages : en
Pages : 318
Book Description
In-situ high-resolution electron microscopy is a modern and powerful technique in materials research, physics, and chemistry. In-situ techniques are hardly treated in textbooks of electron microscopy. Thus, there is a need to collect the present knowledge about the techniques and achievements of in-situ electron microscopy in one book. Since high-resolution electron microscopes are available in most modern laboratories of materials science, more and more scientists or students are starting to work on this subject.In this comprehensive volume, the most important techniques and achievements of in-situ high-resolution electron microscopy will be reviewed by renowned experts. Applications in several fields of materials science will also be demonstrated.
The Physics of Semiconductor Devices
Author: R. K. Sharma
Publisher: Springer
ISBN: 3319976044
Category : Technology & Engineering
Languages : en
Pages : 1260
Book Description
This book disseminates the current knowledge of semiconductor physics and its applications across the scientific community. It is based on a biennial workshop that provides the participating research groups with a stimulating platform for interaction and collaboration with colleagues from the same scientific community. The book discusses the latest developments in the field of III-nitrides; materials & devices, compound semiconductors, VLSI technology, optoelectronics, sensors, photovoltaics, crystal growth, epitaxy and characterization, graphene and other 2D materials and organic semiconductors.
Publisher: Springer
ISBN: 3319976044
Category : Technology & Engineering
Languages : en
Pages : 1260
Book Description
This book disseminates the current knowledge of semiconductor physics and its applications across the scientific community. It is based on a biennial workshop that provides the participating research groups with a stimulating platform for interaction and collaboration with colleagues from the same scientific community. The book discusses the latest developments in the field of III-nitrides; materials & devices, compound semiconductors, VLSI technology, optoelectronics, sensors, photovoltaics, crystal growth, epitaxy and characterization, graphene and other 2D materials and organic semiconductors.
Site Characterization and Aggregation of Implanted Atoms in Materials
Author: A. Perez
Publisher: Springer Science & Business Media
ISBN: 1468410156
Category : Science
Languages : en
Pages : 518
Book Description
Explosive developments in microelectronics, interest in nuclear metallurgy, and widespread applications in surface science have all produced many advances in the field of ion implantation. The research activity has become so intensive and so broad that the field has become divided into many specialized subfields. An Advanced Study Institute, covering the basic and common phenomena of aggregation, seems opportune for initiating interested scientists and engineers into these various active subfields since aggregation usually follows ion implantation. As a consequence, Drs. Perez, Coussement, Marest, Cachard and I submitted such a pro posal to the Scientific Affairs Division of NATO, the approval of which resulted in the present volume. For the physicist studying nuclear hyperfine interactions, the consequences of aggregation of implanted atoms, even at low doses, need to be taken into account if the results are to be correctly interpreted. For materials scientists and device engineers, under standing aggregation mechanisms and methods of control is clearly essential in the tailoring of the end products.
Publisher: Springer Science & Business Media
ISBN: 1468410156
Category : Science
Languages : en
Pages : 518
Book Description
Explosive developments in microelectronics, interest in nuclear metallurgy, and widespread applications in surface science have all produced many advances in the field of ion implantation. The research activity has become so intensive and so broad that the field has become divided into many specialized subfields. An Advanced Study Institute, covering the basic and common phenomena of aggregation, seems opportune for initiating interested scientists and engineers into these various active subfields since aggregation usually follows ion implantation. As a consequence, Drs. Perez, Coussement, Marest, Cachard and I submitted such a pro posal to the Scientific Affairs Division of NATO, the approval of which resulted in the present volume. For the physicist studying nuclear hyperfine interactions, the consequences of aggregation of implanted atoms, even at low doses, need to be taken into account if the results are to be correctly interpreted. For materials scientists and device engineers, under standing aggregation mechanisms and methods of control is clearly essential in the tailoring of the end products.