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Author: Nong Moon Hwang
Publisher: Springer
ISBN: 9401776164
Category : Science
Languages : en
Pages : 338
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Book Description
This book provides a comprehensive introduction to a recently-developed approach to the growth mechanism of thin films and nanostructures via chemical vapour deposition (CVD). Starting from the underlying principles of the low pressure synthesis of diamond films, it is shown that diamond growth occurs not by individual atoms but by charged nanoparticles. This newly-discovered growth mechanism turns out to be general to many CVD and some physical vapor deposition (PVD) processes. This non-classical crystallization is a new paradigm of crystal growth, with active research taking place on growth in solution, especially in biomineralization processes. Established understanding of the growth of thin films and nanostructures is based around processes involving individual atoms or molecules. According to the author’s research over the last two decades, however, the generation of charged gas phase nuclei is shown to be the rule rather than the exception in the CVD process, and charged gas phase nuclei are actively involved in the growth of films or nanostructures. This new understanding is called the theory of charged nanoparticles (TCN). This book describes how the non-classical crystallization mechanism can be applied to the growth of thin films and nanostructures in gas phase synthesis. Based on the author’s graduate lecture course, the book is aimed at senior undergraduate and graduate students and researchers in the field of thin film and nanostructure growth or crystal growth. It is hoped that a new understanding of the growth processes of thin films and nanostructures will reduce trial-and-error in research and in industrial fabrication processes.
Author: Nong Moon Hwang
Publisher: Springer
ISBN: 9401776164
Category : Science
Languages : en
Pages : 338
Get Book
Book Description
This book provides a comprehensive introduction to a recently-developed approach to the growth mechanism of thin films and nanostructures via chemical vapour deposition (CVD). Starting from the underlying principles of the low pressure synthesis of diamond films, it is shown that diamond growth occurs not by individual atoms but by charged nanoparticles. This newly-discovered growth mechanism turns out to be general to many CVD and some physical vapor deposition (PVD) processes. This non-classical crystallization is a new paradigm of crystal growth, with active research taking place on growth in solution, especially in biomineralization processes. Established understanding of the growth of thin films and nanostructures is based around processes involving individual atoms or molecules. According to the author’s research over the last two decades, however, the generation of charged gas phase nuclei is shown to be the rule rather than the exception in the CVD process, and charged gas phase nuclei are actively involved in the growth of films or nanostructures. This new understanding is called the theory of charged nanoparticles (TCN). This book describes how the non-classical crystallization mechanism can be applied to the growth of thin films and nanostructures in gas phase synthesis. Based on the author’s graduate lecture course, the book is aimed at senior undergraduate and graduate students and researchers in the field of thin film and nanostructure growth or crystal growth. It is hoped that a new understanding of the growth processes of thin films and nanostructures will reduce trial-and-error in research and in industrial fabrication processes.
Author: S Neralla
Publisher: BoD – Books on Demand
ISBN: 9535125729
Category : Science
Languages : en
Pages : 292
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Book Description
This book provides an overview of chemical vapor deposition (CVD) methods and recent advances in developing novel materials for application in various fields. CVD has now evolved into the most widely used technique for growth of thin films in electronics industry. Several books on CVD methods have emerged in the past, and thus the scope of this book goes beyond providing fundamentals of the CVD process. Some of the chapters included highlight current limitations in the CVD methods and offer alternatives in developing coatings through overcoming these limitations.
Author:
Publisher: Elsevier
ISBN: 0128139358
Category : Science
Languages : en
Pages : 292
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Book Description
Nano-sized Multifunctional Materials: Synthesis, Properties and Applications explores how materials can be down-scaled to nanometer-size in order to tailor and control properties. These advanced, low-dimensional materials, ranging from quantum dots and nanoparticles, to ultra-thin films develop multifunctional properties. As well as demonstrating how down-scaling to nano-size can make materials multifunctional, chapters also show how this technology can be applied in electronics, medicine, energy and in the environment. This fresh approach in materials research will provide a valuable resource for materials scientists, materials engineers, chemists, physicists and bioengineers who want to learn more on the special properties of nano-sized materials. Outlines the major synthesis chemical process and problems of advanced nanomaterials Shows how multifunctional nanomaterials can be practically used in biomedical area, nanomedicine, and in the treatment of pollutants Demonstrates how the properties of a variety of materials can be engineered by downscaling them to nano size
Author: Roland A. Fischer
Publisher: Springer Science & Business Media
ISBN: 9783540016052
Category : Science
Languages : en
Pages : 240
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Book Description
Material synthesis by the transformation of organometallic compounds (precursors) by vapor deposition techniques such as chemical vapor deposition (CVD) and atomic layer deposition (ALD) has been in the forefront of modern day research and development of new materials. There exists a need for new routes for designing and synthesizing new precursors as well as the application of established molecular precursors to derive tuneable materials for technological demands. With regard to the precursor chemistry, a most detailed understanding of the mechanistic complexity of materials formation from molecular precursors is very important for further development of new processes and advanced materials. To emphasize and stimulate research in these areas, this volume comprises a selection of case studies covering various key-aspects of the interplay of precursor chemistry with the process conditions of materials formation, particularly looking at the similarities and differences of CVD, ALD and nanoparticle synthesis, e.g. colloid chemistry, involving tailored molecular precursors.
Author: Kwang-Leong Choy
Publisher: CRC Press
ISBN: 1000690733
Category : Science
Languages : en
Pages : 417
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Book Description
This book offers a timely and complete overview on chemical vapour deposition (CVD) and its variants for the processing of nanoparticles, nanowires, nanotubes, nanocomposite coatings, thin and thick films, and composites. Chapters discuss key aspects, from processing, material structure and properties to practical use, cost considerations, versatility, and sustainability. The author presents a comprehensive overview of CVD and its potential in producing high performance, cost-effective nanomaterials and thin and thick films. Features Provides an up-to-date introduction to CVD technology for the fabrication of nanomaterials, nanostructured films, and composite coatings Discusses processing, structure, functionalization, properties, and use in clean energy, engineering, and biomedical grand challenges Covers thin and thick films and composites Compares CVD with other processing techniques in terms of structure/properties, cost, versatility, and sustainability Kwang-Leong Choy is the Director of the UCL Centre for Materials Discovery and Professor of Materials Discovery in the Institute for Materials Discovery at the University College London. She earned her D.Phil. from the University of Oxford, and is the recipient of numerous honors including the Hetherington Prize, Oxford Metallurgical Society Award, and Grunfeld Medal and Prize from the Institute of Materials (UK). She is an elected fellow of the Institute of Materials, Minerals and Mining, and the Royal Society of Chemistry.
Author: D. M. Mattox
Publisher: Cambridge University Press
ISBN: 0080946585
Category : Technology & Engineering
Languages : en
Pages : 947
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Book Description
This book covers all aspects of physical vapor deposition (PVD) process technology from the characterizing and preparing the substrate material, through deposition processing and film characterization, to post-deposition processing. The emphasis of the book is on the aspects of the process flow that are critical to economical deposition of films that can meet the required performance specifications. The book covers subjects seldom treated in the literature: substrate characterization, adhesion, cleaning and the processing. The book also covers the widely discussed subjects of vacuum technology and the fundamentals of individual deposition processes. However, the author uniquely relates these topics to the practical issues that arise in PVD processing, such as contamination control and film growth effects, which are also rarely discussed in the literature. In bringing these subjects together in one book, the reader can understand the interrelationship between various aspects of the film deposition processing and the resulting film properties. The author draws upon his long experience with developing PVD processes and troubleshooting the processes in the manufacturing environment, to provide useful hints for not only avoiding problems, but also for solving problems when they arise. He uses actual experiences, called ""war stories"", to emphasize certain points. Special formatting of the text allows a reader who is already knowledgeable in the subject to scan through a section and find discussions that are of particular interest. The author has tried to make the subject index as useful as possible so that the reader can rapidly go to sections of particular interest. Extensive references allow the reader to pursue subjects in greater detail if desired. The book is intended to be both an introduction for those who are new to the field and a valuable resource to those already in the field. The discussion of transferring technology between R&D and manufacturing provided in Appendix 1, will be of special interest to the manager or engineer responsible for moving a PVD product and process from R&D into production. Appendix 2 has an extensive listing of periodical publications and professional societies that relate to PVD processing. The extensive Glossary of Terms and Acronyms provided in Appendix 3 will be of particular use to students and to those not fully conversant with the terminology of PVD processing or with the English language.
Author: Helmut Cöelfen
Publisher: John Wiley & Sons
ISBN: 0470994592
Category : Science
Languages : en
Pages : 288
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Book Description
Through both explanation and discussion, this title presents a complete review into mesocrystals, and accurately describes this relatively new study of established materials. This book also provides an introduction to other areas of crystallisation including self-assembly, classical crystallisation and colloidal crystals. Key features: Description of crystals as well as their formation processes and ways to modify them. Examines new ways towards the design of new materials and aids comprehension of the building principles of biominerals. Helps to explain many unusual observations made in the study of crystallisation. Written by the professionals in this subject ‘Mesocrystals: New Self-Assembled Structures’ outlines the future potential of this topic within a variety of disciplines including engineering science, physics and chemistry, making it a versatile and valuable text.
Author: Cheol Seong Hwang
Publisher: Springer Science & Business Media
ISBN: 146148054X
Category : Science
Languages : en
Pages : 266
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Book Description
Offering thorough coverage of atomic layer deposition (ALD), this book moves from basic chemistry of ALD and modeling of processes to examine ALD in memory, logic devices and machines. Reviews history, operating principles and ALD processes for each device.
Author: Angel Yanguas-Gil
Publisher: Springer
ISBN: 3319246720
Category : Technology & Engineering
Languages : en
Pages : 128
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Book Description
This book will address the application of gas phase thin film methods, including techniques such as evaporation, sputtering, CVD, and ALD to the synthesis of materials on nanostructured and high aspect-ratio high surface area materials. We have chosen to introduce these topics and the different application fields from a chronological perspective: we start with the early concepts of step coverage and later conformality in semiconductor manufacturing, and how later on the range of application branched out to include others such as energy storage, catalysis, and more broadly nanomaterials synthesis. The book will describe the ballistic and continuum descriptions of gas transport on nanostructured materials and then will move on to incorporate the impact of precursor-surface interaction. We will finally conclude approaching the subjects of feature shape evolution and the connection between nano and reactor scales and will briefly present different advanced algorithms that can be used to effectively compute particle transport, in some cases borrowing from other disciplines such as radiative heat transfer. The book gathers in a single place information scattered over thirty years of scientific research, including the most recent results in the field of Atomic Layer Deposition. Besides a mathematical description of the fundamentals of thin film growth in nanostructured materials, it includes analytic expressions and plots that can be used to predict the growth using gas phase synthesis methods in a number of ideal approximations. The focus on the fundamental aspects over particular processes will broaden the appeal and the shelf lifetime of this book. The reader of this book will gain a thorough understanding on the coating of high surface area and nanostructured materials using gas phase thin film deposition methods, including the limitations of each technique. Those coming from the theoretical side will gain the knowledge required to model the growth process, while those readers more interested in the process development will gain the theoretical understanding will be useful for process optimization.
Author: Sam Zhang
Publisher: Imperial College Press
ISBN: 1860949975
Category : Science
Languages : en
Pages : 628
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Book Description
Materials development has reached a point where it is difficult for a single material to satisfy the needs of sophisticated applications in the modern world. Nanocomposite films and coatings achieve much more than the simple addition of the constitutents OCo the law of summation fails to work in the nano-world. This book encompasses three major parts of the development of nanocomposite films and coatings: the first focuses on processing and properties, the second concentrates on mechanical performance, and the third deals with functional performance, including wide application areas ranging from mechanical cutting to solar energy and from electronics to medicine. Sample Chapter(s). Chapter 1: Magnetron Sputtered Hard and Yet Tough Nanocomposite Coatings With Case Studies: Nanocrystalline Tin Embedded in Amorphous SiNx (187 KB). Contents: Magnetron Sputtered Hard and Yet Tough Nanocomposite Coatings with Case Studies: Nanocrystalline TiN Embedded in Amorphous SiN x (S Zhang et al.); Magnetron Sputtered Hard and Yet Tough Nanocomposite Coatings with Case Studies: Nanocrystalline TiC Embedded in Amorphous Carbon (S Zhang et al.); Properties of Chemical Vapor Deposited Nanocrystalline Diamond and Nanodiamond/Amorphous Carbon Composite Films (S C Tjong); Synthesis, Characterization and Applications of Nanocrystalline Diamond Films (Z-Q Xu & A Kumar); Properties of Hard Nanocomposite Thin Films (J Musil); Nanostructured, Multifunctional Tribological Coatings (J J Moore et al.); Nanocomposite Thin Films for Solar Energy Conversion (Y-B Yin); Application of Silicon Nanocrystal in Non-Volatile Memory Devices (T P Chen); Nanocrystalline Silicon Films for Thin Film Transistor and Optoelectronic Applications (Y-J Choi et al.); Amorphous and Nanocomposite Diamond-Like Carbon Coatings for Biomedical Applications (T I T Okpalugo et al.); Nanocoatings for Orthopaedic and Dental Application (W-Q Yan). Readership: Undergraduates, postgraduates, researchers, scientists, college and university professors, research professionals, technology investors and developers, research enterprises, R&D research laboratories, academic and research libraries."
