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Author: M. Capitelli
Publisher: Springer Science & Business Media
ISBN: 1461534003
Category : Science
Languages : en
Pages : 226
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Book Description
The present book contains the proceedings of the workshop "Plasma Technology and Applications" which was held at 11 Ciocco (Lucca-Italy) during 5-6 July 1991. The workshop was organized just before ICPIG XX to emphasize the role of plasma physics and plasma chemistry in different fields of technology. Topics cover different applications such as lamps, plasma treatment of materials (etching, deposition, nitriding), plasma sources (microwave excitation, negative ion sources) and plasma destruction of pollutants. Several chapters deal with basic concepts in plasma physics, non equilibrium plasma modeling and plasma diagnostics as well as with laser interaction with solid targets. The authors gratefully acknowledge the financial support provided by university of Bari (Italy) and by CNR (Centro di Studio per la Chimica dei Plasmi, Istituto di Fisica Atomica e Molecolare (IFAM) and Progetto Finalizzato Materiali Speciali per Tecnologie Avanzate) as well as the sponsorship of ENEA. M. Capitelli C. Gorse v CONTENTS Plasmas in nature, laboratory and technology 1 A.M. Ignatov and A.A. Rukhadze Laser diagnostics of plasmas 11 L. Pyatnitsky Probe diagnostics of plasmas 27 G. Dilecce Theory, properties and applications of non equilibrium plasmas created by external energy sources 45 E. Son Non-Equilibrium plasma modeling 59 M. Capitel1i, R. Celiberto, G. Capriati, C. Gorse and S. Longo Gas discharge lamps 81 M. Koedam Plasma etching processes and diagnostics 93 R. d'Agostino and F. Fracassi Plasma deposition: processes and diagnostics 109 A
Author: M. Capitelli
Publisher: Springer Science & Business Media
ISBN: 1461534003
Category : Science
Languages : en
Pages : 226
Get Book Here
Book Description
The present book contains the proceedings of the workshop "Plasma Technology and Applications" which was held at 11 Ciocco (Lucca-Italy) during 5-6 July 1991. The workshop was organized just before ICPIG XX to emphasize the role of plasma physics and plasma chemistry in different fields of technology. Topics cover different applications such as lamps, plasma treatment of materials (etching, deposition, nitriding), plasma sources (microwave excitation, negative ion sources) and plasma destruction of pollutants. Several chapters deal with basic concepts in plasma physics, non equilibrium plasma modeling and plasma diagnostics as well as with laser interaction with solid targets. The authors gratefully acknowledge the financial support provided by university of Bari (Italy) and by CNR (Centro di Studio per la Chimica dei Plasmi, Istituto di Fisica Atomica e Molecolare (IFAM) and Progetto Finalizzato Materiali Speciali per Tecnologie Avanzate) as well as the sponsorship of ENEA. M. Capitelli C. Gorse v CONTENTS Plasmas in nature, laboratory and technology 1 A.M. Ignatov and A.A. Rukhadze Laser diagnostics of plasmas 11 L. Pyatnitsky Probe diagnostics of plasmas 27 G. Dilecce Theory, properties and applications of non equilibrium plasmas created by external energy sources 45 E. Son Non-Equilibrium plasma modeling 59 M. Capitel1i, R. Celiberto, G. Capriati, C. Gorse and S. Longo Gas discharge lamps 81 M. Koedam Plasma etching processes and diagnostics 93 R. d'Agostino and F. Fracassi Plasma deposition: processes and diagnostics 109 A
Author: Elizabeth Surrey
Publisher: American Institute of Physics
ISBN:
Category : Science
Languages : en
Pages : 520
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Book Description
All papers have been peer-reviewed. The Symposium covers all aspects of negative ion production in plasma sources, their extraction into particle beams and subsequent transport, neutralization and exploitation. It is of interest to researchers in plasma physics, particle accelerators and fusion. It is the only international symposium dedicated to negative ion sources and beams.
Author: Ian G. Brown
Publisher: John Wiley & Sons
ISBN: 3527604545
Category : Science
Languages : en
Pages : 396
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Book Description
The first edition of this title has become a well-known reference book on ion sources. The field is evolving constantly and rapidly, calling for a new, up-to-date version of the book. In the second edition of this significant title, editor Ian Brown, himself an authority in the field, compiles yet again articles written by renowned experts covering various aspects of ion source physics and technology. The book contains full chapters on the plasma physics of ion sources, ion beam formation, beam transport, computer modeling, and treats many different specific kinds of ion sources in sufficient detail to serve as a valuable reference text.
Author: Bernhard Wolf
Publisher: CRC Press
ISBN: 9780849325021
Category : Technology & Engineering
Languages : en
Pages : 558
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Book Description
The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.
Author: A. Theodore Forrester
Publisher: Wiley-VCH
ISBN:
Category : Science
Languages : en
Pages : 360
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Book Description
Magneto-Solid Mechanics Francis C. Moon Comprehensively treats, in monograph form, problems directly related to magneto-solid mechanics. Provides a thoroughly modern examination of the stresses, dynamics, and stability of magneto-mechanical devices such as superconducting magnets, levitated vehicles, magnetic mass drivers, electromagnets, and actuators. Over 60 specific coupled-magneto-mechanical problems are discussed and analyzed, and well over 200 illustrations are included. Physical concepts are introduced early, along with summaries of the basic equations of magneto-solid mechanics, magnetic forces, and energy. 1984 (0 471-88536-3) 436 pp. Chaotic Vibrations An Introduction for Applied Scientists and Engineers Francis C. Moon A valuable work which helps to translate new mathematical ideas in non-linear dynamics and chaos into a language that engineers and scientists can understand. As such it provides specific examples and applications of chaotic dynamics in the physical world and describes how to perform both computer and physical experiments in chaotic dynamics. New ideas in dynamics are explained such as Poincare maps, fractal dimensions and Lyapunov exponents. Includes a glossary of chaotic dynamics terms, a list of computer experiments, and an appendix of details for a demonstration experiment. 1987 (0 471-85685-1) 300 pp.
Author: Bernhard Wolf
Publisher: CRC Press
ISBN: 1351838385
Category : Technology & Engineering
Languages : en
Pages : 560
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Book Description
The Handbook of Ion Sources delivers the data needed for daily work with ion sources. It also gives information for the selection of a suitable ion source and ion production method for a specific application. The Handbook concentrates on practical aspects and introduces the principle function of ion sources. The basic plasma parameters are defined and discussed. The working principles of various ion sources are explained, and examples of each type of ion source are presented with their operational data. Tables of ion current for various elements and charge states summarize the performance of different ion sources. The problems related to the production of ions of non-gaseous elements are detailed, and data on useful materials for evaporation and ion source construction are summarized. Additional chapters are dedicated to extraction and beam formation, ion beam diagnosis, ion source electronics, and computer codes for extraction, acceleration, and beam transport. Emittance and brilliance are described and space charge effects and neutralization discussed. Various methods for the measurement of current, profile, emittance, and time structure are presented and compared. Intensity limits for these methods are provided for different ion energies. Typical problems related to the operation of ion source plasmas are discussed and practical examples of circuits are given. The influence of high voltage on ion source electronics and possibilities for circuit protection are covered. The generation of microwaves and various microwave equipment are described and special problems related to microwave operation are summarized. The Handbook of Ion Sources is a valuable reference on the subject, of benefit to practitioners and graduate students interested in accelerators, ion implantation, and ion beam techniques.
Author: Vadim Dudnikov
Publisher: Springer Nature
ISBN: 3031284089
Category : Science
Languages : en
Pages : 498
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Book Description
This book describes the development of sources of negative ions and their application in science and industry. It describes the physical foundations and implementation of the key methods of negative ion production and control, such as charge exchange, thermionic emission, plasma volume, secondary emission (sputtering) and surface-plasma sources, as well as the history of their development. Following on from this essential foundational material, the book goes on to explore transport of negative ion beams, and beam-plasma instabilities. Now in its second edition, the book has been substantially expanded and updated to address the many developments since it was first published, most importantly the development and investigation of cesiated surfaces with work function ~1.2-1.3 eV in conditions close to discharges in surface plasma sources. The book also includes a new chapter on development of conversion targets for high-energy neutral beam injectors, covering gas targets, plasma targets and photon targets for efficient conversion of high energy negative ion beams to neutral beams. With exposition accessible at the graduate level, and a comprehensive bibliography, this book will appeal to all students and researchers whose work concerns ion sources and their applications to accelerators, beam physics, storage rings, cyclotrons, and plasma traps.
Author: Garry McCracken
Publisher: Academic Press
ISBN: 0123846560
Category : Science
Languages : en
Pages : 249
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Book Description
"Offers scientists and researchers the scientific basics, up-to-date current research, technical developments, and practical applications needed in fusion energy research/"--pub. desc.
Author: M. Capitelli
Publisher: Springer Science & Business Media
ISBN: 1461537800
Category : Science
Languages : en
Pages : 682
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Book Description
The NATO . Advanced Research Insti tute on Nonequilibrium Processes in Partially Ionized Gases was held at Acquafredda di Maratea during 4-17 June 1989. The Institute considered the interconnections between scattering and transport theories and modeling of nonequilibrium systems generated by electrical discharges, emphasizing the importance of microscopic processes in affecting the bulk properties of plasmas. The book tries to reproduce these lines. In particular several contributions describe scattering cross sections involving electrons interacting with atoms and molecules in both ground and excited states (from theoretical and experimental point of view), of energy transfer processes as well as reactive ones involving excited molecules colliding with atoms and molecules as well as with metallic surfaces. Other contributions deal with the basis of transport theories (Boltzmann and Monte Carlo methods) for describing the bulk properties of non equilibrium plasmas as well as with the modeling of complicated systems emphasizing in particular the strong coupling between the Boltzmann equation and excited state kinetics. Finally the book contains several contributions describing applications in different fields such as Excimer Lasers, Negative Ion Production, RF Discharges, Plasma Chemistry, Atmospheric Processes and Physics of Lamps. The Organizing Committee gratefully acknowledges the generous financial support provided by the NATO Science Committee as well as by Azienda Autonoma di Soggiorno e Turismo of Maratea, by University of Bari, by C. N. R. (Centro di Studio per la Chimica dei Plasmi and Comitato per la Chimica), by ENEA, by Lawrence Livermore Laboratory and by US Army Research Office.
Author: Bernd Schmidt
Publisher: Springer Science & Business Media
ISBN: 3211993568
Category : Technology & Engineering
Languages : en
Pages : 425
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Book Description
A comprehensive review of ion beam application in modern materials research is provided, including the basics of ion beam physics and technology. The physics of ion-solid interactions for ion implantation, ion beam synthesis, sputtering and nano-patterning is treated in detail. Its applications in materials research, development and analysis, developments of special techniques and interaction mechanisms of ion beams with solid state matter result in the optimization of new material properties, which are discussed thoroughly. Solid-state properties optimization for functional materials such as doped semiconductors and metal layers for nano-electronics, metal alloys, and nano-patterned surfaces is demonstrated. The ion beam is an important tool for both materials processing and analysis. Researchers engaged in solid-state physics and materials research, engineers and technologists in the field of modern functional materials will welcome this text.
