Negative Ion Study Electron Cyclotron Resonance Etching Plasmas PDF Download
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Author: Pon-ung Ku
Publisher:
ISBN:
Category :
Languages : en
Pages : 198
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Book Description
Author: Pon-ung Ku
Publisher:
ISBN:
Category :
Languages : en
Pages : 198
Get Book Here
Book Description
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Book Description
Author: M. Sugawara
Publisher: OUP Oxford
ISBN: 0191590290
Category : Technology & Engineering
Languages : en
Pages : 362
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Book Description
The focus of this book is the remarkable advances in understanding of low pressure RF (radio frequency) glow discharges. A basic analytical theory and plasma physics are explained. Plasma diagnostics are also covered before the practicalities of etcher use are explored.
Author: Gerhard Franz
Publisher: Springer Science & Business Media
ISBN: 3540858490
Category : Technology & Engineering
Languages : en
Pages : 743
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Book Description
Over the last forty years, plasma supported processes have attracted ever - creasing interest, and now, all modern semiconductor devices undergo at least one plasma-involved processing step, starting from surface cleaning via coating to etching. In total, the range of the treated substrates covers some orders of magnitude: Trenches and linewidths of commercially available devices have - ready passed the boundary of 100 nm, decorative surface treatment will happen 2 in the mm range, and the upper limit is reached with surface protecting layers of windows which are coated with ?/4 layers against IR radiation. The rapid development of the semiconductor industry is inconceivable wi- outthegiantprogressintheplasmatechnology.Moore’slawisnotcarvedinto 1 stone, and not only the ITRS map is subject to change every ?ve years but also new branches develop and others mingle together. Moreover, the quality of conventional materials can be improved by plasma treatment:Cottonbecomesmorecrease-resistant,leathermoredurable,andthe shrinking of wool ?bers during the washing process can be signi?cantly reduced. To cut a long story short: More than 150 years after the discovery of the sputtering e?ect by Grove, plasma-based processes are about to spread out into new ?elds of research and application [1]—no wonder that the market for etching machines kept growing by an annual rate of 17 % up to the burst of the internet bubble, and it took only some years of recovery to continue the voyage [2].
Author: Mubarak A. Mujawar
Publisher:
ISBN:
Category :
Languages : en
Pages : 143
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Book Description
Electronegative plasmas have a wide ranging applications following its primary role in the production of energetic neutral beams of hydrogen used for plasma heating in fusion devices. In technological plasma applications electronegative gases are used for plasma etching which readily form stable negative ions. Significant population of negative ions in a discharge can greatly influence the discharge properties by reducing electron density while modifying the sheath structures adjacent to the substrates. Formation of negative ions is a complex process. They are primarily formed in the bulk phase by the dissociative attachment of low energy electron to an excited molecule. However intermediate excitation of the neutral molecules requires the presence of energetic electrons in the discharge. An efficient mechanism of negative ion production is via interaction with a low work function material such as Caesium coated surface as used in the negative ion source for neutral beam extraction. However, caesium migration between the acceleration grids can be a major concern for the failure of ion source during long pulse operation. Therefore suitably tailoring the plasma properties of the source can help in improving the efficiency of negative ion production in the bulk phase rather than surface production. The thesis deals with the study of oxygen negative ion formation in the anodic glow plasma. The anodic glow is characterized by a double layer having a steep gradient in Te and electron density. This region provides a natural favourable condition for the production of negative ions. The anodic glow is created via D.C discharge between a hollow tubular-anode in conjunction with parallel plate cathodes. The results show significant fraction of negative oxygen ions near the anodic glow. Theoretical estimates of negative ions at each spatial location are obtained by providing electron density and temperature measured using plasma diagnostic probes. The results show reasonable agreement with the experimental data suggesting that anodic glow can provide a suitable breeding ground for the production of negative ions. A qualitative model is presented for observing the oscillation in the discharge current due to ionization instability at the anode sheath.
Author: Mathis A. Smith
Publisher:
ISBN:
Category :
Languages : en
Pages : 212
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Book Description
Author: Fan Cheung Sze
Publisher:
ISBN:
Category : Cyclotron resonance
Languages : en
Pages : 574
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Book Description
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 692
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Book Description
Author: James Benedict Friedmann
Publisher:
ISBN:
Category :
Languages : en
Pages : 692
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Book Description
Author: National Research Council
Publisher: National Academies Press
ISBN: 0309045975
Category : Technology & Engineering
Languages : en
Pages : 88
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Book Description
Plasma processing of materials is a critical technology to several of the largest manufacturing industries in the worldâ€"electronics, aerospace, automotive, steel, biomedical, and toxic waste management. This book describes the relationship between plasma processes and the many industrial applications, examines in detail plasma processing in the electronics industry, highlights the scientific foundation underlying this technology, and discusses education issues in this multidisciplinary field. The committee recommends a coordinated, focused, and well-funded research program in this area that involves the university, federal laboratory, and industrial sectors of the community. It also points out that because plasma processing is an integral part of the infrastructure of so many American industries, it is important for both the economy and the national security that America maintain a strong leadership role in this technology.
