Author: Stanley Shengxi Zuo
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 670
Book Description
Microwave Plasma-assisted CVD Polycrystalline Diamond Films Deposition at Higher Pressure Conditions
Author: Stanley Shengxi Zuo
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 670
Book Description
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 670
Book Description
Synthesis and Characterization of Diamond Thin Films by Microwave Plasma-enhanced Chemical Vapor Deposition (MPECVD)
Author: Shih-Feng Chou
Publisher:
ISBN:
Category :
Languages : en
Pages : 174
Book Description
Diamond thin films are deposited on silicon wafers by MPECVD process with the presence of methane, argon, and hydrogen gases. The reaction chamber is designed with an internal microwave reaction cavity and a high-pressure pocket for improving deposition conditions. Scanning electron microscopy reveals tetrahedral and cauliflower-shaped crystals for polycrystalline diamond and nanocrystalline diamond films, respectively. Spectroscopy ellipsometer studies indicate that diamond-like carbon (DLC) films are deposited with a thickness of 700 nm. Fourier transform infrared spectroscopy shows C-H stretching in the range from 2800 cm -1 to 3000 cm -1 . Nanoindentation is performed on DLC films with an average hardness of 10.98 GPa and an average elastic modulus of 90.32 GPa. The effects of chamber pressure, microwave forward power, and gas mixture on the plasma chemistry are discussed. Substrate temperature has a significant influence on film growth rate, and substrate pretreatment can enhance the quality of diamond films.
Publisher:
ISBN:
Category :
Languages : en
Pages : 174
Book Description
Diamond thin films are deposited on silicon wafers by MPECVD process with the presence of methane, argon, and hydrogen gases. The reaction chamber is designed with an internal microwave reaction cavity and a high-pressure pocket for improving deposition conditions. Scanning electron microscopy reveals tetrahedral and cauliflower-shaped crystals for polycrystalline diamond and nanocrystalline diamond films, respectively. Spectroscopy ellipsometer studies indicate that diamond-like carbon (DLC) films are deposited with a thickness of 700 nm. Fourier transform infrared spectroscopy shows C-H stretching in the range from 2800 cm -1 to 3000 cm -1 . Nanoindentation is performed on DLC films with an average hardness of 10.98 GPa and an average elastic modulus of 90.32 GPa. The effects of chamber pressure, microwave forward power, and gas mixture on the plasma chemistry are discussed. Substrate temperature has a significant influence on film growth rate, and substrate pretreatment can enhance the quality of diamond films.
Investigation of Microwave Cavity Applicators for Plasma Assisted CVD Diamond Synthesis and Plasma Assisted Combustion
Author: Kadek Wardika Hemawan
Publisher:
ISBN:
Category : Cavity resonators
Languages : en
Pages : 710
Book Description
Publisher:
ISBN:
Category : Cavity resonators
Languages : en
Pages : 710
Book Description
Microwave Assisted Plasma CVD of Diamond Films Using Thermal-like Plasma Discharge
Author: Kuo-Ping Kuo
Publisher:
ISBN:
Category : Diamond thin films
Languages : en
Pages : 566
Book Description
Publisher:
ISBN:
Category : Diamond thin films
Languages : en
Pages : 566
Book Description
Low Temperature Growth of Pure Polycrystalline Diamond Films by Microwave Plasma Assisted Chemical Vapor Deposition
Author: 村中廉
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Microwave Plasma Assisted Chemical Vapor Deposition of Ultra-nanocrystalline Diamond Films
Author: Wen-Shin Huang
Publisher:
ISBN:
Category : Chemical vapor
Languages : en
Pages : 798
Book Description
Publisher:
ISBN:
Category : Chemical vapor
Languages : en
Pages : 798
Book Description
Diamond Films Handbook
Author: Jes Asmussen
Publisher: CRC Press
ISBN: 9780203910603
Category : Science
Languages : en
Pages : 692
Book Description
The Diamond Films Handbook is an important source of information for readers involved in the new diamond film technology, emphasizing synthesis technologies and diamond film applications. Containing over 1600 references, drawings, photographs, micrographs, equations, and tables, and contributions by experts from both industry and academia, it inclu
Publisher: CRC Press
ISBN: 9780203910603
Category : Science
Languages : en
Pages : 692
Book Description
The Diamond Films Handbook is an important source of information for readers involved in the new diamond film technology, emphasizing synthesis technologies and diamond film applications. Containing over 1600 references, drawings, photographs, micrographs, equations, and tables, and contributions by experts from both industry and academia, it inclu
Diamond Films
Author: Koji Kobashi
Publisher: Elsevier
ISBN: 0080525571
Category : Science
Languages : en
Pages : 350
Book Description
- Discusses the most advanced techniques for diamond growth - Assists diamond researchers in deciding on the most suitable process conditions - Inspires readers to devise new CVD (chemical vapor deposition Ever since the early 1980s, and the discovery of the vapour growth methods of diamond film, heteroexpitaxial growth has become one of the most important and heavily discussed topics amongst the diamond research community. Kobashi has documented such discussions with a strong focus on how diamond films can be best utilised as an industrial material, working from the premise that crystal diamond films can be made by chemical vapour disposition. Kobashi provides information on the process and characterization technologies of oriented and heteroepitaxial growth of diamond films.
Publisher: Elsevier
ISBN: 0080525571
Category : Science
Languages : en
Pages : 350
Book Description
- Discusses the most advanced techniques for diamond growth - Assists diamond researchers in deciding on the most suitable process conditions - Inspires readers to devise new CVD (chemical vapor deposition Ever since the early 1980s, and the discovery of the vapour growth methods of diamond film, heteroexpitaxial growth has become one of the most important and heavily discussed topics amongst the diamond research community. Kobashi has documented such discussions with a strong focus on how diamond films can be best utilised as an industrial material, working from the premise that crystal diamond films can be made by chemical vapour disposition. Kobashi provides information on the process and characterization technologies of oriented and heteroepitaxial growth of diamond films.
Synthesis of Thin and Thick Ultra-nanocrystalline Diamond Films by Microwave Plasma CVD Systems
Author: Dzung Tri Tran
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 314
Book Description
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 314
Book Description
Electrical Properties and Physical Characteristics of Polycrystalline Diamond Films Deposited in a Microwave Plasma Disk Reactor
Author: Bohr-ran Huang
Publisher:
ISBN:
Category : Diamond thin films
Languages : en
Pages : 468
Book Description
Publisher:
ISBN:
Category : Diamond thin films
Languages : en
Pages : 468
Book Description