Author: Vivek Thummala
Publisher:
ISBN:
Category :
Languages : en
Pages : 176
Book Description
Microstructural Characterization of Movpe Grown Aluminum Nitride Thin Films on Silicon (111) Substrates
Author: Vivek Thummala
Publisher:
ISBN:
Category :
Languages : en
Pages : 176
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 176
Book Description
Nanoscale Microstructural Characterization of Aluminum and Copper Bilayer Thin Films Deposited on Silicon Substrate Using Magnetron Sputtering Technique
Author: Zulhelmi Alif Abdul Halim
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages : 161
Book Description
Publisher:
ISBN:
Category : Thin films
Languages : en
Pages : 161
Book Description
Chemical Abstracts
Author:
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 2540
Book Description
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 2540
Book Description
Aluminum Nitride Thin Films for MEMS Resonators
Author: Vanni Lughi
Publisher:
ISBN: 9780542681318
Category :
Languages : en
Pages : 530
Book Description
High quality aluminum nitride films, meeting all the requirements for the fabrication of the resonators, were deposited at low temperature (
Publisher:
ISBN: 9780542681318
Category :
Languages : en
Pages : 530
Book Description
High quality aluminum nitride films, meeting all the requirements for the fabrication of the resonators, were deposited at low temperature (
Aluminum Nitride Thin Films - Deposition for Fabrication, Characterization and Fabrication of Surface Acoustic Wave Devices
Author: Charlee Fansler
Publisher:
ISBN: 9783836469722
Category : Technology & Engineering
Languages : en
Pages : 124
Book Description
Aluminum Nitride (AlN) thin films can be used for many device applications; for example, Surface Acoustic Wave (SAW) devices, microelectromechanical systems (MEMS) applications, and packaging applications. In this work, AlN is the critical layer in the fabrication process. One challenge is reliable deposition over wafer size substrates. The method of interest for deposition is pulsed DC sputtering. The (002) plane is the desired plane for its piezoelectric properties. The surface roughness of the deposited AlN is low and adheres well to the substrate. An AlN layer was deposited on a UNCD/Si substrate. Al was deposited on the AlN layer to form the IDTs (interdigital transducers) for SAW devices. SAW devices were fabricated on quartz - ST substrate. To verify the SAW devices work, they were tested using a network analyzer. This book discusses these results and parameters for AlN film deposition, film properties and implications for devices. This book would be beneficial for professionals, scientists, engineers, and graduate students in science and engineering working in the areas of wide bandgap semi-conductors, nitrides and piezoelectric materials and various acoustic wave devices.
Publisher:
ISBN: 9783836469722
Category : Technology & Engineering
Languages : en
Pages : 124
Book Description
Aluminum Nitride (AlN) thin films can be used for many device applications; for example, Surface Acoustic Wave (SAW) devices, microelectromechanical systems (MEMS) applications, and packaging applications. In this work, AlN is the critical layer in the fabrication process. One challenge is reliable deposition over wafer size substrates. The method of interest for deposition is pulsed DC sputtering. The (002) plane is the desired plane for its piezoelectric properties. The surface roughness of the deposited AlN is low and adheres well to the substrate. An AlN layer was deposited on a UNCD/Si substrate. Al was deposited on the AlN layer to form the IDTs (interdigital transducers) for SAW devices. SAW devices were fabricated on quartz - ST substrate. To verify the SAW devices work, they were tested using a network analyzer. This book discusses these results and parameters for AlN film deposition, film properties and implications for devices. This book would be beneficial for professionals, scientists, engineers, and graduate students in science and engineering working in the areas of wide bandgap semi-conductors, nitrides and piezoelectric materials and various acoustic wave devices.
Microstructure Characterization of Nitride Thin Films and Heterostructures
Author: Lin Zhou
Publisher:
ISBN:
Category : Aluminum nitride
Languages : en
Pages : 214
Book Description
Publisher:
ISBN:
Category : Aluminum nitride
Languages : en
Pages : 214
Book Description
Comprehensive Semiconductor Science and Technology
Author:
Publisher: Newnes
ISBN: 0080932282
Category : Science
Languages : en
Pages : 3572
Book Description
Semiconductors are at the heart of modern living. Almost everything we do, be it work, travel, communication, or entertainment, all depend on some feature of semiconductor technology. Comprehensive Semiconductor Science and Technology, Six Volume Set captures the breadth of this important field, and presents it in a single source to the large audience who study, make, and exploit semiconductors. Previous attempts at this achievement have been abbreviated, and have omitted important topics. Written and Edited by a truly international team of experts, this work delivers an objective yet cohesive global review of the semiconductor world. The work is divided into three sections. The first section is concerned with the fundamental physics of semiconductors, showing how the electronic features and the lattice dynamics change drastically when systems vary from bulk to a low-dimensional structure and further to a nanometer size. Throughout this section there is an emphasis on the full understanding of the underlying physics. The second section deals largely with the transformation of the conceptual framework of solid state physics into devices and systems which require the growth of extremely high purity, nearly defect-free bulk and epitaxial materials. The last section is devoted to exploitation of the knowledge described in the previous sections to highlight the spectrum of devices we see all around us. Provides a comprehensive global picture of the semiconductor world Each of the work's three sections presents a complete description of one aspect of the whole Written and Edited by a truly international team of experts
Publisher: Newnes
ISBN: 0080932282
Category : Science
Languages : en
Pages : 3572
Book Description
Semiconductors are at the heart of modern living. Almost everything we do, be it work, travel, communication, or entertainment, all depend on some feature of semiconductor technology. Comprehensive Semiconductor Science and Technology, Six Volume Set captures the breadth of this important field, and presents it in a single source to the large audience who study, make, and exploit semiconductors. Previous attempts at this achievement have been abbreviated, and have omitted important topics. Written and Edited by a truly international team of experts, this work delivers an objective yet cohesive global review of the semiconductor world. The work is divided into three sections. The first section is concerned with the fundamental physics of semiconductors, showing how the electronic features and the lattice dynamics change drastically when systems vary from bulk to a low-dimensional structure and further to a nanometer size. Throughout this section there is an emphasis on the full understanding of the underlying physics. The second section deals largely with the transformation of the conceptual framework of solid state physics into devices and systems which require the growth of extremely high purity, nearly defect-free bulk and epitaxial materials. The last section is devoted to exploitation of the knowledge described in the previous sections to highlight the spectrum of devices we see all around us. Provides a comprehensive global picture of the semiconductor world Each of the work's three sections presents a complete description of one aspect of the whole Written and Edited by a truly international team of experts
Microstructural Characterization of Post Ion-implanted Cubic Boron Nitride Thin Films by Transmission Electron Microscopy
Author: Sandhya Gunasekara
Publisher:
ISBN:
Category : Boron nitride
Languages : en
Pages : 196
Book Description
Publisher:
ISBN:
Category : Boron nitride
Languages : en
Pages : 196
Book Description
Characterization of the Growth of Aluminum Nitride and Gallium Nitride Thin Films on Hydrogen Etched And/or Cleaned 6H-SiC(0001) Surfaces
Author: Jeffrey David Hartman
Publisher:
ISBN:
Category :
Languages : en
Pages : 219
Book Description
Keywords: 6H-SiC, Hydrogen etching, Aluminum nitride, Gallium nitride, Photo-electron emission microscopy, Chemical vapor deposition, Molecular beam epitaxy.
Publisher:
ISBN:
Category :
Languages : en
Pages : 219
Book Description
Keywords: 6H-SiC, Hydrogen etching, Aluminum nitride, Gallium nitride, Photo-electron emission microscopy, Chemical vapor deposition, Molecular beam epitaxy.
International Aerospace Abstracts
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 974
Book Description
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 974
Book Description