Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 379
Book Description
Microcircuit Engineering 82
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 379
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 379
Book Description
Microcircuit Engineering 82
Author: Colloque International sur la Microlithographie
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 379
Book Description
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 379
Book Description
The Physics of Micro/Nano-Fabrication
Author: Ivor Brodie
Publisher: Springer Science & Business Media
ISBN: 1475767757
Category : Science
Languages : en
Pages : 661
Book Description
In this revised and expanded edition, the authors provide a comprehensive overview of the tools, technologies, and physical models needed to understand, build, and analyze microdevices. Students, specialists within the field, and researchers in related fields will appreciate their unified presentation and extensive references.
Publisher: Springer Science & Business Media
ISBN: 1475767757
Category : Science
Languages : en
Pages : 661
Book Description
In this revised and expanded edition, the authors provide a comprehensive overview of the tools, technologies, and physical models needed to understand, build, and analyze microdevices. Students, specialists within the field, and researchers in related fields will appreciate their unified presentation and extensive references.
Technical Abstract Bulletin
Author:
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 216
Book Description
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 216
Book Description
Basic Engineering Circuit Analysis
Author: J. David Irwin
Publisher: Wiley
ISBN: 9780470083093
Category : Technology & Engineering
Languages : en
Pages : 816
Book Description
Publisher: Wiley
ISBN: 9780470083093
Category : Technology & Engineering
Languages : en
Pages : 816
Book Description
Directory of Published Proceedings
Author:
Publisher:
ISBN:
Category : Engineering
Languages : en
Pages : 332
Book Description
Publisher:
ISBN:
Category : Engineering
Languages : en
Pages : 332
Book Description
Official Gazette of the United States Patent and Trademark Office
Author:
Publisher:
ISBN:
Category : Trademarks
Languages : en
Pages : 960
Book Description
Publisher:
ISBN:
Category : Trademarks
Languages : en
Pages : 960
Book Description
Scientific and Technical Aerospace Reports
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 1162
Book Description
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 1162
Book Description
Semiconductor Technologies
Author:
Publisher:
ISBN:
Category : Electronic circuits
Languages : en
Pages : 410
Book Description
Publisher:
ISBN:
Category : Electronic circuits
Languages : en
Pages : 410
Book Description
The Physics of Submicron Lithography
Author: Kamil A. Valiev
Publisher: Springer Science & Business Media
ISBN: 146153318X
Category : Science
Languages : en
Pages : 502
Book Description
This book is devoted to the physics of electron-beam, ion-beam, optical, and x-ray lithography. The need for this book results from the following considerations. The astonishing achievements in microelectronics are in large part connected with successfully applying the relatively new technology of processing (changing the prop erties of) a material into a device whose component dimensions are submicron, called photolithography. In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer. The smallest dimensions of the device components are limited by the diffraction of the light when the pattern is transferred and are approximately the same as the wavelength of the light. Photolithography by light having a wavelength of A ~ 0.4 flm has made it possible to serially produce integrated circuits having devices whose minimal size is 2-3 flm in the 4 pattern and having 10-105 transistors per circuit.
Publisher: Springer Science & Business Media
ISBN: 146153318X
Category : Science
Languages : en
Pages : 502
Book Description
This book is devoted to the physics of electron-beam, ion-beam, optical, and x-ray lithography. The need for this book results from the following considerations. The astonishing achievements in microelectronics are in large part connected with successfully applying the relatively new technology of processing (changing the prop erties of) a material into a device whose component dimensions are submicron, called photolithography. In this method the device is imaged as a pattern on a metal film that has been deposited onto a transparent substrate and by means of a broad stream of light is transferred to a semiconductor wafer within which the physical structure of the devices and the integrated circuit connections are formed layer by layer. The smallest dimensions of the device components are limited by the diffraction of the light when the pattern is transferred and are approximately the same as the wavelength of the light. Photolithography by light having a wavelength of A ~ 0.4 flm has made it possible to serially produce integrated circuits having devices whose minimal size is 2-3 flm in the 4 pattern and having 10-105 transistors per circuit.