Author: Seshu B. Desu
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 290
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Book Description
The use of high-performance ceramic materials in microelectronics holds the potential for the development of a wide range of novel, high-value products. For example, ferroelectric ceramic capacitors are key to the development of high-density ferroelectric nonvolatile memory (FRAM). High-dielectric constant para-electric capacitors are potentially useful for the production of high-density dynamic random access memory (DRAM) and for decoupling capacitors in high-speed microprocessors. Electro-optic materials are useful as waveguides, tunable filters and switches in advance communication applications. Researchers come together in this book to discuss both the application of metal-organic chemical vapor deposited (MOCVD) materials to microelectronics and the 'nuts and bolts' of the technique. A wide variety of opto-electronic, superconducting, ferroelectric and other advanced ceramic materials are discussed. Problems of dealing with low-volatility precursors, design of new precursors, and characterization of CVD processes are addressed. Topics include: nonoxide ceramics; precursor chemistry and delivery; process analysis and characterization; and oxide ceramics.
Author: David B. Beach
Publisher: Materials Research Society
ISBN: 9781558992344
Category : Technology & Engineering
Languages : en
Pages : 0
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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author:
Publisher:
ISBN:
Category : Electronic ceramics
Languages : en
Pages : 392
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Book Description
Author:
Publisher:
ISBN:
Category :
Languages : un
Pages :
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Book Description
Author:
Publisher:
ISBN:
Category : Electronic ceramics
Languages : en
Pages : 288
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Book Description
Author:
Publisher:
ISBN:
Category : Electronic ceramics
Languages : en
Pages : 0
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Book Description
Author: Prashant N. Kumta
Publisher: Mrs Proceedings
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 496
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Book Description
Containing 65 papers from the symposium titled Chemical Aspects of Electronic Ceramics Processing held in November- December 1997 in Boston, the contents of this volume are divided into five sections: chemical vapor deposition of oxide ceramics; chemical vapor deposition of nonoxide ceramics; solution routes to ceramic materials; characterization and application of ceramic materials; and process characterization as a form of novel processing of ceramic materials. Annotation copyrighted by Book News, Inc., Portland, OR
Author: Theodore M. Besman
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 400
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Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Author: Jim D. Atwood
Publisher: John Wiley & Sons
ISBN: 0470145544
Category : Science
Languages : en
Pages : 499
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Book Description
Kein anderes Werk bietet Ihnen diese Informationsfülle zu Reaktionen und Methoden der anorganischen Chemie in ähnlich einheitlicher, knapp zusammengefaßter, hervorragend organisierter Form! Neben Beiträgen aus allen Bereichen der anorganischen Chemie finden Sie in diesem Band eine tiefergehende Behandlung von Reaktionen zur Bindungsknüpfung, übersichtlich geordnet nach den beteiligten Elementen. Ein Verbindungsregister eröffnet Ihnen verschiedene Alternativen zum schnellen, zuverlässigen Auffinden von Informationen. (06/99)
Author: Anthony C. Jones
Publisher: Cambridge University Press
ISBN: 9781107413207
Category : Technology & Engineering
Languages : en
Pages : 328
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Book Description
This book focuses on the creative use of chemistry in the fabrication of a variety of oxide and non-oxide materials which are likely to play a crucial role in the development of the next generation of microelectronics devices. It includes inorganic precursor chemistry, gas-phase and solid-state chemistry, materials science, chemical physics and chemical engineering. Highlights include the deposition of high-k dielectric gate oxides, ferroelectric oxide films for infrared and memory applications, low-k dielectrics, TiN and TaN diffusion barriers, and fresh precursors for III-V nitrides. The emphasis is on chemical methods for the controlled deposition of thin films, for which chemical vapor deposition (CVD) has proven to be a useful and versatile technique. Of particular interest is the use of liquid-injection MOCVD for the deposition of oxide multilayers and superlattices. Solution deposition techniques such as sol-gel, metalorganic decomposition (MOD), hydrothermal processing are also prominently featured. Topics include: CVD of oxide ceramics; CVD of nonoxide ceramics; solution deposition of electronic ceramics; alternative chemical processing methods and characterization of electronic ceramics..
