Mechanical Properties of Silicon Carbide Thin Films by Activated Reactive Evaporation (ARE) Process PDF Download
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Author: Patrick Gu-Ho Kim
Publisher:
ISBN:
Category :
Languages : en
Pages : 180
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Book Description
Author: Patrick Gu-Ho Kim
Publisher:
ISBN:
Category :
Languages : en
Pages : 180
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Book Description
Author: YongHwa Chris Cha
Publisher:
ISBN:
Category :
Languages : en
Pages : 302
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Book Description
Author: Jayadeep Deva Reddy
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Author: Jay S. Mitchell
Publisher:
ISBN:
Category :
Languages : en
Pages : 254
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Author:
Publisher:
ISBN:
Category : Corrosion and anti-corrosives
Languages : en
Pages : 564
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Book Description
Author: Mariana Amorim Fraga
Publisher:
ISBN: 9781613247747
Category : Amorphous semiconductors
Languages : en
Pages : 0
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Book Description
Silicon carbide (SiC) has been described as a suitable semiconductor material to use in MEMS and electronic devices for harsh environments. In recent years, many developments in SiC technology as bulk growth, materials processing, electronic devices and sensors have been shown. Moreover, some studies show the synthesis, characterisation and processing of crystalline SiC films. However, few works have investigated the potential of amorphous silicon carbide (a-SiC) thin films for sensors applications. This book presents fundamentals of amorphous silicon carbide thin films and their applications in piezoresistive sensors for high temperature applications.
Author: B. D. Sartwell
Publisher: Elsevier
ISBN: 1483274659
Category : Technology & Engineering
Languages : en
Pages : 981
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Book Description
Surface & Coatings Technology, Volume 61 presents the proceeding of the 20th International Conference on Metallurgical Coatings and Thin Films, held in San Diego, California, on April 19–23, 1993. This book discusses a variety of topics related to surface and coatings technology, including coatings for use at high temperature, hard coatings, and vapor deposition technology. Organized into 141 chapters, this compilation of papers begins with an overview of the coating requirements for long-life bucket protection, how each of these coating systems has performed, and the advantages and disadvantages of each. This text then discusses the gradient-free transition step achieved in the element analysis of the depth profiles. Other chapters consider the metastable yttrium oxide films that are synthesized using reactive sputter deposition. This book discusses as well the use of appropriate copper-based alloy coatings on structural components. The final chapter deals with the particle mechanical and thermal behavior in the process of high velocity oxy-fuel spraying. This book is a valuable resource for chemical engineers and metallurgists.
Author: B.D. Sartwell
Publisher: Elsevier
ISBN: 0444601104
Category : Technology & Engineering
Languages : en
Pages : 1129
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Book Description
Metallurgical Coatings and Thin Films 1990 presents the Proceedings of the 17th International Conference on Metallurgical Coatings and 8th International Conference on Thin Films, held in San Diego, California on April 2-6, 1990. It contains 219 papers covering a wide range of topics related to metallurgical coatings and thin films, including high temperature coatings, hard coatings, diamond films, tribology, and ion beam modification. Organized into 99 chapters, this volume begins with a discussion of a thermochemical model for diamond growth from the vapor phase and an experiment in large area diamond coating using a combustion flame torch in its traversing mode. It then explores the properties of diamond films, preparation of diamond-like carbon films using various ion-beam-assisted techniques, deposition of diamond-like films by laser ablation, and coating of cubic BN films on different substrates. The book examines surface processes and rate-determining steps in plasma-induced chemical vapor deposition, and addition of rare earths to improve scale adherence on heat-resisting alloys and coatings. The reader is introduced to high temperature wear and clearance control coatings, thermal barrier coatings, and corrosion resistant coatings. The book also discusses modification of coatings/surfaces to reduce friction; the mechanics of the tribology of thin films systems; mechanochemical interactions in the tribological behavior of materials; analysis and micromechanical testing of tribological coatings; surface modification using directed ion beams; and industrial equipment and processes. This book is a valuable resource for students and researchers interested in metallurgical coatings and thin films.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 69
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Book Description
In this study, hydrogenated amorphous silicon carbide thin films were deposited by reactive ion-beam sputtering under varying conditions to determine whether a film's optical properties can be controlled, focusing on refractive index. Using a Kaufman type ion source to sputter a pure silicon target, three distinct series of films were grown. The first series varied the mixture of methane and argon used in the ion-beam. holding all other parameters constant. For the second series the gas mix was fixed, and only the beam energy (beam voltage) was varied. The final series also varied beam energy, but was grown with a graphite shield next to the target to reduce metal contamination sputtered from chamber surfaces. Results show the index of refraction increased monotonically with beam energy up to a beam voltage of 1300 volts. Both the second and third series of films followed this trend, but analysis of differences in atomic composition between two series revealed opposite trends for how the silicon to carbon content ratio and refractive index were related. More precise control of the gas flow, and sputtering from only the intended (silicon)target would have reduced experimental errors.
Author: Yasuto Hijikata
Publisher: BoD – Books on Demand
ISBN: 9535109170
Category : Science
Languages : en
Pages : 416
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Book Description
Recently, some SiC power devices such as Schottky-barrier diodes (SBDs), metal-oxide-semiconductor field-effect-transistors (MOSFETs), junction FETs (JFETs), and their integrated modules have come onto the market. However, to stably supply them and reduce their cost, further improvements for material characterizations and those for device processing are still necessary. This book abundantly describes recent technologies on manufacturing, processing, characterization, modeling, and so on for SiC devices. In particular, for explanation of technologies, I was always careful to argue physics underlying the technologies as much as possible. If this book could be a little helpful to progress of SiC devices, it will be my unexpected happiness.
