Author: S. Coffa
Publisher: Springer Science & Business Media
ISBN: 940112714X
Category : Technology & Engineering
Languages : en
Pages : 523
Book Description
Semiconductors lie at the heart of some of the most important industries and technologies of the twentieth century. The complexity of silicon integrated circuits is increasing considerably because of the continuous dimensional shrinkage to improve efficiency and functionality. This evolution in design rules poses real challenges for the materials scientists and processing engineers. Materials, defects and processing now have to be understood in their totality. World experts discuss, in this volume, the crucial issues facing lithography, ion implication and plasma processing, metallization and insulating layer quality, and crystal growth. Particular emphasis is placed upon silicon, but compound semiconductors and photonic materials are also highlighted. The fundamental concepts of phase stability, interfaces and defects play a key role in understanding these crucial issues. These concepts are reviewed in a crucial fashion.
Crucial Issues in Semiconductor Materials and Processing Technologies
Author: S. Coffa
Publisher: Springer Science & Business Media
ISBN: 940112714X
Category : Technology & Engineering
Languages : en
Pages : 523
Book Description
Semiconductors lie at the heart of some of the most important industries and technologies of the twentieth century. The complexity of silicon integrated circuits is increasing considerably because of the continuous dimensional shrinkage to improve efficiency and functionality. This evolution in design rules poses real challenges for the materials scientists and processing engineers. Materials, defects and processing now have to be understood in their totality. World experts discuss, in this volume, the crucial issues facing lithography, ion implication and plasma processing, metallization and insulating layer quality, and crystal growth. Particular emphasis is placed upon silicon, but compound semiconductors and photonic materials are also highlighted. The fundamental concepts of phase stability, interfaces and defects play a key role in understanding these crucial issues. These concepts are reviewed in a crucial fashion.
Publisher: Springer Science & Business Media
ISBN: 940112714X
Category : Technology & Engineering
Languages : en
Pages : 523
Book Description
Semiconductors lie at the heart of some of the most important industries and technologies of the twentieth century. The complexity of silicon integrated circuits is increasing considerably because of the continuous dimensional shrinkage to improve efficiency and functionality. This evolution in design rules poses real challenges for the materials scientists and processing engineers. Materials, defects and processing now have to be understood in their totality. World experts discuss, in this volume, the crucial issues facing lithography, ion implication and plasma processing, metallization and insulating layer quality, and crystal growth. Particular emphasis is placed upon silicon, but compound semiconductors and photonic materials are also highlighted. The fundamental concepts of phase stability, interfaces and defects play a key role in understanding these crucial issues. These concepts are reviewed in a crucial fashion.
Environmental Issues with Materials and Processes for the Electronics and Semiconductor Industries
Author: Laura Mendicino
Publisher: The Electrochemical Society
ISBN: 9781566773126
Category : Science
Languages : en
Pages : 228
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566773126
Category : Science
Languages : en
Pages : 228
Book Description
Environmental Issues with Materials and Processes for the Electronics and Semiconductor Industries V
Author: Laura Mendicino
Publisher: The Electrochemical Society
ISBN: 9781566773379
Category : Science
Languages : en
Pages : 278
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566773379
Category : Science
Languages : en
Pages : 278
Book Description
Proceedings of the 3rd International Conference on Advances in Materials Processing: Challenges and Opportunities
Author: Abhishek Tewari
Publisher: Springer Nature
ISBN: 9819919711
Category : Science
Languages : en
Pages : 263
Book Description
This book presents peer reviewed articles from the 3rd International Conference on Advances in Materials Processing: Challenges and Opportunities (AMPCO 2022), held at IIT Roorkee, India. It highlights recent progress made in the fields of materials processing, advanced steel technology and materials for sustainability. The conference is also special as it is being organized on the occasion of 60 years of the department of metallurgical and materials engineering as well as 175 years of IIT Roorkee.
Publisher: Springer Nature
ISBN: 9819919711
Category : Science
Languages : en
Pages : 263
Book Description
This book presents peer reviewed articles from the 3rd International Conference on Advances in Materials Processing: Challenges and Opportunities (AMPCO 2022), held at IIT Roorkee, India. It highlights recent progress made in the fields of materials processing, advanced steel technology and materials for sustainability. The conference is also special as it is being organized on the occasion of 60 years of the department of metallurgical and materials engineering as well as 175 years of IIT Roorkee.
Materials and Processes for Next Generation Lithography
Author:
Publisher: Elsevier
ISBN: 0081003587
Category : Science
Languages : en
Pages : 636
Book Description
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
Publisher: Elsevier
ISBN: 0081003587
Category : Science
Languages : en
Pages : 636
Book Description
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
Thin Film Materials, Processes, and Reliability
Author: G. S. Mathad
Publisher: The Electrochemical Society
ISBN: 9781566773935
Category : Technology & Engineering
Languages : en
Pages : 438
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566773935
Category : Technology & Engineering
Languages : en
Pages : 438
Book Description
Advancements in Materials Processing Technology, Volume 1
Author: Rina Sahu
Publisher: Springer Nature
ISBN: 9819749581
Category :
Languages : en
Pages : 332
Book Description
Publisher: Springer Nature
ISBN: 9819749581
Category :
Languages : en
Pages : 332
Book Description
Medical Device Materials
Author: Sanjay Shrivastava
Publisher: ASM International
ISBN: 1615032606
Category : Medical
Languages : en
Pages : 536
Book Description
In this proceedings volume, professionals from the medical device industry and their suppliers share technological and scientific knowledge, as well as insights into the latest innovations. The focus is on metallic materials, such as titanium alloys, Nitinol, cobalt-chromium alloys, stainless steels and noble metals, as applied in various medical devices. Topics range from orthopedics to orthodontics, materials selection to materials characterization. --
Publisher: ASM International
ISBN: 1615032606
Category : Medical
Languages : en
Pages : 536
Book Description
In this proceedings volume, professionals from the medical device industry and their suppliers share technological and scientific knowledge, as well as insights into the latest innovations. The focus is on metallic materials, such as titanium alloys, Nitinol, cobalt-chromium alloys, stainless steels and noble metals, as applied in various medical devices. Topics range from orthopedics to orthodontics, materials selection to materials characterization. --
SiGe, Ge, and Related Compounds 3: Materials, Processing, and Devices
Author: David Harame
Publisher: The Electrochemical Society
ISBN: 1566776562
Category : Electronic apparatus and appliances
Languages : en
Pages : 1136
Book Description
Advanced semiconductor technology is depending on innovation and less on "classical" scaling. SiGe, Ge, and Related Compounds have become a key component of the arsenal in improving semiconductor performance. This issue of ECS Transactions discusses the technology to form these materials, process them, FET devices incorporating them, Surfaces and Interfaces, Optoelectronic devices, and HBT devices.
Publisher: The Electrochemical Society
ISBN: 1566776562
Category : Electronic apparatus and appliances
Languages : en
Pages : 1136
Book Description
Advanced semiconductor technology is depending on innovation and less on "classical" scaling. SiGe, Ge, and Related Compounds have become a key component of the arsenal in improving semiconductor performance. This issue of ECS Transactions discusses the technology to form these materials, process them, FET devices incorporating them, Surfaces and Interfaces, Optoelectronic devices, and HBT devices.
Superalloys 2012
Author: Eric S. Huron
Publisher: John Wiley & Sons
ISBN: 1118516400
Category : Technology & Engineering
Languages : en
Pages : 952
Book Description
A superalloy, or high-performance alloy, is an alloy that exhibits excellent mechanical strength at high temperatures. Superalloy development has been driven primarily by the aerospace and power industries. This compilation of papers from the Twelfth International Symposium on Superalloys, held from September 9-13, 2012, offers the most recent technical information on this class of materials.
Publisher: John Wiley & Sons
ISBN: 1118516400
Category : Technology & Engineering
Languages : en
Pages : 952
Book Description
A superalloy, or high-performance alloy, is an alloy that exhibits excellent mechanical strength at high temperatures. Superalloy development has been driven primarily by the aerospace and power industries. This compilation of papers from the Twelfth International Symposium on Superalloys, held from September 9-13, 2012, offers the most recent technical information on this class of materials.