Magnetic Field-assisted Chemical Vapor Deposition of Iron, Vanadium and Titanium Oxides PDF Download
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Author: Daniel Stadler
Publisher:
ISBN: 9783843947626
Category :
Languages : en
Pages :
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Author: Daniel Stadler
Publisher:
ISBN: 9783843947626
Category :
Languages : en
Pages :
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Author: Hirotsugu Yasuda
Publisher: CRC Press
ISBN: 1439838801
Category : Science
Languages : en
Pages : 256
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Book Description
The magneto luminous chemical vapor deposition (MLCVD) method is the perfect example of the "front-end green process." It employs an entirely new process that expends the minimum amount of materials in gas phase, yields virtually no effluent, and therefore requires no environmental remediation. Unlike the "back-end green process," which calls for a
Author: Mark Nicholas Field
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Author: Polly Wanda Chu
Publisher:
ISBN:
Category :
Languages : en
Pages : 434
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Thin titanium dioxide films were produced by metalorganic chemical vapor deposition on sapphire(0001) in an ultrahigh vacuum (UHV) chamber. A method was developed for producing controlled submonolayer depositions from titanium isopropoxide precursor. Film thickness ranged from 0.1 to 2.7 nm. In situ X-ray photoelectron spectroscopy (XPS) was used to determine film stoichiometry with increasing thickness. The effect of isothermal annealing on desorption was evaluated. Photoelectron peak shapes and positions from the initial monolayers were analyzed for evidence of interface reaction. Deposition from titanium isopropoxide is divided into two regimes: depositions below and above the pyrolysis temperature. This temperature was determined to be 300 deg C. Controlled submonolayers of titanium oxide were produced by cycles of dosing with titanium isopropoxide vapor below and annealing above 300 deg C. Precursor adsorption below the pyrolysis temperature was observed to saturate after 15 minutes of dosing. The quantity absorbed was shown to have an upper limit of one monolayer. The stoichiometry of thin films grown by the cycling method were determined to be TiO2. Titanium dioxide film stoichiometry was unaffected by isothermal annealing at 700 deg C. Annealing produced a decrease in film thickness. This was explained as due to desorption. Desorption ceased at approximately 2.5 to 3 monolayers, suggesting bonding of the initial monolayers of film to sapphire is stronger than to itself. Evidence of sapphire reduction at the interface by the depositions was not observed. The XPS O is peak shifted with increased film thickness. The shifts were consistent with oxygen in sapphire and titanium dioxide having different O is photoelectron peak positions. Simulations showed the total shifts for thin films ranging in thickness of 0.1 to 2.7 nm to be -0.99 to -1.23 eV. Thick films were produced for comparison.
Author:
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ISBN:
Category : Power resources
Languages : en
Pages : 748
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Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 704
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Author:
Publisher: Newnes
ISBN: 0080965334
Category : Technology & Engineering
Languages : en
Pages : 5485
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Book Description
Comprehensive Materials Processing, Thirteen Volume Set provides students and professionals with a one-stop resource consolidating and enhancing the literature of the materials processing and manufacturing universe. It provides authoritative analysis of all processes, technologies, and techniques for converting industrial materials from a raw state into finished parts or products. Assisting scientists and engineers in the selection, design, and use of materials, whether in the lab or in industry, it matches the adaptive complexity of emergent materials and processing technologies. Extensive traditional article-level academic discussion of core theories and applications is supplemented by applied case studies and advanced multimedia features. Coverage encompasses the general categories of solidification, powder, deposition, and deformation processing, and includes discussion on plant and tool design, analysis and characterization of processing techniques, high-temperatures studies, and the influence of process scale on component characteristics and behavior. Authored and reviewed by world-class academic and industrial specialists in each subject field Practical tools such as integrated case studies, user-defined process schemata, and multimedia modeling and functionality Maximizes research efficiency by collating the most important and established information in one place with integrated applets linking to relevant outside sources
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 276
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Author: David Christopher Gilmer
Publisher:
ISBN:
Category :
Languages : en
Pages : 314
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Author: Xinye Liu
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 436
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