Author: Pailu Dennis Wang
Publisher:
ISBN:
Category :
Languages : en
Pages : 312

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Author: E. Kasper
Publisher: CRC Press
ISBN: 1351093525
Category : Technology & Engineering
Languages : en
Pages : 411

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Book Description
This subject is divided into two volumes. Volume I is on homoepitaxy with the necessary systems, techniques, and models for growth and dopant incorporation. Three chapters on homoepitaxy are followed by two chapters describing the different ways in which MBE may be applied to create insulator/Si stackings which may be used for three-dimensional circuits. The two remaining chapters in Volume I are devoted to device applications. The first three chapters of Volume II treat all aspects of heteroepitaxy with the exception of the epitaxial insulator/Si structures already treated in volume I.

Author: University of Minnesota
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 272

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Author:
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 774

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Author:
Publisher:
ISBN:
Category : Dissertation abstracts
Languages : en
Pages : 800

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Author:
Publisher:
ISBN:
Category : Electrical engineering
Languages : en
Pages : 1860

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Author:
Publisher:
ISBN:
Category : Dissertations, Academic
Languages : en
Pages : 1252

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Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 1572

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Author: Peter M. Martin
Publisher: William Andrew
ISBN: 0815520328
Category : Technology & Engineering
Languages : en
Pages : 932

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Book Description
This 3e, edited by Peter M. Martin, PNNL 2005 Inventor of the Year, is an extensive update of the many improvements in deposition technologies, mechanisms, and applications. This long-awaited revision includes updated and new chapters on atomic layer deposition, cathodic arc deposition, sculpted thin films, polymer thin films and emerging technologies. Extensive material was added throughout the book, especially in the areas concerned with plasma-assisted vapor deposition processes and metallurgical coating applications.

Author:
Publisher:
ISBN:
Category : Chemistry
Languages : en
Pages : 2692

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