Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 0
Book Description
LLNL Large-area Inductively Coupled Plasma (ICP) Source: Experiments
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 0
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 0
Book Description
最新粉粒体プロセス技術集成
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages :
Book Description
Experiments and Modeling with a Large-area Inductively Coupled Plasma (ICP) Source
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages : 10
Book Description
We describe initial experiments with a large (30 in.) plasma source chamber to explore the problems associated with large-area Inductively coupled plasma (ICP) sources to produce high density plasmas useful for processing 400 mm semiconductor wafers. Our experiments typically use a 25 in. diameter planar ICP coil driven at 13.56 MHz. Plasma and system data are taken in Ar and N2 over the pressure range 3--50 mtorr. R.F. Inductive power was run up to 2000W, but typically data were taken over the range 100--1000W. Diagnostics Include optical emission spectroscopy, Langmuir probes, and B-dot probes as well as electrical circuit measurements. The B-dot and E-M measurements are compared with models based on commercial E-M codes. Initial indications are that uniform plasmas suitable for 400 mm processing are attainable. We present a comparison between computer modeling and experimental results for this source. Computer simulations using the fluid code INDUCT94 are used to explain variations In the plasma density profile measurements as a function of Inductive power, gas pressure and gas composition. Both Argon and Nitrogen discharges are modeled. INDUCT94 solves the 2D time-dependent fluid equations for electrons, ions and neutrals Including effects of both Inductive and capacitive coupling. Detailed volume and surface chemistry reactions are treated. We discuss the effects of pressure and power on plasma uniformity.
Publisher:
ISBN:
Category :
Languages : en
Pages : 10
Book Description
We describe initial experiments with a large (30 in.) plasma source chamber to explore the problems associated with large-area Inductively coupled plasma (ICP) sources to produce high density plasmas useful for processing 400 mm semiconductor wafers. Our experiments typically use a 25 in. diameter planar ICP coil driven at 13.56 MHz. Plasma and system data are taken in Ar and N2 over the pressure range 3--50 mtorr. R.F. Inductive power was run up to 2000W, but typically data were taken over the range 100--1000W. Diagnostics Include optical emission spectroscopy, Langmuir probes, and B-dot probes as well as electrical circuit measurements. The B-dot and E-M measurements are compared with models based on commercial E-M codes. Initial indications are that uniform plasmas suitable for 400 mm processing are attainable. We present a comparison between computer modeling and experimental results for this source. Computer simulations using the fluid code INDUCT94 are used to explain variations In the plasma density profile measurements as a function of Inductive power, gas pressure and gas composition. Both Argon and Nitrogen discharges are modeled. INDUCT94 solves the 2D time-dependent fluid equations for electrons, ions and neutrals Including effects of both Inductive and capacitive coupling. Detailed volume and surface chemistry reactions are treated. We discuss the effects of pressure and power on plasma uniformity.
Energy Research Abstracts
Author:
Publisher:
ISBN:
Category : Power resources
Languages : en
Pages : 486
Book Description
Publisher:
ISBN:
Category : Power resources
Languages : en
Pages : 486
Book Description
Government Reports Announcements & Index
Author:
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 796
Book Description
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 796
Book Description
Experimental Investigations on Scalability of Inductively Coupled-plasma Sources and an Improved Model for Characterization of ICP Sources
Author: Lakshmi Jyothi Pratti
Publisher:
ISBN:
Category : Inductively coupled plasma spectrometry
Languages : en
Pages : 302
Book Description
Publisher:
ISBN:
Category : Inductively coupled plasma spectrometry
Languages : en
Pages : 302
Book Description
A Traveling Wave Driven, Inductively Coupled Large Area Plasma Source /Rcby Yaoxi Wu and Michael A. Lieberman
Author: Yaoxi Wu
Publisher:
ISBN:
Category :
Languages : en
Pages : 12
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 12
Book Description
Scientific and Technical Aerospace Reports
Author:
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ISBN:
Category : Aeronautics
Languages : en
Pages : 994
Book Description
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 994
Book Description
Handbook of Radioactivity Analysis
Author: Michael F. L'Annunziata
Publisher: Academic Press
ISBN: 0123848733
Category : Medical
Languages : en
Pages : 1420
Book Description
Authoritative reference providing the principles, practical techniques, and procedures for the accurate measurement of radioactivity.
Publisher: Academic Press
ISBN: 0123848733
Category : Medical
Languages : en
Pages : 1420
Book Description
Authoritative reference providing the principles, practical techniques, and procedures for the accurate measurement of radioactivity.
Laboratory Directed Research and Development
Author: Lawrence Livermore National Laboratory
Publisher:
ISBN:
Category : Research
Languages : en
Pages : 252
Book Description
Publisher:
ISBN:
Category : Research
Languages : en
Pages : 252
Book Description