Lithography Process Control PDF Download
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Author: Harry J. Levinson
Publisher: SPIE Press
ISBN: 9780819430526
Category : Photography
Languages : en
Pages : 210
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Book Description
This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.
Author: Harry J. Levinson
Publisher: SPIE Press
ISBN: 9780819430526
Category : Photography
Languages : en
Pages : 210
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Book Description
This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process control as background for advanced topics such as complex processes and feedback. In addition, it presents control methodologies that may be applied to process development pilot lines.
Author: James Moyne
Publisher: CRC Press
ISBN: 1420040669
Category : Technology & Engineering
Languages : en
Pages : 367
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Book Description
Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.
Author:
Publisher:
ISBN:
Category : Measurement
Languages : en
Pages : 964
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Book Description
Author: Gary S. May
Publisher: John Wiley & Sons
ISBN: 0471790273
Category : Technology & Engineering
Languages : en
Pages : 428
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Book Description
A practical guide to semiconductor manufacturing from processcontrol to yield modeling and experimental design Fundamentals of Semiconductor Manufacturing and Process Controlcovers all issues involved in manufacturing microelectronic devicesand circuits, including fabrication sequences, process control,experimental design, process modeling, yield modeling, and CIM/CAMsystems. Readers are introduced to both the theory and practice ofall basic manufacturing concepts. Following an overview of manufacturing and technology, the textexplores process monitoring methods, including those that focus onproduct wafers and those that focus on the equipment used toproduce wafers. Next, the text sets forth some fundamentals ofstatistics and yield modeling, which set the foundation for adetailed discussion of how statistical process control is used toanalyze quality and improve yields. The discussion of statistical experimental design offers readers apowerful approach for systematically varying controllable processconditions and determining their impact on output parameters thatmeasure quality. The authors introduce process modeling concepts,including several advanced process control topics such asrun-by-run, supervisory control, and process and equipmentdiagnosis. Critical coverage includes the following: * Combines process control and semiconductor manufacturing * Unique treatment of system and software technology and managementof overall manufacturing systems * Chapters include case studies, sample problems, and suggestedexercises * Instructor support includes electronic copies of the figures andan instructor's manual Graduate-level students and industrial practitioners will benefitfrom the detailed exami?nation of how electronic materials andsupplies are converted into finished integrated circuits andelectronic products in a high-volume manufacturingenvironment. An Instructor's Manual presenting detailed solutions to all theproblems in the book is available from the Wiley editorialdepartment. An Instructor Support FTP site is also available.
Author: Michael L. Miller
Publisher: SPIE-International Society for Optical Engineering
ISBN:
Category : Computers
Languages : en
Pages : 392
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Book Description
The FAO/WHO Consultation on Health Implications of Acrylamide in Food has undertaken a preliminary evaluation of new and existing data and research on acrylamide. The consultation provided a range of recommendations for further information and new studies to better understand the risk to human health posed by acrylamide in food. The consultation also provided some advice to minimize whatever risk exists, including avoiding excessive cooking of food, choosing healthy eating, investigating possibilities for reducing levels of acrylamide in food and establishing an international network on acrylamide in food.
Author:
Publisher:
ISBN:
Category : Integrated circuits
Languages : en
Pages : 770
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Book Description
Author: Harry J. Levinson
Publisher:
ISBN: 9781510639393
Category :
Languages : en
Pages : 245
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Book Description
Author: William S. Levine
Publisher: CRC Press
ISBN: 1420073672
Category : Technology & Engineering
Languages : en
Pages : 3379
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Book Description
At publication, The Control Handbook immediately became the definitive resource that engineers working with modern control systems required. Among its many accolades, that first edition was cited by the AAP as the Best Engineering Handbook of 1996. Now, 15 years later, William Levine has once again compiled the most comprehensive and authoritative resource on control engineering. He has fully reorganized the text to reflect the technical advances achieved since the last edition and has expanded its contents to include the multidisciplinary perspective that is making control engineering a critical component in so many fields. Now expanded from one to three volumes, The Control Handbook, Second Edition brilliantly organizes cutting-edge contributions from more than 200 leading experts representing every corner of the globe. They cover everything from basic closed-loop systems to multi-agent adaptive systems and from the control of electric motors to the control of complex networks. Progressively organized, the three volume set includes: Control System Fundamentals Control System Applications Control System Advanced Methods Any practicing engineer, student, or researcher working in fields as diverse as electronics, aeronautics, or biomedicine will find this handbook to be a time-saving resource filled with invaluable formulas, models, methods, and innovative thinking. In fact, any physicist, biologist, mathematician, or researcher in any number of fields developing or improving products and systems will find the answers and ideas they need. As with the first edition, the new edition not only stands as a record of accomplishment in control engineering but provides researchers with the means to make further advances.
Author: Yayi Wei
Publisher: SPIE Press
ISBN: 0819475572
Category : Art
Languages : en
Pages : 338
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Book Description
This book is a comprehensive guide to advanced processes and materials used in 193-nm immersion lithography (193i). It is an important text for those new to the field as well as for current practitioners who want to broaden their understanding of this latest technology. The book can be used as course material for graduate students of electrical engineering, material sciences, physics, chemistry, and microelectronics engineering and can also be used to train engineers involved in the manufacture of integrated circuits. It provides techniques for selecting critical materials (topcoats, photoresists, and antireflective coatings) and optimizing immersion processes to ensure higher performance and lower defectivity at lower cost. This book also includes sections on shrinking, trimming, and smoothing of the resist pattern to reduce feature sizes and line-edge roughness. Finally, it describes the recent development of 193i in combination with double exposure and double patterning.
Author: Chris Mack
Publisher: John Wiley & Sons
ISBN: 1119965071
Category : Technology & Engineering
Languages : en
Pages : 503
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Book Description
The fabrication of an integrated circuit requires a variety of physical and chemical processes to be performed on a semiconductor substrate. In general, these processes fall into three categories: film deposition, patterning, and semiconductor doping. Films of both conductors and insulators are used to connect and isolate transistors and their components. By creating structures of these various components millions of transistors can be built and wired together to form the complex circuitry of modern microelectronic devices. Fundamental to all of these processes is lithography, ie, the formation of three-dimensional relief images on the substrate for subsequent transfer of the pattern to the substrate. This book presents a complete theoretical and practical treatment of the topic of lithography for both students and researchers. It comprises ten detailed chapters plus three appendices with problems provided at the end of each chapter. Additional Information: Visiting http://www.lithoguru.com/textbook/index.html enhances the reader's understanding as the website supplies information on how you can download a free laboratory manual, Optical Lithography Modelling with MATLAB®, to accompany the textbook. You can also contact the author and find help for instructors.
