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Languages : fr
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Languages : fr
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Category : Surface chemistry
Languages : fr
Pages : 754
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Author: Aimé Richardt
Publisher:
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Category :
Languages : fr
Pages : 255
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Author: Aimé Richardt
Publisher:
ISBN: 9782840460381
Category :
Languages : fr
Pages : 423
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Author: Société française du vide
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Category :
Languages : en
Pages : 1357
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Author: R. Caudano
Publisher: Springer Science & Business Media
ISBN: 1468440586
Category : Science
Languages : en
Pages : 570
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Book Description
This volume contains most of the invited and contributed papers presented at the second international conference devoted to the general topic "Vibrations at Surfaces" and which took place from 10 to 12 September 1980 at the Facu1tes Notre-Dame de 1a Paix in Namur, Belgium. The conference was organized to review the large amount of information gathered in this field over the late seventies as a result of th~ rapid improvements and dissemination of surface spectroscopic technique such a electron energy loss, infrared and Raman surface spectroscopies. Much time was devoted to Raman spectroscopy of adsorbed mo1e 'cu1es. After several years of vivid debate over the causes of the observed large enhancement of Raman cross section, a clearer pic ture emerges from the papers presented here: the actual value of the enhancement factor does depend in a complicated manner on long range surface roughness, atomic-scale roughness and the dielectric properties of the substrate as well as on the electronic structure of the molecule in its adsorbed state. Less controversial are the results obtained with electron energy loss spectroscopy (EELS) and several sessions of the con ference were devoted to the approach. As witnessed by the growing number of laboratories using the technique, EELS is now a mature spectroscopic tool for the characterization and analysis of the chemisorption bond.
Author: Michel A. VanHove
Publisher: Springer Science & Business Media
ISBN: 3642827217
Category : Science
Languages : en
Pages : 617
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Book Description
Surface crystallography plays the same fundamental role in surface science which bulk crystallography has played so successfully in solid-state physics and chemistry. The atomic-scale structure is one of the most important aspects in the understanding of the behavior of surfaces in such widely diverse fields as heterogeneous catalysis, microelectronics, adhesion, lubrication, cor rosion, coatings, and solid-solid and solid-liquid interfaces. Low-Energy Electron Diffraction or LEED has become the prime tech nique used to determine atomic locations at surfaces. On one hand, LEED has yielded the most numerous and complete structural results to date (almost 200 structures), while on the other, LEED has been regarded as the "technique to beat" by a variety of other surface crystallographic methods, such as photoemission, SEXAFS, ion scattering and atomic diffraction. Although these other approaches have had impressive successes, LEED has remained the most productive technique and has shown the most versatility of application: from adsorbed rare gases, to reconstructed surfaces of sem iconductors and metals, to molecules adsorbed on metals. However, these statements should not be viewed as excessively dogmatic since all surface sensitive techniques retain untapped potentials that will undoubtedly be explored and exploited. Moreover, surface science remains a multi-technique endeavor. In particular, LEED never has been and never will be self sufficient. LEED has evolved considerably and, in fact, has reached a watershed.
Author: A.G. Cullis
Publisher: CRC Press
ISBN: 1000157016
Category : Science
Languages : en
Pages : 836
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Book Description
The various forms of microscopy and related microanalytical techniques are making unique contributions to semiconductor research and development that underpin many important areas of microelectronics technology. Microscopy of Semiconducting Materials 1987 highlights the progress that is being made in semiconductor microscopy, primarily in electron probe methods as well as in light optical and ion scattering techniques. The book covers the state of the art, with sections on high resolution microscopy, epitaxial layers, quantum wells and superlattices, bulk gallium arsenide and other compounds, properties of dislocations, device silicon and dielectric structures, silicides and contacts, device testing, x-ray techniques, microanalysis, and advanced scanning microscopy techniques. Contributed by numerous international experts, this volume will be an indispensable guide to recent developments in semiconductor microscopy for all those who work in the field of semiconducting materials and research development.
Author: A. Berman
Publisher: Academic Press
ISBN: 1483273792
Category : Science
Languages : en
Pages : 413
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Book Description
Total Pressure Measurements in Vacuum Technology focuses on the measurement of low total pressure in hostile environments or in the presence of magnetic fields. This book emphasizes the general processes and problems involved in measurement techniques and physical principles on which vacuum gauges operate, rather than on the detailed description of the gauges. The design and techniques involved in the use of special instruments that determine "pressure or gas density, such as pressure converters or radioactive gauges, are also described. This publication is mainly intended for graduate students and research scientists who have a good general background in physics and engineering.
Author: B.D. Sartwell
Publisher: Elsevier
ISBN: 0444601104
Category : Technology & Engineering
Languages : en
Pages : 1129
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Book Description
Metallurgical Coatings and Thin Films 1990 presents the Proceedings of the 17th International Conference on Metallurgical Coatings and 8th International Conference on Thin Films, held in San Diego, California on April 2-6, 1990. It contains 219 papers covering a wide range of topics related to metallurgical coatings and thin films, including high temperature coatings, hard coatings, diamond films, tribology, and ion beam modification. Organized into 99 chapters, this volume begins with a discussion of a thermochemical model for diamond growth from the vapor phase and an experiment in large area diamond coating using a combustion flame torch in its traversing mode. It then explores the properties of diamond films, preparation of diamond-like carbon films using various ion-beam-assisted techniques, deposition of diamond-like films by laser ablation, and coating of cubic BN films on different substrates. The book examines surface processes and rate-determining steps in plasma-induced chemical vapor deposition, and addition of rare earths to improve scale adherence on heat-resisting alloys and coatings. The reader is introduced to high temperature wear and clearance control coatings, thermal barrier coatings, and corrosion resistant coatings. The book also discusses modification of coatings/surfaces to reduce friction; the mechanics of the tribology of thin films systems; mechanochemical interactions in the tribological behavior of materials; analysis and micromechanical testing of tribological coatings; surface modification using directed ion beams; and industrial equipment and processes. This book is a valuable resource for students and researchers interested in metallurgical coatings and thin films.
