Laser Induced Chemical Vapor Deposition of Hydrogenated Amorphous Silicon PDF Download
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Author: R. Bilenchi
Publisher:
ISBN:
Category :
Languages : en
Pages : 7
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Book Description
Author: R. Bilenchi
Publisher:
ISBN:
Category :
Languages : en
Pages : 7
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Book Description
Author: M. Meunier
Publisher:
ISBN:
Category : Amorphous semiconductors
Languages : en
Pages : 4
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Book Description
Author: William Richard Imler
Publisher:
ISBN:
Category :
Languages : en
Pages : 192
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Book Description
Author: Joseph Zahavi
Publisher:
ISBN:
Category :
Languages : en
Pages : 60
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Book Description
This report results from a contract tasking Technion as follows: Investigate the characteristics of thin silicon nitride films deposited on substrates via the use of chemical laser deposition techniques. This report summarized the research activities during the first year of work as was planned in the proposal. It completes the information which was given in the previous two progress reports. Basically, the aim of the first year was to study the possibility of deposition of silicon nitride thin films from silane and ammonia at low temperatures. The investigation was carried out by studying the effect of substrate temperature on deposition rate and film quality. In addition, the photochemical reaction was studied by analyzing the composition of gas molecules prior and during laser irradiation. At the end of the first year it was also possible to start doing experiments for deposition of silicon carbide from silane and acetylene.
Author: Tongsan Xiao
Publisher:
ISBN:
Category : Laser-plasma interactions
Languages : en
Pages : 94
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Book Description
Author: Pio Capezzuto
Publisher: Elsevier
ISBN: 0080539106
Category : Science
Languages : en
Pages : 339
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Book Description
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. - Focuses on the plasma chemistry of amorphous silicon-based materials - Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced - Features an international group of contributors - Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Author: Amir Mikhail
Publisher:
ISBN:
Category : Silicon nitride
Languages : en
Pages : 20
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Book Description
Various chemical vapor deposition (CVD) techniques performed by research groups under contract to SERI in the area of chemical vapor deposition of hydrogenated amorphous silicon by using higher order silanes are discussed in this report. The static CVD system was found to produce films with nonuniform stoichiometry. All flow systems were capable of depositing films that produced a short-circuit current density of 10mA/cm2. Results of measurements performed at SERI and at the Naval Research Laboratory led to basic reactor modifications and increased emphasis on substrate diffusion barrier research.
Author: Daniel J. Ehrlich
Publisher: Elsevier
ISBN: 0080918026
Category : Technology & Engineering
Languages : en
Pages : 602
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Book Description
This book reviews the solid core of fundamental scientific knowledge on laser-stimulated surface chemistry that has accumulated over the past few years. It provides a useful overview for the student and interested non-expert as well as essential reference data (photodissociation cross sections, thermochemical constants, etc.) for the active researcher.
Author:
Publisher:
ISBN:
Category : Photovoltaic power generation
Languages : en
Pages : 180
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Book Description
Author: Dieter Bäuerle
Publisher: Springer Science & Business Media
ISBN: 3662032538
Category : Science
Languages : en
Pages : 649
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Book Description
Laser Processing and Chemistry gives an overview of the fundamentals and applications of laser--matter interactions, in particular with regard to laser material processing. Special attention is given to laser-induced physical and chemical processes at gas--solid, liquid--solid, and solid--solid interfaces. Starting with the background physics, the book proceeds to examine applications of laser techniques in micro-machining, and the patterning, coating, and modification of material surfaces. Students, engineers, and manufacturers alike will find this book an invaluable reference work for the state of the art in laser processing.
