Laser Induced Chemical Vapor Deposition in Synthesis of Ge-Se Thin Films PDF Download
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Author: Tongsan Xiao
Publisher:
ISBN:
Category : Laser-plasma interactions
Languages : en
Pages : 94
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Author: Tongsan Xiao
Publisher:
ISBN:
Category : Laser-plasma interactions
Languages : en
Pages : 94
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Author: Joseph Zahavi
Publisher:
ISBN:
Category :
Languages : en
Pages : 60
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Book Description
This report results from a contract tasking Technion as follows: Investigate the characteristics of thin silicon nitride films deposited on substrates via the use of chemical laser deposition techniques. This report summarized the research activities during the first year of work as was planned in the proposal. It completes the information which was given in the previous two progress reports. Basically, the aim of the first year was to study the possibility of deposition of silicon nitride thin films from silane and ammonia at low temperatures. The investigation was carried out by studying the effect of substrate temperature on deposition rate and film quality. In addition, the photochemical reaction was studied by analyzing the composition of gas molecules prior and during laser irradiation. At the end of the first year it was also possible to start doing experiments for deposition of silicon carbide from silane and acetylene.
Author: James Frederick Osmundsen
Publisher:
ISBN:
Category :
Languages : en
Pages : 146
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Author: H. A. Atwater
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 472
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Book Description
With over 16 countries represented, this book represents international developments in the field of film synthesis and growth using energetic beams. It focuses on pulsed-laser deposition. Fundamental issues pertaining to the generation of laser ablation plumes, temperature distributions and collisional effects are described. Ion-assisted pulsed-laser deposition, pulsed-ion deposition, applications of hyperthermal beams and aspects of surface dynamics are discussed. The inclusion of an ion beam with the ablation process leads to some unique modifications in the thin-film growth mechanisms, and hence, film properties. Likewise, the collision of high-mass metal cluster ions with substrates shows promise for growth of novel structures. Also featured are new developments of optoelectronic materials, nitrides and carbon films using a variety of techniques. The effects of beam-induced defects on growth and surface morphology, chemical effects during growth, and characterization of film growth and film properties are addressed.
Author: I.W. Boyd
Publisher: Elsevier
ISBN: 0444596801
Category : Technology & Engineering
Languages : en
Pages : 552
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The contributions in this volume reflect not only the growing understanding of the underlying mechanisms controlling the various reactions in laser surface processing, but also the potential of several developing applications of direct processing. The most notable trend in the field currently is the technique of laser ablation, which is reported in almost a quarter of the papers in this volume. Whilst by no means a new phenomenon, attention has until recent years remained in the area of lithography and UV-sensitive materials. The growth in interest lies in the use of the technique to grow multi-component thin films and multi-layers. A number of papers on the topic of process diagnostics and in-situ measurements are also included. The theme of these annual meetings is centred around the physical and chemical modification of thin films and surfaces induced by the action of photon, ion, neutral, or electron beams in a variety of environments. Consequently these proceedings provide a comprehensive and unified presentation of the latest developments in this field.
Author:
Publisher:
ISBN:
Category :
Languages : en
Pages :
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Author: C. E. Moroșanu
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 724
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Author: May Nyman
Publisher:
ISBN:
Category : Metallic films
Languages : en
Pages : 354
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Author: Mark Donald Allendorf
Publisher: The Electrochemical Society
ISBN: 9781566772174
Category : Science
Languages : en
Pages : 506
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![Selective Area Chemical Vapor Deposition of Epitaxial Si[subscript 1-x]Ge[subscript X] Thin Films by the Alternating Cyclic Method PDF](https://books.google.com/books/content/images/frontcover/rD7rNwAACAAJ?fife=w80-h100)
Author: Ravindra Govind Soman
Publisher:
ISBN:
Category : Chemical vapor deposition
Languages : en
Pages : 304
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