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Author: National Aeronautics and Space Administration (NASA)
Publisher: Createspace Independent Publishing Platform
ISBN: 9781722334758
Category :
Languages : en
Pages : 32
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Book Description
The preliminary design proposed for the microelectronics materials processing equipment is presented. An overall mission profile, description of all processing steps, analysis methods and measurement techniques, data acquisition and storage, and a preview of the experimental hardware are included. The goal of the project is to investigate the viability of material processing of semiconductor microelectronics materials in a micro-gravity environment. The two key processes are examined: (1) Rapid Thermal Annealing (RTA) of semiconductor thin films and damaged solar cells, and (2) thin film deposition using a filament evaporator. The RTA process will be used to obtain higher quality crystalline properties from amorphous/poly-silicon films. RTA methods can also be used to repair radiation-damaged solar cells. On earth this technique is commonly used to anneal semiconductor films after ion-implantation. The damage to the crystal lattice is similar to the defects found in solar cells which have been exposed to high-energy particle bombardment. Cole, Eric E. Unspecified Center NAG5-1294...
Author: National Aeronautics and Space Administration (NASA)
Publisher: Createspace Independent Publishing Platform
ISBN: 9781722334758
Category :
Languages : en
Pages : 32
Get Book Here
Book Description
The preliminary design proposed for the microelectronics materials processing equipment is presented. An overall mission profile, description of all processing steps, analysis methods and measurement techniques, data acquisition and storage, and a preview of the experimental hardware are included. The goal of the project is to investigate the viability of material processing of semiconductor microelectronics materials in a micro-gravity environment. The two key processes are examined: (1) Rapid Thermal Annealing (RTA) of semiconductor thin films and damaged solar cells, and (2) thin film deposition using a filament evaporator. The RTA process will be used to obtain higher quality crystalline properties from amorphous/poly-silicon films. RTA methods can also be used to repair radiation-damaged solar cells. On earth this technique is commonly used to anneal semiconductor films after ion-implantation. The damage to the crystal lattice is similar to the defects found in solar cells which have been exposed to high-energy particle bombardment. Cole, Eric E. Unspecified Center NAG5-1294...
Author: Fuccio Cristiano
Publisher: Woodhead Publishing
ISBN: 0128202564
Category : Technology & Engineering
Languages : en
Pages : 428
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Book Description
Laser Annealing Processes in Semiconductor Technology: Theory, Modeling and Applications in Nanoelectronics synthesizes the scientific and technological advances of laser annealing processes for current and emerging nanotechnologies. The book provides an overview of the laser-matter interactions of materials and recent advances in modeling of laser-related phenomena, with the bulk of the book focusing on current and emerging (beyond-CMOS) applications. Reviewed applications include laser annealing of CMOS, group IV semiconductors, superconducting materials, photonic materials, 2D materials. This comprehensive book is ideal for post-graduate students, new entrants, and experienced researchers in academia, research and development in materials science, physics and engineering. - Introduces the fundamentals of laser materials and device fabrication methods, including laser-matter interactions and laser-related phenomena - Addresses advances in physical modeling and in predictive simulations of laser annealing processes such as atomistic modeling and TCAD simulations - Reviews current and emerging applications of laser annealing processes such as CMOS technology and group IV semiconductors
Author: Abu Shahid Jahangir Amin
Publisher:
ISBN:
Category :
Languages : en
Pages : 298
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Book Description
Author: J Poate
Publisher: Elsevier
ISBN: 0323145426
Category : Technology & Engineering
Languages : en
Pages : 577
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Book Description
Laser Annealing of Semiconductors deals with the materials science of surfaces that have been subjected to ultrafast heating by intense laser or electron beams. This book is organized into 13 chapters that specifically tackle transient annealing of compound semiconductors. After briefly dealing with an overview of laser annealing, this book goes on discussing the concepts of solidification and crystallization pertinent to the field. These topics are followed by discussions on the main mechanisms of interaction of photon and electron beams with condensed matter; the calculation of thermophysical properties of crystalline materials; and high-speed crystal growth by laser annealing of ion-implanted silicon. The subsequent chapters describe the microstructural and topographical properties of annealed semiconductor layers and the epitaxy of ion-implanted silicon irradiated with a laser or electron beam single pulse. This text also explores the electronic and surface properties and the continuous-wave beam processing of semiconductors. The concluding chapters cover various reactions in metal-semiconductor systems, such as fast and laser-induced melting, solidification, mixing, and quenching. Laser-induced interactions in metal-semiconductor systems and the factors involved in control of the heat treatment process are also discussed in these chapters. Materials scientists and researchers and device engineers will find this book invaluable.
Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 1460
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Book Description
Lists citations with abstracts for aerospace related reports obtained from world wide sources and announces documents that have recently been entered into the NASA Scientific and Technical Information Database.
Author: C. Suryanarayana
Publisher: Elsevier
ISBN: 0080537626
Category : Technology & Engineering
Languages : en
Pages : 459
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Book Description
The rapid technological developments during the later half of the 20th century have demanded materials that are stronger, capable of use at much higher temperatures, more corrosion-resistant, and much less expensive than those currently used. These demands become even more significant on the threshold of the new century and the millennium. Significant improvements in properties can only be achieved by processing the materials under far-from-equilibrium (or non-equilibrium) conditions. Several new processing technologies have been developed during the past few decades including, rapid solidification, spray forming, mechanical alloying, ion mixing, vapor deposition, laser processing and plasma processing. Remarkable advances have been made in recent years in the science and technology of these processes used to synthesize, characterize, and apply these materials processed under non-equilibrium conditions. Some of these techniques have evolved from laboratory curiosity to commercial-scale manufacturing in just a few years. In other cases, industrial necessity prompted development of the technology, and the science followed later. The chapters in this book have been written by people who are world-recognized experts in their respective fields. Each chapter describes the principles, processing techniques, special features of the materials produced, and their applications. An extensive list of references is provided at the end of each chapter that will facilitate location of additional information on specific aspects of any technique.
Author: Norbert H. Nickel
Publisher: Academic Press
ISBN: 0080540945
Category : Technology & Engineering
Languages : en
Pages : 215
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Book Description
This book on the Laser Crystallization of Silicon reviews the latest experimental and theoretical studies in the field. It has been written by recognised global authorities and covers the most recent phenomena related to the laser crystallization process and the properties of the resulting polycrystalline silicon. Reflecting the truly interdisciplinary nature of the field that the series covers, this volume will continue to be of great interest to physicists, chemists, materials scientists and device engineers in modern industry. - Valuable applications for industry, particularly in the fabrication of thin-film electronics - Each chapter has been peer reviewed - An important and timely contribution to the semiconductor literature
Author: Mehmet C. Öztürk
Publisher: The Electrochemical Society
ISBN: 9781566774062
Category : Technology & Engineering
Languages : en
Pages : 444
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Book Description
Author: Yue Kuo
Publisher: Springer Science & Business Media
ISBN: 9781402075063
Category : Thin film transistors
Languages : en
Pages : 528
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Book Description
This is the first reference on amorphous silicon and polycrystalline silicon thin film transistors that gives a systematic global review of all major topics in the field. These volumes include sections on basic materials and substrates properties, fundamental device physics, critical fabrication processes (structures, a-Si: H, dielectric, metallization, catalytic CVD), and existing and new applications. The chapters are written by leading researchers who have extensive experience with reputed track records. Thin Film Transistors provides practical information on preparing individual functional a-Si: H TFTs and poly-Si TFTs as well as large-area TFT arrays. Also covered are basic theories on the a-Si: H TFT operations and unique material characteristics. Readers are also exposed to a wide range of existing and new applications in industries.
Author: Marcello Andreeta
Publisher: BoD – Books on Demand
ISBN: 9535107577
Category : Science
Languages : en
Pages : 582
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Book Description
Crystallization is one of the most ancient and interdisciplinary topics of research known to mankind. Crystals can be organic or inorganic and may be produced from melts, liquid solutions, vapors or even in solid state. Notwithstanding its inherently high complexity, the crystallization process is part of our everyday lives, from ice making in our homes to the most state-of-the-art chemical and electronic industry. In this book, our purpose was to present new insights to the reader, as well as crucial and very useful information for researchers working in this field, while simultaneously creating a comprehensive text about crystallization processes which may serve as a starting point for people with different backgrounds.
