Ion Implantation Technology - 94

Ion Implantation Technology - 94 PDF Author: S. Coffa
Publisher: Newnes
ISBN: 044459972X
Category : Science
Languages : en
Pages : 1031

Get Book Here

Book Description
The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters.The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.

Ion Implantation Technology - 94

Ion Implantation Technology - 94 PDF Author: S. Coffa
Publisher: Newnes
ISBN: 044459972X
Category : Science
Languages : en
Pages : 1031

Get Book Here

Book Description
The aim of these proceedings is to present and stimulate discussion on the many subjects related to ion implantation among a broad mix of specialists from areas as diverse as materials science, device production and advanced ion implanters.The contents open with a paper on the future developments of the microelectronics industry in Europe within the framework of the global competition. The subsequent invited and oral presentations cover in detail the following areas: trends in processing and devices, ion-solid interaction, materials science issues, advanced implanter systms, process control and yield, future trends and applications.

Scientific and Technical Aerospace Reports

Scientific and Technical Aerospace Reports PDF Author:
Publisher:
ISBN:
Category : Aeronautics
Languages : en
Pages : 704

Get Book Here

Book Description


Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon

Intrinsic Point Defects, Impurities, and Their Diffusion in Silicon PDF Author: Peter Pichler
Publisher: Springer Science & Business Media
ISBN: 3709105978
Category : Technology & Engineering
Languages : en
Pages : 576

Get Book Here

Book Description
This book contains the first comprehensive review of intrinsic point defects, impurities and their complexes in silicon. Besides compiling the structures, energetic properties, identified electrical levels and spectroscopic signatures, and the diffusion behaviour from investigations, it gives a comprehensive introduction into the relevant fundamental concepts.

The Basics of Ion Implantation

The Basics of Ion Implantation PDF Author: Michael I. Current
Publisher:
ISBN:
Category : Ion implantation
Languages : en
Pages : 260

Get Book Here

Book Description


NASA Tech Briefs

NASA Tech Briefs PDF Author:
Publisher:
ISBN:
Category : Technology
Languages : en
Pages : 152

Get Book Here

Book Description


Index to ... NASA Tech Briefs

Index to ... NASA Tech Briefs PDF Author:
Publisher:
ISBN:
Category : NASA tech briefs
Languages : en
Pages : 160

Get Book Here

Book Description


Properties of Crystalline Silicon

Properties of Crystalline Silicon PDF Author: Robert Hull
Publisher: IET
ISBN: 9780852969335
Category : Science
Languages : en
Pages : 1054

Get Book Here

Book Description
A unique and well-organized reference, this book provides illuminating data, distinctive insight and expert guidance on silicon properties.

Nuclear Instruments & Methods in Physics Research

Nuclear Instruments & Methods in Physics Research PDF Author:
Publisher:
ISBN:
Category : Nuclear physics
Languages : en
Pages : 940

Get Book Here

Book Description


Surface Modification and Mechanisms

Surface Modification and Mechanisms PDF Author: George E. Totten
Publisher: CRC Press
ISBN: 9780203021545
Category : Science
Languages : en
Pages : 776

Get Book Here

Book Description
Navigating through an extensive compilation of surface modification reactions and processes for specific tribological results, this reference compiles detailed studies, many not found in other texts, on various residual stresses, reaction processes and mechanisms, heat treatment methods, plasma-based techniques, laser impingement, nanometer scale surface modification, and more. Surface Modification and Mechanisms: Friction, Stress, and Reaction Engineering offers guidelines for the consideration and design of wear and frictional performance and provides a unique understanding of surface structural changes that occur during various engineering procedures.

Ion Implantation Techniques

Ion Implantation Techniques PDF Author: H. Ryssel
Publisher: Springer Science & Business Media
ISBN: 3642687792
Category : Science
Languages : en
Pages : 377

Get Book Here

Book Description
In recent years, ion implantation has developed into the major doping technique for integrated circuits. Several series of conferences have dealt with the application of ion implantation to semiconductors and other materials (Thousand Oaks 1970, Garmisch-Partenkirchen 1971, Osaka 1974, Warwick 1975, Boulder 1976, Budapest 1978, and Albany 1980). Another series of conferences was devoted more to implantation equipment and tech niques (Salford 1977, Trento 1978, and Kingston 1980). In connection with the Third International Conference on Ion Implantation: Equipment and Tech niques, held at Queen's University, ' Kingston, Ontario, Canada, July 8-11, 1980, a two-day instructional program was organized parallel to an implan tation conference for the first time. This implantation school concentra ted on aspects of implantation-equipment design. This book contains all lectures presented at the International Ion Implantation School organized in connection with the Fourth International Conference on Ion Implantation: Equipment and Techniques, held at the Convention Center, Berchtesgaden, Germany, September 13-17, 1982. In con trast to the first .school, the main emphasis in thiS school was placed on practical aspects of implanter operation and application. In three chap ters, various machine aspects of ion implantation (general concepts, ion sources, safety, calibration, dOSimetry), range distributions (stopping power, range profiles), and measuring techniques (electrical and nonelec tri ca 1 measu ri ng techni ques, annea 1 i ng) are di scussed. In the appendi x, a review of the state of the art in modern implantation equipment is given.