Author: Parmod Kumar
Publisher: Springer Nature
ISBN: 303093862X
Category : Science
Languages : en
Pages : 68
Book Description
This book provides an overview of the applications of ion beam techniques in oxide materials. Oxide materials exhibit defect-induced physical properties relevant to applications in sensing, optoelectronics and spintronics. Defects in these oxide materials also lead to magnetism in non-magnetic materials or to a change of magnetic ordering in magnetic materials. Thus, an understanding of defects is of immense importance. To date, ion beam tools are considered the most effective techniques for producing controlled defects in these oxides. This book will detail the ion beam tools utilized for creating defects in oxides.
Ion Beam Induced Defects and Their Effects in Oxide Materials
Author: Parmod Kumar
Publisher: Springer Nature
ISBN: 303093862X
Category : Science
Languages : en
Pages : 68
Book Description
This book provides an overview of the applications of ion beam techniques in oxide materials. Oxide materials exhibit defect-induced physical properties relevant to applications in sensing, optoelectronics and spintronics. Defects in these oxide materials also lead to magnetism in non-magnetic materials or to a change of magnetic ordering in magnetic materials. Thus, an understanding of defects is of immense importance. To date, ion beam tools are considered the most effective techniques for producing controlled defects in these oxides. This book will detail the ion beam tools utilized for creating defects in oxides.
Publisher: Springer Nature
ISBN: 303093862X
Category : Science
Languages : en
Pages : 68
Book Description
This book provides an overview of the applications of ion beam techniques in oxide materials. Oxide materials exhibit defect-induced physical properties relevant to applications in sensing, optoelectronics and spintronics. Defects in these oxide materials also lead to magnetism in non-magnetic materials or to a change of magnetic ordering in magnetic materials. Thus, an understanding of defects is of immense importance. To date, ion beam tools are considered the most effective techniques for producing controlled defects in these oxides. This book will detail the ion beam tools utilized for creating defects in oxides.
Ion Beam Modification of Materials
Author: J.S. Williams
Publisher: Newnes
ISBN: 0444599746
Category : Science
Languages : en
Pages : 1157
Book Description
This conference consisted of 15 oral sessions, including three plenary papers covering areas of general interest, 22 specialist invited papers and 51 contributed presentations as well as three poster sessions. There were several scientific highlights covering a diverse spectrum of materials and ion beam processing methods. These included a wide range of conventional and novel applications such as: optical displays and opto-electronics, motor vehicle and tooling parts, coatings tailored for desired properties, studies of fundamental defect properties, the production of novel (often buried) compounds, and treating biomedical materials. The study of nanocrystals produced by ion implantation in a range of host matrices, particularly for opto-electronics applications, was one especially new and exciting development. Despite several decades of study, major progress was reported at the conference in understanding defect evolution in semiconductors and the role of defects in transient impurity diffusion. The use of implantation to tune or isolate optical devices and in forming optically active centres and waveguides in semiconductors, polymers and oxide ceramics was a major focus of several presentations at the conference. The formation of hard coatings by ion assisted deposition or direct implantation was also an area which showed much recent progress. Ion beam techniques had also developed apace, particularly those based on plasma immersion ion implantation or alternative techniques for large area surface treatment. Finally, the use of ion beams for the direct treatment of cancerous tissue was a particularly novel and interesting application of ion beams.
Publisher: Newnes
ISBN: 0444599746
Category : Science
Languages : en
Pages : 1157
Book Description
This conference consisted of 15 oral sessions, including three plenary papers covering areas of general interest, 22 specialist invited papers and 51 contributed presentations as well as three poster sessions. There were several scientific highlights covering a diverse spectrum of materials and ion beam processing methods. These included a wide range of conventional and novel applications such as: optical displays and opto-electronics, motor vehicle and tooling parts, coatings tailored for desired properties, studies of fundamental defect properties, the production of novel (often buried) compounds, and treating biomedical materials. The study of nanocrystals produced by ion implantation in a range of host matrices, particularly for opto-electronics applications, was one especially new and exciting development. Despite several decades of study, major progress was reported at the conference in understanding defect evolution in semiconductors and the role of defects in transient impurity diffusion. The use of implantation to tune or isolate optical devices and in forming optically active centres and waveguides in semiconductors, polymers and oxide ceramics was a major focus of several presentations at the conference. The formation of hard coatings by ion assisted deposition or direct implantation was also an area which showed much recent progress. Ion beam techniques had also developed apace, particularly those based on plasma immersion ion implantation or alternative techniques for large area surface treatment. Finally, the use of ion beams for the direct treatment of cancerous tissue was a particularly novel and interesting application of ion beams.
Metal Oxide Defects
Author: Vijay Kumar
Publisher: Elsevier
ISBN: 0323903592
Category : Technology & Engineering
Languages : en
Pages : 758
Book Description
Metal Oxide Defects: Fundamentals, Design, Development and Applications provides a broad perspective on the development of advanced experimental techniques to study defects and their chemical activity and catalytic reactivity in various metal oxides. This book highlights advances in characterization and analytical techniques to achieve better understanding of a wide range of defects, most importantly, state-of-the-art methodologies for controlling defects. The book provides readers with pathways to apply basic principles and interpret the behavior of metal oxides. After reviewing characterization and analytical techniques, the book focuses on the relationship of defects to the properties and performance of metal oxides. Finally, there is a review of the methods to control defects and the applications of defect engineering for the design of metal oxides for applications in optoelectronics, energy, sensing, and more. This book is a key reference for materials scientists and engineers, chemists, and physicists. - Reviews advances in characterization and analytical techniques to understand the behavior of defects in metal oxide materials - Introduces defect engineering applied to the design of metal oxide materials with desirable properties - Discusses applications of defect engineering to enhance the performance of materials for a wide range of applications, with an emphasis on optoelectronics
Publisher: Elsevier
ISBN: 0323903592
Category : Technology & Engineering
Languages : en
Pages : 758
Book Description
Metal Oxide Defects: Fundamentals, Design, Development and Applications provides a broad perspective on the development of advanced experimental techniques to study defects and their chemical activity and catalytic reactivity in various metal oxides. This book highlights advances in characterization and analytical techniques to achieve better understanding of a wide range of defects, most importantly, state-of-the-art methodologies for controlling defects. The book provides readers with pathways to apply basic principles and interpret the behavior of metal oxides. After reviewing characterization and analytical techniques, the book focuses on the relationship of defects to the properties and performance of metal oxides. Finally, there is a review of the methods to control defects and the applications of defect engineering for the design of metal oxides for applications in optoelectronics, energy, sensing, and more. This book is a key reference for materials scientists and engineers, chemists, and physicists. - Reviews advances in characterization and analytical techniques to understand the behavior of defects in metal oxide materials - Introduces defect engineering applied to the design of metal oxide materials with desirable properties - Discusses applications of defect engineering to enhance the performance of materials for a wide range of applications, with an emphasis on optoelectronics
Defect-Induced Magnetism in Oxide Semiconductors
Author: Parmod Kumar
Publisher: Elsevier
ISBN: 0323909086
Category : Technology & Engineering
Languages : en
Pages : 738
Book Description
Defect-Induced Magnetism in Oxide Semiconductors provides an overview of the latest advances in defect engineering to create new magnetic materials and enable new technological applications. First, the book introduces the mechanisms, behavior, and theory of magnetism in oxide semiconductors and reviews the methods of inducing magnetism in these materials. Then, strategies such as pulsed laser deposition and RF sputtering to grow oxide nanostructured materials with induced magnetism are discussed. This is followed by a review of the most relevant postdeposition methods to induce magnetism in oxide semiconductors including annealing, ion irradiation, and ion implantation. Examples of defect-induced magnetism in oxide semiconductors are provided along with selected applications. This book is a suitable reference for academic researchers and practitioners and for people engaged in research and development in the disciplines of materials science and engineering. - Reviews the magnetic, electrical, dielectric and optical properties of oxide semiconductors with defect-induced magnetism - Discusses growth and post-deposition strategies to grow oxide nanostructured materials such as oxide thin films with defect-induced magnetism - Provides examples of materials with defect-induced magnetism such as zinc oxide, cerium dioxide, hafnium dioxide, and more
Publisher: Elsevier
ISBN: 0323909086
Category : Technology & Engineering
Languages : en
Pages : 738
Book Description
Defect-Induced Magnetism in Oxide Semiconductors provides an overview of the latest advances in defect engineering to create new magnetic materials and enable new technological applications. First, the book introduces the mechanisms, behavior, and theory of magnetism in oxide semiconductors and reviews the methods of inducing magnetism in these materials. Then, strategies such as pulsed laser deposition and RF sputtering to grow oxide nanostructured materials with induced magnetism are discussed. This is followed by a review of the most relevant postdeposition methods to induce magnetism in oxide semiconductors including annealing, ion irradiation, and ion implantation. Examples of defect-induced magnetism in oxide semiconductors are provided along with selected applications. This book is a suitable reference for academic researchers and practitioners and for people engaged in research and development in the disciplines of materials science and engineering. - Reviews the magnetic, electrical, dielectric and optical properties of oxide semiconductors with defect-induced magnetism - Discusses growth and post-deposition strategies to grow oxide nanostructured materials such as oxide thin films with defect-induced magnetism - Provides examples of materials with defect-induced magnetism such as zinc oxide, cerium dioxide, hafnium dioxide, and more
Calcium-Based Materials
Author: S.S. Nanda
Publisher: CRC Press
ISBN: 1040021298
Category : Technology & Engineering
Languages : en
Pages : 221
Book Description
Calcium-based natural minerals are important for a wide range of applications. Though these materials are available in nature, researchers are working toward developing them in the laboratory. Calcium-Based Materials: Processing, Characterization, and Applications introduces the possibility of designing these materials for particular applications. Introduces a variety of calcium-based materials and discusses synthesis, growth, and stability Provides in-depth coverage of calcium carbonate Discusses applications of calcium-based minerals in different fields Includes details on synchrotron X-ray tools for case minerals This comprehensive text is aimed at researchers in materials science, engineering, and bioengineering.
Publisher: CRC Press
ISBN: 1040021298
Category : Technology & Engineering
Languages : en
Pages : 221
Book Description
Calcium-based natural minerals are important for a wide range of applications. Though these materials are available in nature, researchers are working toward developing them in the laboratory. Calcium-Based Materials: Processing, Characterization, and Applications introduces the possibility of designing these materials for particular applications. Introduces a variety of calcium-based materials and discusses synthesis, growth, and stability Provides in-depth coverage of calcium carbonate Discusses applications of calcium-based minerals in different fields Includes details on synchrotron X-ray tools for case minerals This comprehensive text is aimed at researchers in materials science, engineering, and bioengineering.
Nuclear Science Abstracts
Author:
Publisher:
ISBN:
Category : Nuclear energy
Languages : en
Pages : 764
Book Description
Publisher:
ISBN:
Category : Nuclear energy
Languages : en
Pages : 764
Book Description
An Introduction to Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) and its Application to Materials Science
Author: Sarah Fearn
Publisher: Morgan & Claypool Publishers
ISBN: 1681740885
Category : Technology & Engineering
Languages : en
Pages : 67
Book Description
This book highlights the application of Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) for high-resolution surface analysis and characterization of materials. While providing a brief overview of the principles of SIMS, it also provides examples of how dual-beam ToF-SIMS is used to investigate a range of materials systems and properties. Over the years, SIMS instrumentation has dramatically changed since the earliest secondary ion mass spectrometers were first developed. Instruments were once dedicated to either the depth profiling of materials using high-ion-beam currents to analyse near surface to bulk regions of materials (dynamic SIMS), or time-of-flight instruments that produced complex mass spectra of the very outer-most surface of samples, using very low-beam currents (static SIMS). Now, with the development of dual-beam instruments these two very distinct fields now overlap.
Publisher: Morgan & Claypool Publishers
ISBN: 1681740885
Category : Technology & Engineering
Languages : en
Pages : 67
Book Description
This book highlights the application of Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS) for high-resolution surface analysis and characterization of materials. While providing a brief overview of the principles of SIMS, it also provides examples of how dual-beam ToF-SIMS is used to investigate a range of materials systems and properties. Over the years, SIMS instrumentation has dramatically changed since the earliest secondary ion mass spectrometers were first developed. Instruments were once dedicated to either the depth profiling of materials using high-ion-beam currents to analyse near surface to bulk regions of materials (dynamic SIMS), or time-of-flight instruments that produced complex mass spectra of the very outer-most surface of samples, using very low-beam currents (static SIMS). Now, with the development of dual-beam instruments these two very distinct fields now overlap.
ULSI Science and Technology/1997
Author: Hisham Z. Massoud
Publisher: The Electrochemical Society
ISBN: 9781566771306
Category : Computers
Languages : en
Pages : 686
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566771306
Category : Computers
Languages : en
Pages : 686
Book Description
Radiation Synthesis of Materials and Compounds
Author: Boris Ildusovich Kharisov
Publisher: CRC Press
ISBN: 1466505230
Category : Science
Languages : en
Pages : 581
Book Description
Researchers and engineers working in nuclear laboratories, nuclear electric plants, and elsewhere in the radiochemical industries need a comprehensive handbook describing all possible radiation-chemistry interactions between irradiation and materials, the preparation of materials under distinct radiation types, the possibility of damage of material
Publisher: CRC Press
ISBN: 1466505230
Category : Science
Languages : en
Pages : 581
Book Description
Researchers and engineers working in nuclear laboratories, nuclear electric plants, and elsewhere in the radiochemical industries need a comprehensive handbook describing all possible radiation-chemistry interactions between irradiation and materials, the preparation of materials under distinct radiation types, the possibility of damage of material
Beam Effects, Surface Topography, and Depth Profiling in Surface Analysis
Author: Alvin W. Czanderna
Publisher: Springer Science & Business Media
ISBN: 0306469146
Category : Technology & Engineering
Languages : en
Pages : 447
Book Description
Many books are available that detail the basic principles of the different methods of surface characterization. On the other hand, the scientific literature provides a resource of how individual pieces of research are conducted by particular labo- tories. Between these two extremes the literature is thin but it is here that the present volume comfortably sits. Both the newcomer and the more mature scientist will find in these chapters a wealth of detail as well as advice and general guidance of the principal phenomena relevant to the study of real samples. In the analysis of samples, practical analysts have fairly simple models of how everything works. Superimposed on this ideal world is an understanding of how the parameters of the measurement method, the instrumentation, and the char- teristics of the sample distort this ideal world into something less precise, less controlled, and less understood. The guidance given in these chapters allows the scientist to understand how to obtain the most precise and understood measu- ments that are currently possible and, where there are inevitable problems, to have clear guidance as the extent of the problem and its likely behavior.
Publisher: Springer Science & Business Media
ISBN: 0306469146
Category : Technology & Engineering
Languages : en
Pages : 447
Book Description
Many books are available that detail the basic principles of the different methods of surface characterization. On the other hand, the scientific literature provides a resource of how individual pieces of research are conducted by particular labo- tories. Between these two extremes the literature is thin but it is here that the present volume comfortably sits. Both the newcomer and the more mature scientist will find in these chapters a wealth of detail as well as advice and general guidance of the principal phenomena relevant to the study of real samples. In the analysis of samples, practical analysts have fairly simple models of how everything works. Superimposed on this ideal world is an understanding of how the parameters of the measurement method, the instrumentation, and the char- teristics of the sample distort this ideal world into something less precise, less controlled, and less understood. The guidance given in these chapters allows the scientist to understand how to obtain the most precise and understood measu- ments that are currently possible and, where there are inevitable problems, to have clear guidance as the extent of the problem and its likely behavior.