Author: Harry Albert Atwater
Publisher:
ISBN:
Category :
Languages : en
Pages : 224
Book Description
Ion Beam Enhanced Grain Growth in Thin Films
Author: Harry Albert Atwater
Publisher:
ISBN:
Category :
Languages : en
Pages : 224
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 224
Book Description
Ion Beam Enhanced Grain Growth in Thin Films
Author: Harry Albert Atwater
Publisher:
ISBN:
Category :
Languages : en
Pages : 224
Book Description
Publisher:
ISBN:
Category :
Languages : en
Pages : 224
Book Description
Grain Growth in Nanocrystalline Metal Thin Films Under In Situ Ion-Beam Irradiation
Author: A. T. Motta
Publisher:
ISBN:
Category : Grain growth
Languages : en
Pages : 13
Book Description
In-situ observations in a transmission electron microscope (TEM) were used to study the microstructure evolution in metal Zr, Pt, Cu, and Au nanocrystalline thin films under ion-beam irradiation. Free-standing films were prepared by sputter deposition. Samples were irradiated in-situ at the Intermediate Voltage Electron Microscope (IVEM) at Argonne National Laboratory with Ar and Kr ions to fluences in excess of 1016 ion/cm2. As a result of irradiation, grain growth was observed in all samples using Bright Field (BF) imaging in the TEM. The average grain size increased monotonically with ion fluence until it reached a saturation value. Similarly to thermal grain growth, the ion-irradiation induced grain growth curves could be best fitted with curves of the type: Dn-;D0n=K?. The irradiations were done at temperatures ranging from 20 to 773 K. The results suggest the existence of three regimes with respect to irradiating temperature: (i) a purely thermal regime, which appears to start above the bulk coarse-grained recrystallization temperature, (ii) a thermally assisted regime where thermal diffusion and irradiation effects combine to increase the rate of grain growth relative to that resulting from either of these mechanisms alone, and (iii) an athermal regime (low-temperature regime) where irradiation can by itself cause grain growth. The transition temperature between the athermal regime and the thermally assisted regime depends on the material, but is in the range 0.14-0.22 times the melting point. The influence of the ion type was also investigated on Zr-Fe irradiated with 600 keV Kr ions versus 600 keV Ar ions.
Publisher:
ISBN:
Category : Grain growth
Languages : en
Pages : 13
Book Description
In-situ observations in a transmission electron microscope (TEM) were used to study the microstructure evolution in metal Zr, Pt, Cu, and Au nanocrystalline thin films under ion-beam irradiation. Free-standing films were prepared by sputter deposition. Samples were irradiated in-situ at the Intermediate Voltage Electron Microscope (IVEM) at Argonne National Laboratory with Ar and Kr ions to fluences in excess of 1016 ion/cm2. As a result of irradiation, grain growth was observed in all samples using Bright Field (BF) imaging in the TEM. The average grain size increased monotonically with ion fluence until it reached a saturation value. Similarly to thermal grain growth, the ion-irradiation induced grain growth curves could be best fitted with curves of the type: Dn-;D0n=K?. The irradiations were done at temperatures ranging from 20 to 773 K. The results suggest the existence of three regimes with respect to irradiating temperature: (i) a purely thermal regime, which appears to start above the bulk coarse-grained recrystallization temperature, (ii) a thermally assisted regime where thermal diffusion and irradiation effects combine to increase the rate of grain growth relative to that resulting from either of these mechanisms alone, and (iii) an athermal regime (low-temperature regime) where irradiation can by itself cause grain growth. The transition temperature between the athermal regime and the thermally assisted regime depends on the material, but is in the range 0.14-0.22 times the melting point. The influence of the ion type was also investigated on Zr-Fe irradiated with 600 keV Kr ions versus 600 keV Ar ions.
Beam-Solid Interactions and Transient Processes: Volume 74
Author: Michael O. Thompson
Publisher: Mrs Proceedings
ISBN:
Category : Science
Languages : en
Pages : 784
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher: Mrs Proceedings
ISBN:
Category : Science
Languages : en
Pages : 784
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Low Energy Ion Assisted Film Growth
Author: Agustin Gonzalez-elipe
Publisher: World Scientific
ISBN: 1783261048
Category : Science
Languages : en
Pages : 299
Book Description
This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low energy ion beams with materials. The main procedures used for IAD synthesis of thin films and the main effects of ion beam bombardment on growing films, such as densification, stress, mixing, surface flattening and changes in texture are critically discussed. A description of some of the applications of IAD methods and a review of the synthesis by IAD of diamond-like carbon and cubic-boron nitride complete the book.
Publisher: World Scientific
ISBN: 1783261048
Category : Science
Languages : en
Pages : 299
Book Description
This book is an introductory manual for Ion Assisted Deposition (IAD) procedures of thin films. It is addressed to researchers, post-graduates and even engineers with little or no experience in the techniques of thin film deposition. It reviews the basic concepts related to the interaction of low energy ion beams with materials. The main procedures used for IAD synthesis of thin films and the main effects of ion beam bombardment on growing films, such as densification, stress, mixing, surface flattening and changes in texture are critically discussed. A description of some of the applications of IAD methods and a review of the synthesis by IAD of diamond-like carbon and cubic-boron nitride complete the book.
Government Reports Announcements & Index
Author:
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 1132
Book Description
Publisher:
ISBN:
Category : Science
Languages : en
Pages : 1132
Book Description
RLE Progress Report
Author: Massachusetts Institute of Technology. Research Laboratory of Electronics
Publisher:
ISBN:
Category : Electronics
Languages : en
Pages : 454
Book Description
Publisher:
ISBN:
Category : Electronics
Languages : en
Pages : 454
Book Description
Ion-Solid Interactions
Author: Michael Nastasi
Publisher: Cambridge University Press
ISBN: 052137376X
Category : Science
Languages : en
Pages : 572
Book Description
Comprehensive guide to an important materials science technique for students and researchers.
Publisher: Cambridge University Press
ISBN: 052137376X
Category : Science
Languages : en
Pages : 572
Book Description
Comprehensive guide to an important materials science technique for students and researchers.
Vistas in Nanofabrication
Author: Faiz Rahman
Publisher: CRC Press
ISBN: 9814364568
Category : Technology & Engineering
Languages : en
Pages : 274
Book Description
This book provides several examples of how diverse nanofabrication techniques are being used by researchers across the world to fabricate useful materials and devices. A number of research groups present their cutting-edge work on fabricating a variety of nanoscale structures such as split rings, wires, gaps, trenches, and holes. The innovative techniques described in this book will be of interest to all who are engaged in research and development of nanofabrication technologies. The book mainly covers application areas in electronics and photonics but the techniques are general enough to be applied to other areas.
Publisher: CRC Press
ISBN: 9814364568
Category : Technology & Engineering
Languages : en
Pages : 274
Book Description
This book provides several examples of how diverse nanofabrication techniques are being used by researchers across the world to fabricate useful materials and devices. A number of research groups present their cutting-edge work on fabricating a variety of nanoscale structures such as split rings, wires, gaps, trenches, and holes. The innovative techniques described in this book will be of interest to all who are engaged in research and development of nanofabrication technologies. The book mainly covers application areas in electronics and photonics but the techniques are general enough to be applied to other areas.
Artificially Induced Grain Alignment in Thin Films: Volume 1150
Author: Vladimir Matias
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 216
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.
Publisher:
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 216
Book Description
The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.