Introduction to Focused Ion Beam Nanometrology PDF Download
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Author: David C. Cox
Publisher: Morgan & Claypool Publishers
ISBN: 1681741482
Category : Technology & Engineering
Languages : en
Pages : 119
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Book Description
This book describes modern focused ion beam microscopes and techniques and how they can be used to aid materials metrology and as tools for the fabrication of devices that in turn are used in many other aspects of fundamental metrology. Beginning with a description of the currently available instruments including the new addition to the field of plasma-based sources, it then gives an overview of ion solid interactions and how the different types of instrument can be applied. Chapters then describe how these machines can be applied to the field of materials science and device fabrication giving examples of recent and current activity in both these areas.
Author: David C. Cox
Publisher: Morgan & Claypool Publishers
ISBN: 1681741482
Category : Technology & Engineering
Languages : en
Pages : 119
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Book Description
This book describes modern focused ion beam microscopes and techniques and how they can be used to aid materials metrology and as tools for the fabrication of devices that in turn are used in many other aspects of fundamental metrology. Beginning with a description of the currently available instruments including the new addition to the field of plasma-based sources, it then gives an overview of ion solid interactions and how the different types of instrument can be applied. Chapters then describe how these machines can be applied to the field of materials science and device fabrication giving examples of recent and current activity in both these areas.
Author: D Cox
Publisher: Myprint
ISBN: 9781681747934
Category :
Languages : en
Pages : 84
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Book Description
Author: Richard Leach
Publisher: Elsevier
ISBN: 1455777501
Category : Science
Languages : en
Pages : 384
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Book Description
Working at the nano-scale demands an understanding of the high-precision measurement techniques that make nanotechnology and advanced manufacturing possible. Richard Leach introduces these techniques to a broad audience of engineers and scientists involved in nanotechnology and manufacturing applications and research. He also provides a routemap and toolkit for metrologists engaging with the rigor of measurement and data analysis at the nano-scale. Starting from the fundamentals of precision measurement, the author progresses into different measurement and characterization techniques. The focus on nanometrology in engineering contexts makes this book an essential guide for the emerging nanomanufacturing / nanofabrication sector, where measurement and standardization requirements are paramount both in product specification and quality assurance. This book provides engineers and scientists with the methods and understanding needed to design and produce high-performance, long-lived products while ensuring that compliance and public health requirements are met. Updated to cover new and emerging technologies, and recent developments in standards and regulatory frameworks, this second edition includes many new sections, e.g. new technologies in scanning probe and e-beam microscopy, recent developments in interferometry and advances in co-ordinate metrology. - Demystifies nanometrology for a wide audience of engineers, scientists, and students involved in nanotech and advanced manufacturing applications and research - Introduces metrologists to the specific techniques and equipment involved in measuring at the nano-scale or to nano-scale uncertainty - Fully updated to cover the latest technological developments, standards, and regulations
Author: Yongqi Fu
Publisher: Bentham Science Publishers
ISBN: 1608050505
Category : Science
Languages : en
Pages : 214
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Book Description
"From the beginning of this century, there has been a dramatic increase in interest in the study of surface plasmon polaritons-based metallic subwavelength structures and learning. This is a refreshing concise book on issues and considerations in designing"
Author: Vlad Stolojan
Publisher: Morgan & Claypool Publishers
ISBN: 1681741202
Category : Technology & Engineering
Languages : en
Pages : 69
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Book Description
The Transmission Electron Microscope (TEM) is the ultimate tool to see and measure structures on the nanoscale and to probe their elemental composition and electronic structure with sub-nanometer spatial resolution. Recent technological breakthroughs have revolutionized our understanding of materials via use of the TEM, and it promises to become a significant tool in understanding biological and biomolecular systems such as viruses and DNA molecules. This book is a practical guide for scientists who need to use the TEM as a tool to answer questions about physical and chemical phenomena on the nanoscale.
Author:
Publisher: Elsevier
ISBN: 0081003587
Category : Science
Languages : en
Pages : 636
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Book Description
As the requirements of the semiconductor industry have become more demanding in terms of resolution and speed it has been necessary to push photoresist materials far beyond the capabilities previously envisioned. Currently there is significant worldwide research effort in to so called Next Generation Lithography techniques such as EUV lithography and multibeam electron beam lithography. These developments in both the industrial and the academic lithography arenas have led to the proliferation of numerous novel approaches to resist chemistry and ingenious extensions of traditional photopolymers. Currently most texts in this area focus on either lithography with perhaps one or two chapters on resists, or on traditional resist materials with relatively little consideration of new approaches. This book therefore aims to bring together the worlds foremost resist development scientists from the various community to produce in one place a definitive description of the many approaches to lithography fabrication. - Assembles up-to-date information from the world's premier resist chemists and technique development lithographers on the properties and capabilities of the wide range of resist materials currently under investigation - Includes information on processing and metrology techniques - Brings together multiple approaches to litho pattern recording from academia and industry in one place
Author: David J. Whitehouse
Publisher: CRC Press
ISBN: 1420034197
Category : Science
Languages : en
Pages : 982
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Book Description
The Handbook of Surface and Nanometrology explains and challenges current concepts in nanotechnology. It covers in great detail surface metrology and nanometrology and more importantly the areas where they overlap, thereby providing a quantitative means of controlling and predicting processes and performance. Trends and mechanisms are explained wit
Author: Ray Egerton
Publisher: Springer Science & Business Media
ISBN: 9780387258003
Category : Technology & Engineering
Languages : en
Pages : 224
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Book Description
Scanning and stationary-beam electron microscopes are indispensable tools for both research and routine evaluation in materials science, the semiconductor industry, nanotechnology and the biological, forensic, and medical sciences. This book introduces current theory and practice of electron microscopy, primarily for undergraduates who need to understand how the principles of physics apply in an area of technology that has contributed greatly to our understanding of life processes and "inner space." Physical Principles of Electron Microscopy will appeal to technologists who use electron microscopes and to graduate students, university teachers and researchers who need a concise reference on the basic principles of microscopy.
Author: Christophe Gorecki
Publisher: SPIE-International Society for Optical Engineering
ISBN:
Category : Technology & Engineering
Languages : en
Pages : 316
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Book Description
Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.
Author: Rajiv Kohli
Publisher: William Andrew
ISBN: 1437778836
Category : House & Home
Languages : en
Pages : 361
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Book Description
The contributions in this volume cover methods for removal of particle contaminants on surfaces. Several of these methods are well established and have been employed in industrial applications for a long time. However, the ever- higher demand for removal of smaller particles on newer substrate materials is driving continuous development of the established cleaning methods and alternative innovative methods for particle removal. This book provides information on the latest developments in this topic area. The purpose of the Developments in Surface Contamination and Cleaning series is to provide a state-of-the-art guide to the current knowledge of the behaviour of film-type and particulate surface contaminants, and cleaning methods. Each title has a particular topical focus, covering the key techniques and recent developments in the area. Taken as a whole, the series forms a unique reference for professionals and academics working in the area of surface contamination and cleaning. A strong theme running through the series is that of surface contamination and cleaning at the micro and nano scales. Covers the latest techniques in areas such as removal of nanoparticles, especially important in the semiconductor industry, disk drives and microelectronics. The series as a whole represents the definitive reference on Surface Contamination and Cleaning An essential reference for industries where cleaning is critical: electronics, optics, pharmaceutical manufacturing, etc.
