Improving the electrical properties of in situ doped silicon films grown by remote plasma-enhanced chemical vapor deposition PDF Download
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Author: Pablo Munguia
Publisher:
ISBN:
Category :
Languages : en
Pages : 240
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Author: Pablo Munguia
Publisher:
ISBN:
Category :
Languages : en
Pages : 240
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Author: Joel Thornton Irby
Publisher:
ISBN:
Category : Silicon
Languages : en
Pages : 118
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Author: Rajan Sharma
Publisher:
ISBN:
Category :
Languages : en
Pages : 166
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Author: Sunil Thomas
Publisher:
ISBN:
Category : Plasma-enhanced chemical vapor deposition
Languages : en
Pages : 158
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Author: Wade H. Shafer
Publisher: Springer Science & Business Media
ISBN: 1461519691
Category : Science
Languages : en
Pages : 426
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Book Description
Masters Theses in the Pure and Applied Sciences was first conceived, published, and disseminated by the Center for Information and Numerical Data Analysis and Synthesis (CINDAS)* at Purdue University in 1957, starting its coverage of theses with the academic year 1955. Beginning with Volume 13, the printing and dis semination phases of the activity were transferred to University Microfilms/Xerox of Ann Arbor, Michigan, with the thought that such an arrangement would be more beneficial to the academic and general scientific and technical community. After five years of this joint undertaking we had concluded that it was in the interest of all concerned if the printing and distribution of the volumes were handled by an international publishing house to assure improved service and broader dissemination. Hence, starting with Volume 18, Masters Theses in the Pure and Applied Sciences has been disseminated on a worldwide basis by Plenum Publishing Corporation of New York, and in the same year the coverage was broadened to include Canadian universities. All back issues can also be ordered from Plenum. We have reported in Volume 38 (thesis year 1993) a total of 13,787 thesis titles from 22 Canadian and 164 United States universities. We are sure that this broader base for these titles reported will greatly enhance the value of this impor tant annual reference work. While Volume 38 reports theses submitted in 1993, on occasion, certain uni versities do report theses submitted in previous years but not reported at the time.
Author: Pio Capezzuto
Publisher: Elsevier
ISBN: 0080539106
Category : Science
Languages : en
Pages : 339
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Book Description
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Focuses on the plasma chemistry of amorphous silicon-based materials Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced Features an international group of contributors Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
Author: James Hartfiel Comfort
Publisher:
ISBN:
Category :
Languages : en
Pages : 352
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Author:
Publisher:
ISBN:
Category : Ceramics
Languages : en
Pages : 250
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![Crystallographic and electrical characterization of epitaxial GE[subscript x]Si[subscript 1-x]/Si and in-situ doped films grown by remote plasma chemical vapor deposition PDF](https://books.google.com/books/content/images/frontcover/MpbKpwAACAAJ?fife=w80-h100)
Author: Rong-Zhen Qian
Publisher:
ISBN:
Category : Plasma-enhanced chemical vapor deposition
Languages : en
Pages : 396
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Author:
Publisher:
ISBN:
Category : Electrical engineering
Languages : en
Pages : 2240
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