Author:
Publisher:
ISBN:
Category : Computer integrated manufacturing systems
Languages : en
Pages : 164
Book Description
IEEE/SEMI International Semiconductor Manufacturing Science Symposium
Author:
Publisher:
ISBN:
Category : Computer integrated manufacturing systems
Languages : en
Pages : 164
Book Description
Publisher:
ISBN:
Category : Computer integrated manufacturing systems
Languages : en
Pages : 164
Book Description
IEEE/SEMI International Semiconductor Manufacturing Science Symposium
Author: IEEE/SEMI International Semiconductor Manufacturing Science Symposium
Publisher:
ISBN:
Category : Computer integrated manufacturing systems
Languages : en
Pages : 168
Book Description
Publisher:
ISBN:
Category : Computer integrated manufacturing systems
Languages : en
Pages : 168
Book Description
IEEE/SEMI International Semiconductor Manufacturing Science Symposium
Author:
Publisher: Institute of Electrical & Electronics Engineers(IEEE)
ISBN: 9780780306806
Category : Computer integrated manufacturing systems
Languages : en
Pages : 146
Book Description
Publisher: Institute of Electrical & Electronics Engineers(IEEE)
ISBN: 9780780306806
Category : Computer integrated manufacturing systems
Languages : en
Pages : 146
Book Description
IEEE/SEMI International Semiconductor Manufacturing Science Symposium
Author:
Publisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 170
Book Description
Publisher:
ISBN:
Category : Semiconductors
Languages : en
Pages : 170
Book Description
Proceedings of the Symposium Om Process Control, Diagnostics, and Modeling in Semiconductor Manufacturing
Author: M. Meyyappan
Publisher: The Electrochemical Society
ISBN: 9781566770965
Category : Technology & Engineering
Languages : en
Pages : 644
Book Description
Publisher: The Electrochemical Society
ISBN: 9781566770965
Category : Technology & Engineering
Languages : en
Pages : 644
Book Description
Microelectronics Manufacturing Diagnostics Handbook
Author: Abraham Landzberg
Publisher: Springer Science & Business Media
ISBN: 1461520290
Category : Technology & Engineering
Languages : en
Pages : 663
Book Description
The world of microelectronics is filled with cusses measurement systems, manufacturing many success stories. From the use of semi control techniques, test, diagnostics, and fail ure analysis. It discusses methods for modeling conductors for powerful desktop computers to their use in maintaining optimum engine per and reducing defects, and for preventing de formance in modem automobiles, they have fects in the first place. The approach described, clearly improved our daily lives. The broad while geared to the microelectronics world, has useability of the technology is enabled, how applicability to any manufacturing process of similar complexity. The authors comprise some ever, only by the progress made in reducing their cost and improving their reliability. De of the best scientific minds in the world, and fect reduction receives a significant focus in our are practitioners of the art. The information modem manufacturing world, and high-quality captured here is world class. I know you will diagnostics is the key step in that process. find the material to be an excellent reference in of product failures enables step func Analysis your application. tion improvements in yield and reliability. which works to reduce cost and open up new Dr. Paul R. Low applications and technologies. IBM Vice President and This book describes the process ofdefect re of Technology Products General Manager duction in the microelectronics world.
Publisher: Springer Science & Business Media
ISBN: 1461520290
Category : Technology & Engineering
Languages : en
Pages : 663
Book Description
The world of microelectronics is filled with cusses measurement systems, manufacturing many success stories. From the use of semi control techniques, test, diagnostics, and fail ure analysis. It discusses methods for modeling conductors for powerful desktop computers to their use in maintaining optimum engine per and reducing defects, and for preventing de formance in modem automobiles, they have fects in the first place. The approach described, clearly improved our daily lives. The broad while geared to the microelectronics world, has useability of the technology is enabled, how applicability to any manufacturing process of similar complexity. The authors comprise some ever, only by the progress made in reducing their cost and improving their reliability. De of the best scientific minds in the world, and fect reduction receives a significant focus in our are practitioners of the art. The information modem manufacturing world, and high-quality captured here is world class. I know you will diagnostics is the key step in that process. find the material to be an excellent reference in of product failures enables step func Analysis your application. tion improvements in yield and reliability. which works to reduce cost and open up new Dr. Paul R. Low applications and technologies. IBM Vice President and This book describes the process ofdefect re of Technology Products General Manager duction in the microelectronics world.
Contemporary Theory and Pragmatic Approaches in Fuzzy Computing Utilization
Author: Chen, Toly
Publisher: IGI Global
ISBN: 146661871X
Category : Computers
Languages : en
Pages : 328
Book Description
"This book presents the most innovative systematic and practical facets of fuzzy computing technologies to students, scholars, and academicians, as well as practitioners, engineers, and professionals"--
Publisher: IGI Global
ISBN: 146661871X
Category : Computers
Languages : en
Pages : 328
Book Description
"This book presents the most innovative systematic and practical facets of fuzzy computing technologies to students, scholars, and academicians, as well as practitioners, engineers, and professionals"--
Integrated Circuit Fabrication
Author: James D. Plummer
Publisher: Cambridge University Press
ISBN: 1009303570
Category : Technology & Engineering
Languages : en
Pages : 680
Book Description
Master fundamental technologies for modern semiconductor integrated circuits with this definitive textbook, for students from a range of STEM backgrounds, with a focus on big-picture thinking and industry-grade simulation. Includes over 450 full-color figures and over 280 homework problems, with solutions and lecture slides for instructors.
Publisher: Cambridge University Press
ISBN: 1009303570
Category : Technology & Engineering
Languages : en
Pages : 680
Book Description
Master fundamental technologies for modern semiconductor integrated circuits with this definitive textbook, for students from a range of STEM backgrounds, with a focus on big-picture thinking and industry-grade simulation. Includes over 450 full-color figures and over 280 homework problems, with solutions and lecture slides for instructors.
New Serial Titles
Author:
Publisher:
ISBN:
Category : Periodicals
Languages : en
Pages : 1608
Book Description
A union list of serials commencing publication after Dec. 31, 1949.
Publisher:
ISBN:
Category : Periodicals
Languages : en
Pages : 1608
Book Description
A union list of serials commencing publication after Dec. 31, 1949.
Run-to-Run Control in Semiconductor Manufacturing
Author: James Moyne
Publisher: CRC Press
ISBN: 1420040669
Category : Technology & Engineering
Languages : en
Pages : 367
Book Description
Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.
Publisher: CRC Press
ISBN: 1420040669
Category : Technology & Engineering
Languages : en
Pages : 367
Book Description
Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.