Deposition of Device Quality, Low Hydrogen Content, Hydrogenated Amorphous Silicon at High Deposition Rates with Increased Stability Using the Hot Wire Filament Technique PDF Download

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Deposition of Device Quality, Low Hydrogen Content, Hydrogenated Amorphous Silicon at High Deposition Rates with Increased Stability Using the Hot Wire Filament Technique

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Languages : en
Pages : 0

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Author:
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Category :
Languages : en
Pages : 0

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Ultrafast Dynamics of Photoexcited Carriers in HWCVD A-Si PDF

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Languages : en
Pages : 2

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We present femtosecond studies of photoexcited carrier dynamics in hydrogenated amorphous silicon and silicon-germanium alloys grown by the hot-wire assisted chemical vapor deposition (HWCVD) technique, which is promising for producing high-quality device-grade materials.

Low-Temperature Silicon Deposition by Means of Hot-Wire Chemical Vapour Deposition PDF

Author: Hunter John King
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ISBN: 9783839618202
Category :
Languages : en
Pages :

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